Filter for displaying, display unit and production method therefor

ABSTRACT

The display filter is constituted by laminating a transparent adhesive layer (C)  31  containing dye, a polymer film (B)  20,  a transparent electrically conductive layer (D)  10,  a transparent adhesive layer (E)  40,  and a functional transparent layer (A)  60  having an anti-reflection property, a hard coat property, a gas barrier property, an antistatic property and an anti-fouling property sequentially in this order, adhered on a display area  00;  on this occasion, the transparent electrically conductive layer (D)  10  is grounded to a ground terminal of the display via an electrode  50  and an electrically conductive copper foil adhesive tape  80.

TECHNICAL FIELD

[0001] This invention relates to a display filter which is disposed on ascreen of a display such as a plasma display (PDP), a Braun tube (CRT),and a liquid crystal display apparatus (LCD) and which has filtercharacteristics that are capable of shielding other electromagneticwaves than a visible light from among electromagnetic waves to begenerated from the display screen and/or other filter characteristicsthat are capable of correcting a visible light spectrum, a displayapparatus mounted with the filter and a method for production of thesame.

BACKGROUND ART

[0002] With the rapid development of information system in society, aphotoelectronic component and equipment have been markedly advanced andpopularized. Among other things, a display has spread wide for use in atelevision set, a personal computer, or the like, and the display isrequired for increasing a size thereof as well as decreasing thicknessthereof. A plasma display has attracted attention as a thin-type displayin a large size. However, on the basis of a structure and an operationalprinciple thereof, the plasma display emits an intense leakageelectromagnetic field and a near-infrared ray from a display screen.

[0003] In recent years, an influence of the leakage electromagneticfield on the human body and other electronic equipment has come to be atopic to be discussed, and, for example, it has become necessary to keepthe leakage electromagnetic field within limits set by VCCI (VoluntaryControl Council for Interference by Data Processing Equipment andElectronic Office Machines) in Japan.

[0004] Moreover, there is a possibility that the near-infrared rayemitted from the display screen may act on the electronic equipment suchas a cordless phone located around the display and cause malfunctionthereof. Since near-infrared rays having wavelengths of 820 nm, 880 nm,980 nm and the like are used in a remote controller and opticalcommunication by a transmission system, it is necessary to suppresslight having a wavelength in a range of from 800 to 1100 nm which is ina near-infrared region to such a level as does not cause a problem inpractical use.

[0005] With regard to cutting-off of the near-infrared ray, it has beenknown that a near-infrared absorption filter produced by using anear-infrared absorbing dye is used. However, since the near-infraredabsorbing dye is liable to be deteriorated by environmental factors suchas humidity, heat and light, there is a tendency that the near-infraredabsorption filter which uses the dye may undergo changes in opticalproperties such as decrease in near-infrared ray cutting-off capacity,and a change of a color transmitted through the filter with the lapse oftime.

[0006] Since the plasma display emits the intense near-infrared ray overa wide wavelength range, it is necessary to use the near-infraredabsorption filter having a high absorption index for the near-infraredregion over a wide wavelength range. However, in a conventionalnear-infrared absorption filter, only a near-infrared absorption filterin which visible light ray transmittance is low has been realized.

[0007] In order to cut off the leakage electromagnetic field, it isnecessary to cover a surface of the display screen with an electricallyconductive substance having high electric conductivity. A transparentelectrically conductive layer is ordinarily used as such a method and,on this occasion, such transparent electrically conductive layers arebroadly classified into 2 categories: an electrically conductive mesh;and a transparent electrically conductive thin film. As the electricallyconductive mesh, ordinarily used is a grounded metallic mesh, asynthetic fiber mesh or a metallic fiber mesh which has been coated witha metal, an etched film which has been produced by first forming ametallic film and then performing an etching treatment on thethus-formed film in a lattice pattern manner or the like. However,though these electrically conductive mesh are excellent inelectromagnetic wave shielding capacity because of high electricconductivity thereof, these electrically conductive mesh havedisadvantages that fringes are produced by an interference of light, alow yield causes an increase in cost and the like.

[0008] There is a method to use a transparent electrically conductivethin film comprising a metallic thin film, an oxide semiconductor thinfilm and the like as an electromagnetic wave shielding layer, instead ofusing the electric conductive mesh. However, the metallic thin film canobtain favorable electric conductivity, but fails to provide a highvisible light ray transmittance owing to reflection and absorption bythe metal over a wide wavelength range. The oxide semiconductor thinfilm has higher transparency than that of the metallic thin film, but isinferior in electric conductivity and near-infrared reflectivity. Asdescribed above, with reference to the transparent electricallyconductive layer for the purpose of cutting-off the leakageelectromagnetic field, there are many cases in which, when the shieldcapacity thereof is regarded as being important, the electricallyconductive mesh is used while, when cost performance is regarded asbeing important, the transparent electrically conductive thin film isused.

[0009] Further, a method using a dye for trying to improve a colorpurity of the display is described in, for example, Japanese UnexaminedPatent Publication JP-A 58-153904 (1983), JP-A 60-22102 (1985), or JP-A59-221943 (1984) and the like. An application thereof to a plasmadisplay panel is recited in JP-A 58-153904.

[0010] However, in these prior arts, there is no recitation on acombination of a transparent electrically conductive layer aselectromagnetic wave shielding which is essential when applied to theplasma display panel and a dye, and there is also no specific recitationon the dye to be used.

[0011] It is considered that a plasma display filter is formedseparately from the display and, then, disposed as a front surface panelof the display for the purposes of cutting off the near-infrared raysand electromagnetic waves, and protecting the display screen. However,such a front surface panel method brings about a cost increase owing toa many number of components and/or production processes of the plasmadisplay filter whereupon it becomes difficult to allow the plasmadisplay filter to be smaller in thickness and lighter in weight.

[0012] Further, reflection on a surface of a representation portion ofthe plasma display is not ordinarily decreased and reflectance of aglass substrate is maintained; on this occasion, when the front surfacepanel is disposed apart from the representation portion from a viewpointof thermal design and the like, a reflected image becomesdouble-or-more-images caused by reflections of external light on thedisplay surface and the front surface panel whereupon there is a case inwhich visibility of the display is deteriorated. Still further, theplasma display has characteristics that, due to reflection of glass orphosphor on the surface of the screen, contrast in a bright place is lowas well as a color reproduction gamut of luminescence is narrow.

[0013] On the other hand, methods of removing the front surface paneland, then, directly bonding an optical film on the display panel areproposed in Japanese Unexamined Patent Publications JP-A 10-156991(1998), JP-A 10-188822 (1998), JP-A 2000-98131 (2000) and the like.However, any of these prior arts does not define total thickness of awhole transparent polymer film and does not specifically reciteprovision of shock resistance.

[0014] To contrast, in Japanese Unexamined Patent Publication JP-A10-2111688 (1998), it is proposed that, in order to absorb shock fromoutside, an optical film for use in direct bonding is laminated on atransparent polymer sheet having a thickness of 1 mm or more and theresultant laminate is used. However, it is difficult from a practicalpoint of view that the transparent polymer sheet having a thickness of 1mm or more in roll form is subjected to a continuous bonding process oris directly bonded on the display and, as seen in an embodiment, sincebonding is performed to an acrylic sheet having a thickness of 3 mm, itis apparent that an improvement of a known front surface panel typefilter based on sheet bonding has been intended.

[0015] Ordinarily, the transparent polymer film having various types offunctions in application fields according to the present invention isused in roll form and, from the standpoint of operational efficiency andthe like, the transparent polymer film having a thickness of from 75 to100 μm is used. Therefore, when 2 sheets of the transparent polymerfilms each having a function are simply bonded with each other, a totalthickness merely comes to be less than 0.3 mm. Further, as ananti-reflection film, that having a thickness of 188 μm has been used insome cases and, in these cases, a base film thereof was polyethyleneterephthalate (PET); however, since it is inferior in an anti-reflectionproperty to triacetyl cellulose (TAC) in which a favorably used basefilm is 80 μm thick, it is not used in a positive manner for the purposeof bonding films with each other.

[0016] Further, when a film is directly bonded on a display panel body,since the display itself is expensive, it is indispensable to remove thefilm for a treatment at the time a problem occurs; however, in theforegoing patent, there is no recitation on workability of this type.Still further, though bonding of the film to the display has alreadybeen performed in a liquid crystal display, a flat television set andthe like, since the plasma display comes to be substantially large insize, there are operational problems that it is troublesome to requiremuch force in removing the film therefrom than that in a conventionaldisplay, a paste tends to remain on the surface of the display and thelike.

[0017] Further, in an electromagnetic wave shielding body, it isnecessary to establish conduction between the transparent electricallyconductive layer and an outside by using an electrode which leads theelectromagnetic wave out to the outside as an electric current. As amethod to attain such a necessity, there is mentioned that, when a filmis bonded on the transparent electrically conductive layer for aprotection purpose and the like, the film is bonded such that a portionof the layer is exposed on a periphery of the filter to allow thethus-exposed portion to become a position which performs electricconduction with the outside as an electrode. Conventionally, theelectromagnetic wave shielding body obtained by bonding the film to thefront surface panel has established conduction with the outside by thismethod. As methods of exposing the transparent electrically conductivelayer, various types of methods have been performed, for example, amethod in which a surface area of the film to be bonded on thetransparent electrically conductive layer is allowed to be a littlesmaller than that of the transparent electrically conductive layer andother methods.

[0018] When this method is applied, since it is necessary to perform atwo-step bonding operation in which a film comprising a transparentelectrically conductive layer is first bonded in a sheet state to aplate having high rigidity or the like and, then, a protective filmhaving a little smaller area than that of the resultant bonded materialis further bonded in a sheet state to the resultant bonded material,there is a problem in productivity.

[0019] Further, in the electromagnetic wave shielding bodyconventionally obtained by bonding the film to the front surface panel,an electrode has been disposed on an entire peripheral portion thereof.When such a method is used, since it is necessary to perform anelectrode forming operation in a sheet state, there is a problem inproductivity.

[0020] In view of the conventional methods, it is an object of theinvention to provide a display filter which has desired filtercharacteristics such as electromagnetic wave shielding capacity,near-infrared ray cutting-off capacity, and image improvement capacityand which is capable of aiming for improvements such as a low cost, alighter weight, a smaller thickness, a panel protection, workabilitywhen a trouble occurs, and enhancement of productivity, a displayapparatus mounted with the filter, and a method for production of thesame.

DISCLOSURE OF INVENTION

[0021] As a result of intensive investigations conducted in order tosolve the problems, the present inventors have found that 1) atransparent electrically conductive layer having a surface resistance offrom 0.01 to 30 Ω/square is necessary to shield an extremely intenseelectromagnetic wave emitted from a plasma display; 2) a displayapparatus using the plasma display excellent in electromagnetic waveshielding capacity, near-infrared ray cutting-off capacity and animage/visibility/a cost can be obtained by forming an electromagneticwave shielding body equipped with such a transparent electricallyconductive layer directly on a surface of the plasma display; 3) thedisplay apparatus using a display excellent in the image/visibility/thecost can be obtained by forming a light control film which has aspecified layer constitution, contains a dye and has visible light raytransmittance of from 30 to 85% directly on the surface of the display;4) On a basis of attaining lighter weight and smaller thickness as wellas panel protectivity, an enhancement of workability can be attained bysetting a total thickness of a transparent polymer film whichconstitutes an optical filter to be 0.3 mm or more and, then, bondingthe thus-set film directly on a front surface of the display; and 5) anelectrode formation can be performed by a roll-to-roll method which hashigh production efficiency by setting limits on a position at which theelectrode is formed, for example, forming the electrode only on a pairof two sides of an optical filter facing with each other when theoptical filter is rectangular and, at the same time, by devising anappropriate shape of the electrode, and other things. The invention hasbeen completed on the basis of this finding.

[0022] The invention provides a display filter capable of being adheredto a display screen and having predetermined filter characteristics,comprising:

[0023] a functional transparent layer (A) disposed in an atmosphericside, having an anti-reflection property and/or an anti-glare property;

[0024] a transparent adhesive layer (C) disposed in a display side, forallowing the display filter to be adhered to the screen; and

[0025] a polymer film (B) disposed as a substrate between the functionaltransparent layer (A) and the transparent adhesive layer (C).

[0026] In the invention, it is preferable that a transparentelectrically conductive layer (D) having a surface resistance of from0.01 to 30 Ω/square is disposed between the functional transparent layer(A) and the polymer film (B) and/or between the polymer film (B) and thetransparent adhesive layer (C).

[0027] In the invention, it is preferable that a portion or entirety ofthe transparent electrically conductive layer (D) is constituted by anelectrically conductive mesh.

[0028] In the invention, it is preferable that the transparentelectrically conductive layer (D) is constituted by firstly laminating arepeating unit (Dt)/(Dm) comprising a high-refractive-index transparentthin film layer (Dt) and a metallic thin film layer (Dm) while repeatingthe repeating unit from 2 times to 4 times and, then, on the resultantlaminate, further laminating a high-refractive-index thin film layer(Dt).

[0029] In the invention, it is preferable that at least one layer of aplurality of high-refractive-index transparent thin film layers (Dt) isformed by an oxide containing, as a major component, at least one metalselected from the group consisting of indium, tin and zinc.

[0030] In the invention, it is preferable that at least one layer of aplurality of metallic thin film layers (Dm) is formed of silver or analloy comprising silver.

[0031] In the invention, it is preferable that the functionaltransparent layer (A) further has at least one function selected fromthe group consisting of a hard coat property, an antistatic property, ananti-fouling property, a gas barrier property and an ultravioletcutting-off property.

[0032] In the invention, it is preferable that an adhesive layer (E) isdisposed between the functional transparent layer (A) and the polymerfilm (B).

[0033] In the invention, it is preferable that a hard coat layer (F) isformed on both surfaces or one surface of the polymer film (B).

[0034] In the invention, it is preferable that at least one dye iscontained in at least one layer selected from the group consisting of:the functional transparent layer (A), the polymer film (B), thetransparent adhesive layer (C), a transparent electrically conductivelayer (D), the adhesive layer (E) and the hard coat layer (F).

[0035] In the invention, it is preferable that a dye having anabsorption maximum in a wavelength range from 570 to 605 nm iscontained.

[0036] In the invention, it is preferable that the dye is atetraazaporphyrin compound.

[0037] In the invention, it is preferable that the tetraazaporphyrincompound is expressed by the following formula (1):

[0038] wherein A¹ to A⁸ each individually represent a hydrogen atom, ahalogen atom, a nitro group, a cyano group, a hydroxy group, a sulfonicacid group, an alkyl group having carbon atoms of from 1 to 20, ahalogenoalkyl group, an alkoxy group, an alkoxyalkyl group, an aryloxygroup, a monoalkylamino group, dialkylamino group, an aralkyl group, anaryl group, a heteroaryl group, an alkylthio group, or an arylthiogroup; combinations of A¹ and A², A³ and A⁴, A⁵ and A⁶, and A⁷ and A⁸may each individually form a ring except an aromatic ring via aconnecting group; and M represents two hydrogen atoms, a divalent metalatom, a trivalent metal atom having one substituent, a tetravalent metalatom having two substituents, or an oxy metal atom.

[0039] In the invention, it is preferable that a near-infrared rayabsorption dye having an absorption maximum in a wavelength range offrom 800 to 1100 nm is contained.

[0040] In the invention, it is preferable that visible light rayreflectance on a surface of the functional transparent layer (A) is 2%or less.

[0041] In the invention, it is preferable that visible light raytransmittance is from 30 to 85%.

[0042] In the invention, it is preferable that transmittance minimum ina wavelength range of from 800 to 1100 nm is 20% or less.

[0043] In the invention, it is preferable that a total thickness of thepolymer film in entirety of the filter is 0.3 mm or more.

[0044] In the invention, it is preferable that a polymer film forincreasing a total thickness capable of containing a dye is provided.

[0045] In the invention, it is preferable that an electrode electricallyconnected with the transparent electrically conductive layer (D) isformed.

[0046] In the invention, it is preferable that the electrodeelectrically contacting with the transparent electrically conductivelayer (D) is continuously formed along a circumferential direction in aperipheral portion of the filter.

[0047] In the invention, it is preferable that an electrode is formed inan electrically conducting portion a part of which is exposed.

[0048] In the invention, it is preferable that the filter is shaped intoa rectangle and electrodes are formed in two surrounding sides facing toeach other.

[0049] In the invention, it is preferable that the electrodeelectrically connected with the transparent electrically conductivelayer (D) is formed on a surface of a peripheral edge of the filter.

[0050] In the invention, it is preferable that a communicating holewhich communicates from an outermost surface of the filter through to atleast the transparent electrically conductive layer (D) is formed alonga thickness direction of the filter wherein an electrode whichelectrically is connected with the transparent electrically conductivelayer (D) is formed inside the communication hole.

[0051] In the invention, it is preferable that an electricallyconductive tape is interposed between the transparent electricallyconductive layer (D) and a layer adjacent to the transparentelectrically conductive layer (D).

[0052] The invention also provides a display apparatus, comprising:

[0053] a display for representing an image; and

[0054] a display filter, disposed on a display screen.

[0055] The invention also provides a method for production of a displayapparatus, comprising the steps of:

[0056] laminating a display filter on a display screen of a displayapparatus via a transparent adhesive layer (C); and

[0057] electrically connecting a ground conductor of the displayapparatus and the electrode of the transparent electrically conductivelayer (D).

[0058] The invention also provides a method of production of a displayapparatus, comprising the steps of:

[0059] laminating a laminate filter comprising a polymer film (B), atransparent electrically conductive layer (D), and a transparentadhesive layer (C) on a display screen via the transparent adhesivelayer (C);

[0060] arranging a functional transparent layer (A) having ananti-reflection property and/or an anti-glare property on the laminatefilter directly or via a second adhesive layer; and

[0061] electrically connecting a ground conductor of the displayapparatus and the transparent electrically conductive layer (D).

[0062] The invention also provides a method for production of a displayapparatus, characterized by comprising the steps of:

[0063] arranging an adhesive layer on a display screen of a displayapparatus;

[0064] bonding a laminate filter comprising a polymer film (B), atransparent electrically conductive layer (D), and a functionaltransparent layer (A) having an anti-reflection property and/or ananti-glare property on the display screen via the adhesive layer; and

[0065] electrically connecting a ground conductor and the transparentelectrically conductive layer (D).

[0066] The invention also provides a method for production of a displayapparatus, comprising the steps of:

[0067] arranging an adhesive layer on a display screen;

[0068] bonding a laminate filter comprising a polymer film (B), and atransparent electrically conductive layer (D) on the display screen viathe adhesive layer;

[0069] arranging a functional transparent layer (A) having ananti-reflection property and/or an anti-glare property on the laminatefilter directly or via a second adhesive layer; and

[0070] electrically connecting a ground conductor and the transparentelectrically conductive layer (D).

BRIEF DESCRIPTION OF DRAWINGS

[0071] Other and further objects, features, and advantages of theinvention will be more explicit from the following detailed descriptiontaken with reference to the drawings wherein:

[0072]FIG. 1 is a cross-sectional view of an example of a polymer film(B)/a transparent electrically conductive layer (D) according to thepresent invention;

[0073]FIG. 2 is a plan view of an example of an electromagnetic waveshielding body according to the invention;

[0074]FIG. 3 is a cross-sectional view of an example (Example 1) of anelectromagnetic wave shielding body according to the invention and amounted state thereof;

[0075]FIG. 4 is a cross-sectional view of an example (Example 2) of anelectromagnetic wave shielding body according to the invention and amounted state thereof;

[0076]FIG. 5 is a plan view of an example of an electromagnetic waveshielding body according to the invention;

[0077]FIG. 6 is a cross-sectional view of an example (Example 3) of anelectromagnetic wave shielding body according to the invention and amounted state thereof;

[0078]FIG. 7 is a cross-sectional view of an example (Example 4) of anelectromagnetic wave shielding body according to the invention and amounted state thereof;

[0079]FIG. 8 is an x-y chromaticity diagram showing a color reproductiongamut in each case of before and after an electromagnetic wave shieldingbody is formed;

[0080]FIG. 9 is a cross-sectional view of an example (Example 5) of alight control film according to the invention and a mounted statethereof;

[0081]FIG. 10 is a cross-sectional view of an example (Example 6) of alight control film according to the invention and a mounted statethereof;

[0082]FIG. 11 is an x-y chromaticity diagram showing a colorreproduction gamut in each case of before and after a light control filmis formed;

[0083]FIG. 12 is a cross-sectional view of a constitutional example of adisplay filter according to the invention;

[0084]FIG. 13 is a cross-sectional view of a constitutional example of adisplay filter according to the invention;

[0085]FIG. 14 is a cross-sectional view of a constitutional example of adisplay filter according to the invention;

[0086]FIG. 15 is a cross-sectional view of a constitutional example of adisplay filter according to the invention;

[0087]FIG. 16 is a cross-sectional view of a constitutional example of adisplay filter according to the invention;

[0088]FIG. 17 is a cross-sectional view of a constitutional example of adisplay filter according to the invention;

[0089]FIG. 18 is a cross-sectional view of a constitution of thetransparent polymer film (B) 23 exhibiting an electromagnetic waveshielding function shown in FIG. 16;

[0090]FIG. 19 is a cross-sectional view of a constitution of thetransparent polymer film (B) 26 exhibiting an electromagnetic waveshielding function shown in FIG. 17;

[0091]FIG. 20 is a plan view of the display filter shown in FIG. 16 or17;

[0092]FIG. 21 is a cross-sectional view of a constitutional example of adisplay filter according to the invention;

[0093]FIG. 22 is a cross-sectional view of a constitutional example of adisplay filter according to the invention;

[0094]FIG. 23 is a cross-sectional view of a constitutional example of adisplay filter according to the invention;

[0095]FIG. 24 is a cross-sectional view of a constitutional example of adisplay filter according to the invention;

[0096]FIG. 25 is a cross-sectional view of a constitutional example of adisplay filter according to the invention;

[0097]FIG. 26 is a plan view of the display filter shown in FIGS. 21 to25; and

[0098]FIG. 27 is a diagram showing an example of a metal pattern.

BEST MODE FOR CARRYING OUT THE INVENTION

[0099] A display filter, a display apparatus and a method for productionof the same according to the present invention are now described indetail with reference to the preferred embodiments shown in theaccompanying drawings.

[0100] The display filter according to the invention functions as alight control film having filter characteristics which correct a visiblelight spectrum of a display screen by containing a dye having anabsorption maximum in a wavelength range of from 570 to 605 nm.

[0101] Further, the display filter according to the invention functionsas an electromagnetic wave shielding body having filter characteristicswhich shield an electromagnetic wave from a display screen by comprisinga transparent electrically conductive layer having a surface resistanceof from 0.01 to 30 Ω/square.

[0102] Further, the display filter according to the invention functionsas a near-infrared ray filter having filter characteristics which shielda near-infrared ray from the display screen by containing anear-infrared absorbing dye having an absorption maximum in a wavelengthrange of from 800 to 1100 nm.

[0103] The display filter having such functions is bonded directly on asurface of the display such as a plasma display whereby improvementssuch as cost reduction, a weight reduction/a thickness reduction, anenhancements of a panel protection property, workability at the time ofa problem occurrence, and productivity can be aimed for.

[0104] The electromagnetic wave shielding body according to the presentinvention comprises at least a transparent electrically conductive layer(D), having at least a surface resistance of from 0.01 to 30 Ω/square,which has been formed on one major surface of a polymer film (B) and atransparent adhesive layer (C) formed on the other major surface of thepolymer film (B), and further comprises an electrically conductingportion formed on the transparent electrically conductive layer (D), anda functional transparent layer (A) formed thereon directly or via thetransparent adhesive layer.

[0105] Further, the electromagnetic wave shielding body according to theinvention comprises at least a transparent electrically conductive layer(D), having at least a surface resistance of from 0.01 to 30 Ω/square,which has been formed on one major surface of a polymer film (B) and afunctional transparent layer (A) formed on the other major surface ofthe polymer film (B), and further comprises a electrically conductiveadhesive layer and a transparent adhesive layer (C) on the transparentelectrically conductive layer (D) Further, the electromagnetic waveshielding body according to the invention comprises at least a polymerfilm (B), a transparent electrically conductive layer (D), having atleast a surface resistance of from 0.01 to 30 Ω/square, which has beenformed on one major surface of a polymer film (B), a transparentadhesive layer (C) and a functional transparent layer (A) formed on theother major surface of the polymer film (B).

[0106] Further, the light control film according to the inventioncomprises at least a polymer film (B), a functional transparent layer(A), having an anti-reflection property and/or an anti-glare property,which has been formed on one major surface of the polymer film (B), atransparent adhesive layer (C) formed on the other major surface of thepolymer film (B), and further comprises a dye, and has visible light raytransmittance of from 55 to 90%.

[0107] 1. Polymer Film (B)

[0108] A polymer film (B) functions as a substrate of a filter, forexample, the substrate for forming a transparent electrically conductivelayer (B) and, since a display filter according to the invention isformed directly on a surface of the display, a transparent polymer filmis used.

[0109] The polymer film (B) is not particularly limited so long as it istransparent in a visible wavelength region. Specific examples thereofinclude polyethylene terephthalate, polyethersulfone, polystyrene,polyethylene naphthalate, polyarylate, polyether ether ketone (PEEK),polycarbonate, polyethylene, polypropylene, a polyamide such as nylon 6,a polyimide, a cellulose type resin such as triacetylcellulose,polyurethane, a fluorine type resin such as polytetrafluoroethylene, avinyl compound such as polyvinyl chloride, polyacrylic acid, apolyacrylic ester, polyacrylonitrile, an addition polymer of a vinylcompound, polymethacrylic acid, a polymethacrylate, a vinylidenecompound such as polyvinylidene chloride, a vinylidenefluoride/trifluoroethylene copolymer, a vinyl compound such asethylene/vinyl acetate copolymer, and, further, a copolymer of afluorine type compound, a polyether such as polyethylene oxide, an epoxyresin, polyvinyl alcohol, and polyvinyl butyral; however, the inventionis not limited to these examples.

[0110] The polymer film is ordinarily in a thickness of from 10 to 250μm. When the polymer film is unduly thin, it is difficult to form afilter directly on a surface of the display and flexibility thereof isrestricted. Therefore, it is favorable that the thickness of the polymerfilm (B) is 50 μm or more, and more preferably 75 μm or more. Further,when the thickness thereof is more than 250 μm, flexibility is undulyscarce whereupon there is a case in which it is not suitable to utilizethe film wound in roll form. Further, in such an application whichrequires high transparency as in applications according to theinvention, the polymer film having a thickness of about 100 μm hasbroadly been used.

[0111] The transparent polymer film to be used in the invention hasflexibility whereupon a transparent electrically conductive layer cancontinuously be formed thereon by a roll-to-roll method; hence, alongtransparent laminate having a large area can efficiently be produced.Further, a filter in film form can easily be formed directly on asurface of the display by means of lamination. Still further, it isfavorable that, when a substrate glass of the display is broken, thefilter, in which the polymer film is a substrate, bonded directly on thesurface of the display can prevent glass pieces from being scattered.

[0112] In the invention, a surface of the polymer film (B) maypreviously be subjected to a sputtering treatment, a corona dischargetreatment, a flame treatment, an etching treatment such as ultravioletray irradiation and electron beam irradiation, and prime coating therebyimproving adhesiveness of the overlying transparent electricallyconductive layer (D) to the polymer film (B). Further, any desiredinorganic material layer, for example, made of a metal or the like maybe formed between the polymer film (B) and the transparent electricallyconductive layer (D). Furthermore, if necessary, a dust preventiontreatment such as solvent cleaning and ultrasonic cleaning may beperformed, before a transparent electrically conductive film is formed.

[0113] Further, a hard coat film (F) may have been formed on at leastone major surface of the polymer film (B) so as to increase scratchresistance of the transparent laminate.

[0114] 2. Hard Coat Layer (F)

[0115] As a hard coat film which comes to be a hard coat layer (F),mentioned is a thermosetting resin, a photo-curable type resin or thelike, such as an acrylic type resin, a silicone type resin, a melaminetype resin, a urethane type resin, an alkyd type resin, and afluorocarbon type resin; on this occasion, there is no particularlimitation on a type and a forming method thereof. Thickness of the filmis from about 1 to about 100 μm. Further, it is permissible that thehard coat layer (F) may contain at least one dye to be described below.

[0116] 3. Transparent Electrically Conductive Layer (D)

[0117] In the electromagnetic wave shielding body according to theinvention, a transparent electrically conductive layer (D) is formed onone major surface of a polymer film (B). The term “transparentelectrically conductive layer (D)” as used herein is intended to includeany transparent electrically conductive film composed of a mono-layeredthin film or a multi-layered thin film. Further, the term “transparentlaminate (H)” as used herein is intended to include any member in whichthe transparent electrically conductive layer (D) is formed on a majorsurface of the polymer film (B).

[0118] As the mono-layered transparent electrically conductive film,mentioned is an electrically conductive mesh such as the metallic mesh,an electrically conductive film having a lattice type pattern or atransparent electrically conductive thin film such as a metallic thinfilm and an oxide semiconductor thin film.

[0119] As the multi-layered transparent electrically conductive film,mentioned is a multi-layered thin film in which a metallic thin film anda high-refractive-index transparent thin film are laminated to eachother. The multi-layered thin film in which the metallic thin film andthe high refractive-index transparent thin film are laminated to eachother has advantageous characteristics in any one of electricconductivity, near-infrared ray cutting-off capacity and visible lightray transmittance, due to electric conductivity which a metal such assilver has and a near-infrared ray reflection characteristics which afree electron of the metal has and, further, prevention of reflection tobe caused by a metal in a specified wavelength region by means of thehigh-refractive-index transparent thin film.

[0120] In order to obtain a display filter having both electromagneticwave shielding capacity and near-infrared ray cutting-off capacity, amulti-layered thin film in which a metallic thin film having both highelectric conductivity for absorbing the electromagnetic wave and amultiplicity of reflection interfaces for reflecting the electromagneticwave, and the high-refractive-index transparent thin film are laminatedto each other is preferable.

[0121] While, according to the VCCI, Class A, which sets a regulatedlimit for industrial use, indicates that a radiation field intensityshould be less than 50 dBμV/m, whereas Class B, which sets a regulatedlimit for domestic use, indicates that the radiation-field intensityshould be less than 40 dBμV/m. However, in a frequency band extendingfrom 20 MHz to 90 MHz, the radiation field intensity from the plasmadisplay exceeds 40 dBμV/m in the plasma display having a diagonal sizeof about 20 inches and 50 dBμV/m in the plasma display having a diagonalsize of about 40 inches. Thus, these types of plasma displays can not beput to domestic use as they are.

[0122] As a size of a screen and electric power consumption thereofbecome higher, the radiation field intensity of the plasma displaybecomes higher whereupon it is necessary to use an electromagnetic waveshielding material having high shielding effectiveness.

[0123] The present inventors have conducted an intensive study and foundthat; in order to obtain electromagnetic wave shielding capacitynecessary for the plasma display as well as high visible light raytransmittance and low visible light ray reflectance, it is necessarythat the transparent electrically conductive layer (D) has electricconductivity of a low resistance such that a surface resistance thereofis from 0.01 to 30 Ω/square, more preferably from 0.1 to 15 Ω/square,and still more preferably from 0.1 to 5 Ω/square. The visible light raytransmittance and the visible light ray reflectance, as used herein,indicate values calculated in accordance with JIS (R-3106) on the basisof the wavelength dependence of transmittance and reflectance.

[0124] Further, the present inventors have found that; in order toshield an intense near-infrared ray emitted from the plasma display upto such a level as causes no problem in actual use, it is required toallow a light ray transmittance minimum in a wavelength range of from800 to 1100 nm of the near-infrared ray in the display filter to be 20%or less and, further, in order to satisfy such a requirement, it isnecessary that the transparent electrically conductive layer itself hasa near-infrared ray cutting-off property from the reason that a numberof constitutional members is required to be decreased and there is alimitation on a near-infrared ray absorption by using a dye. Reflectionby the free electron of the metal can be utilized, in order to cut offthe near-infrared ray in the transparent electrically conductive layer.

[0125] As the metallic thin film layer becomes thicker, the visiblelight ray transmittance becomes lower, while as the metallic thin filmlayer becomes thinner, the reflection of the near-infrared ray becomesweaker. However, by superimposing at least one layer of a laminateconstitution in which the metallic thin film layer having a giventhickness is interposed between the high-refractive-index transparentthin film layers, it is possible to enhance the visible light raytransmittance and, at the same time, increase a total thickness of themetallic thin film layer. Further, by controlling a number of layersand/or thickness of each layer, it is possible to allow the visiblelight ray transmittance, the visible light ray reflectance, thenear-infrared ray transmittance, a transmitted color and a reflectedcolor to be changed within a given range.

[0126] Ordinarily, as the visible light ray reflectance becomes higher,lighting equipment and the like are more mirrored in the screenwhereupon effect to prevent the reflection on the surface of therepresentation portion is reduced thereby deteriorating visibility andcontrast. Further, as the reflected color, an imperceptible color of,for example, white-, blue- or purple-base is preferable. Under thesecircumstances, as the transparent electrically conductive layer, amulti-layered lamination which is optically designed and controlled inan easy manner comes to be preferable.

[0127] In the electromagnetic wave shielding body according to theinvention, it is preferable to use the transparent laminate (H) in whichthe transparent electrically conductive layer (D) that is amulti-layered thin film is formed on one major surface of the polymerfilm (B).

[0128] A preferable transparent electrically conductive layer (D)according to the invention is formed by firstly laminating a repeatingunit (Dt)/(Dm) comprising a high-refractive-index transparent thin filmlayer (Dt) and one metallic thin film layer (Dm) in this order on thepolymer film (B) while repeating such repeating unit from 2 times to 4times and, then, further, laminating at least one high-refractive-indextransparent thin film layer (Dt) on the resultant laminate, ischaracterized in that a surface resistance thereof is from 0.1 to 5Ω/square, and has properties excellent in low resistivity forelectromagnetic wave shielding capacity, near-infrared ray cutting-offcapacity, transparency, and visible light ray reflectance. Further,unless otherwise stated, the term “multi-layered thin film” as usedherein is intended to include a transparent electrically conductive filmof a multi-layered lamination in which at least one layer of a laminateconstitution where a metallic thin film layer is interposed between thehigh-refractive-index transparent thin film layers is superimposed.

[0129] In the transparent electrically conductive layer according to theinvention, the repeating unit is preferably laminated from 2 times to 4times. That is, the transparent laminate (D) according to the inventionin which the transparent electrically conductive layer is laminated onone major surface of the polymer film (B) has a layer constitution of(B)/(Dt)/(Dm)/(Dt)/(Dm)/(Dt), (B)/(Dt)/(Dm)/(Dt)/(Dm)/(Dt)/(Dm)/(Dt) or(B)/(Dt)/(Dm)/(Dt)/(Dm)/(Dt)/(Dm)/(Dt)/(Dm)/(Dt). When the repeatingunit is laminated more than 5 times, a restriction on a productionapparatus and productivity becomes a serious problem, and, further,there is a tendency in which the visible light ray transmittance isdeteriorated and the visible light ray reflectance is increased. On theother hand, when a repeating time is one time, it is difficult tosimultaneously satisfy the low resistivity, the near-infrared raycutting-off capacity and the visible light ray reflectance.

[0130] Further, the present inventors have found that, in themulti-layered thin film in which the repeating unit is laminated from 2times to 4 times, in order to allow the near-infrared ray cutting-offcapacity, the visible light ray transmittance, and the visible light rayreflectance to be characteristics simultaneously advantageous to theplasma display, a surface resistance thereof is from 0.1 to 5 Ω/square.

[0131] Further, it is conceivable that an electromagnetic wave intensityto be emitted from the plasma display is lowered in the future. In sucha case, it is anticipated that, even when the surface resistance of theelectromagnetic wave shielding body is from 5 to 15 Ω/square, sufficientelectromagnetic wave shielding characteristics can be obtained. It isalso conceivable that the electromagnetic wave intensity to be emittedfrom the plasma display is further lowered. In such a case, it is alsoanticipated that, even when the surface resistance of theelectromagnetic wave shielding body is from 15 to 30 Ω/square,sufficient electromagnetic wave shielding characteristics can beobtained. On the other hand, it is also conceivable that, based on adifferent point of view from an emitted electromagnetic wave intensity,when a larger screen and a smaller thickness of the plasma display isrequired for, the surface resistance of the electromagnetic waveshielding body is required to be from 0.01 to 1 Ω/square.

[0132] As a material of the metallic thin film layer (Dm), silver isadvantageous because it is excellent in electric conductivity, aninfrared reflection property and visible light ray transmittance when itis laminated in multiple layers However, silver lacks chemical andphysical stability whereupon it tends to be deteriorated under actionsof a contaminant, water vapor, heat, light and other factors present inthe environment. Accordingly, an alloy composed of silver and at leastone metal, having high environmental stability, for example, gold,platinum, palladium, copper, indium, tin or the like, and a metal whichis stable to these environmental factors can favorably used.Particularly, gold and palladium are favorable because these metals areexcellent in environmental resistance and optical characteristics.

[0133] Although no particular limitation is placed on a content ofsilver in such a silver-containing alloy, it is desirable that theelectric conductivity and optical characteristics thereof do not differsubstantially from those of the silver thin film; on this occasion, thecontent is in a range of from about 50% by weight or more to less thanabout 100% by weight. However, since an addition of another metal tosilver ordinarily impairs an excellent electric conductivity and opticalcharacteristics of silver, it is desirable that, when a plurality ofmetallic thin film layers are employed, if possible, at least one of themetallic thin film layers uses silver without allowing silver to be analloy thereof, or only a metallic thin film layer on a first layerand/or an outermost layer as viewed from the substrate is allowed to bean alloy.

[0134] Thickness of the metallic thin film layer (Dm) is determined byoptical design and experiment, on the basis of electric conductivity,optical characteristics and the like. No particular limitation is placedon the thickness thereof, provided that the transparent electricallyconductive layer has required characteristics. However, it is necessary,based on electric conductivity and the like, that a thin film is not ofan island type structure, but in a continuous state and is preferably 4nm or more. When the metallic thin film layer is unduly thick, thereoccurs a problem in transparency; therefore, it is preferably 30 nm orless. When a multiple of the metallic thin film layers exist, all ofsuch layers are not necessarily of the same thickness and do notnecessarily comprise silver or an alloy thereof.

[0135] In order to deposit the metallic thin film layer (Dm), there maybe employed any of conventionally known methods such as sputtering, ionplating, vacuum deposition, and metal plating.

[0136] No particular limitation is placed on the transparent type filmconstituting the high-refractive-index transparent thin film layer (Dt),so long as the transparent thin film has transparency in a visibleregion and have an effect of preventing light reflection in the visibleregion of the metallic thin film layer; however, a high-refractive-indexmaterial having a refractive index of not less than 1.6, preferably notless than 1.8, and more preferably not less than 2.0 against a visiblelight ray is used. Specific examples of materials which form such atransparent thin film include oxides of metals such as indium, titanium,zirconium, bismuth, tin, zinc, antimony, tantalum, cerium, neodymium,lanthanum, thorium, magnesium, and gallium; mixtures of these metaloxides; and zinc sulfide.

[0137] In these oxides and the sulfide, the metal and an oxygen atom ora sulfur atom may be present in nonstoichiometric proportions; however,the oxides and the sulfide are permissible, so long as opticalcharacteristics thereof are not substantially modified. Among thematerials, zinc oxide, titanium oxide, indium oxide, and a mixture ofindium oxide and tin oxide (ITO) are advantageously used because theynot only have high transparency and a high refractive index, but alsohas a high-speed film formation, good adhesion to the metallic thin filmlayer and the like.

[0138] Thickness of the high-refractive-index transparent thin filmlayer (Dt) can be determined by an optical design and an experiment, onthe basis of the optical characteristics of the polymer film (B)(hereinafter referred to also as “transparent substrate”), thickness andoptical characteristics of the metal thin film layer, a refractive indexof the transparent thin film layer, and the like; on this occasion,although no particular limitation is placed on the thickness thereof, itis preferably in a range of from 5 to 200 nm and more preferably from 10to 100 nm. Respective thickness of high-refractive-index transparentthin film layers of from a first layer to a (n+1)th layer (n being equalto or larger than 1) are not necessarily the same thereamong and,further, the high-refractive-index transparent thin film layers are notnecessarily made of the same transparent thin film material.

[0139] In order to form the high-refractive-index transparent thin filmlayer (Dt), there may be employed any of conventionally known methodssuch as sputtering, ion plating, ion beam assisted deposition, vacuumdeposition, and wet coating.

[0140] In order to improve the environmental resistance of thetransparent electrically conductive layer (D), any desired protectivelayer of an organic material or an inorganic material may be provided ona surface of the transparent electrically conductive layer to such anextent as does not detract from the electric conductivity and opticalcharacteristics thereof. Further, in order to improve the environmentalresistance of the metallic thin film layer, the adhesion between themetallic thin film layer and the high-refractive-index transparent thinfilm layer and the like, any desired inorganic material layer may beformed between the metallic thin film layer and thehigh-refractive-index transparent thin film layer to such an extent asdoes not detract from the electric conductivity and the opticalcharacteristics thereof. Specific examples of these inorganic materialsinclude copper, nickel, chromium, gold, platinum, zinc, zirconium,titanium, tungsten, tin, and palladium and, further, alloys composed oftwo or more of these metals. Thickness thereof is preferably in a rangeof from about 0.2 nm to about 2 nm.

[0141] In order to obtain a transparent electrically conductive layer(D) having desired optical characteristics, a thin film material of eachlayer, a number of layers, film thickness of each layer and the like maybe determined by performing an optical design which utilizes a vectormethod using optical constants (refractive index and extinctioncoefficient) of the transparent polymer film (B) and the thin filmmaterial, a method using an admittance diagram and the like while takinginto consideration electric conductivity, that is, a type and thicknessof the material of the metallic thin film needed for the electromagneticwave shielding capacity to be aimed for. In this occasion, it ispreferable that an adjacent layer which is formed on the transparentelectrically conductive layer (D) is taken into consideration. This isattributable to the fact that, since an entrance medium for lightentering the transparent electrically conductive layer formed on thetransparent polymer film (B) is different from an entrance medium havinga refractive index of 1 such as air and vacuum, a transmitted lightcolor (as well as transmittance, reflected light color and reflectance)undergoes changes. Namely, in a case in which the transparent adhesivelayer (C) is interposed when the functional transparent layer (A) isformed on the transparent electrically conductive layer (D), designingis performed while taking into consideration an optical constant of thetransparent adhesive layer (C). Further, when the functional transparentlayer (A) is disposed directly on the transparent electricallyconductive layer (D), designing is performed while taking intoconsideration the optical constant of a material which contacts thetransparent electrically conductive layer (D).

[0142] It has been found that, by designing the transparent electricallyconductive layer (D) in such a manner as described above, when a bottomlayer and a top layer as viewed from the polymer film (B) are thinnerthan any other layer interposed therebetween in thehigh-refractive-index transparent thin film layer (Dt), or a bottomlayer as viewed from the polymer film (B) is thinner than any otherlayer in the metallic thin film layer (Dm), and an adhesive which has arefractive index of from 1.45 to 1.65, a thickness of from 10 to 50 μmand an extinction coefficient of about 0 is an adjacent layer,reflectance of the transparent laminate is not significantly increased,that is, an increase of interfacial reflectance by forming the adjacentlayer is 2% or less.

[0143] It has been found that, particularly in the transparentelectrically conductive layer composed by repeating the repeating unit 3times, that is, by 7 layers, when a second layer in the midst of themetallic thin film layer (Dm) composed of 3 layers is thicker than anyother layer, in a case in which the adhesive is the adjacent layer,reflectance of the transparent laminate is not significantly increased.

[0144] Further, the optical constant can be measured by using anellipsometry (elliptically polarized light analytical method) or an Abberefractometer and, further, film formation can be performed bycontrolling a number of layers, film thickness and the like whileobserving the optical characteristics.

[0145] An atomic composition of the transparent electrically conductivelayer formed in such a manner can be measured according to a method suchas Auger electron spectroscopy (AES) inductively coupled plasma (ICP),and Rutherford backscattering spectrometry (RBS). Further, a layerconstruction and film thickness can be measured by observation in adepth direction by means of Auger electron spectroscopy, observation ofa cross-section under a transmission type electron microscope, or thelike.

[0146] The film thickness is controlled by carrying out film formationon the basis of the previously established relationship between thefilm-forming conditions and the film formation rate, or by monitoringthe film thickness during film formation by means of a quartz oscillatoror the like.

[0147] Except for a method of using the transparent electricallyconductive thin film, there is also a method of using a electricallyconductive mesh as the transparent electrically conductive layer.Although a mono-layer metallic mesh is described below as an example ofthe electrically conductive mesh, the electrically conductive meshaccording to the invention is not limited to this example.

[0148] In the mono-layered metallic mesh, a copper mesh layer isordinarily formed on a polymer film. Ordinarily, a copper foil is bondedon the polymer film and, then, the resultant copper foil-bonded polymerfilm is processed to be in a mesh state.

[0149] Both of flat-rolled copper and electrolytic copper are usable asthe copper foil to be employed in the invention; however, porousmetallic layer is preferably used and, on this occasion, a pore diameterthereof is preferably from 0.5 to 5 μm, more preferably from 0.5 to 3μm, and still more preferably from 0.5 to 1 μm. When the pore diameteris larger than these pore diameters, there is a fear of causing aproblem in patterning, whereas, when the pore diameter is smaller thanthese pore diameters, it is difficult to expect an enhancement of lightray transmittance. Further, porosity of the copper foil is in a range ofpreferably from 0.01 to 20% and more preferably from 0.02 to 5%. Theterm “porosity” as used herein is intended to include a value specifiedby P/R, wherein R represents a volume; and P represents a pore volume.For example, provided that, when the pore volume of the copper foilagsinst 0.1 cc of the volume thereof is measured by mercury porosity,the pore volume is 0.001 cc, the porosity can be defined as 1%. On thisoccasion, the copper foil to be used may be such a copper foil as hasbeen subjected to any type of surface treatments. Specific examples ofthe surface treatments include chromate processing, surface roughening,pickling, and zinc/chromate processing.

[0150] Thickness of the copper foil is preferably from 3 to 30 μm, morepreferably from 5 to 20 μm, and still more preferably from 7 to 10 μm.When the thickness is more than these thickness, there occurs a problemthat a prolonged time is required for etching, while, when the thicknessis less than these thickness, there occurs a problem thatelectromagnetic wave shielding capacity is deteriorated.

[0151] An open area ratio of a light transmission part is from 60% to95%, and more preferably from 65% to 90%, and still more preferably from70% to 85%. A shape of an open area portion is not particularly limited,but it is preferable that the shape thereof is in a form of an regulartriangle, a regular tetragon, a regular hexagon, a circle, a rectangle,a rhombus, or the like, shapes of such open area portions are all alikeand the open area portions are aligned within a surface thereof. As fora representative size of the open area portion of the light transmissionpart, it is preferable that a side or a diameter thereof is in a rangeof, preferably from 5 to 200 μm, and more preferably from 10 to 150 μm.When the size is unduly large, the electromagnetic wave shieldingcapacity is deteriorated, while, when the size is unduly small, anunfavorable influence will be given to an image on a display. Further,it is preferable that width of a metal in other portions than the openarea portions is preferably from 5 to 50 μm. Namely, a pitch ispreferably from 10 to 250 μm. When the pitch is smaller than such awidth, forming itself becomes extremely difficult, while, when the pitchis larger than such width, an unfavorable influence will be given to theimage.

[0152] A substantial sheet resistance of a metallic layer having thelight transmission part, as used herein, is a sheet resistance measuredby a 4-terminal method having an interval between electrodes at least 5times as large as the repeating unit of the pattern by utilizing anelectrode at least 5 times as large as the pattern. For example, whenthe open area portion has a shape of a regular tetragon having a side of100 μm, and are regularly aligned, while the metallic layer is 20 μmwide, measurements can be conducted by disposing electrodes each havinga diameter of 1 mm with an interval of 1 mm therebetween. Alternatively,a pattern-bearing film is processed to be in strip form and, then,electrodes are disposed at both ends thereof in a longitudinal directionand, thereafter, resistance (R) thereof is measured to obtain theexpression: the substantial sheet resistance=R×b/a, wherein a representslength in a longitudinal direction; and b represents length in atransverse direction. A value obtained in such a manner as describedabove is preferably from 0.01 Ω/square to 0.5 Ω/square, and morepreferably from 0.05 Ω/square to 0.3 Ω/square. When a value which issmaller than these values is tried to obtain, the film becomes undulythick to be unable to sufficiently obtain the opening area portion,while, when a value becomes larger than these values, sufficientelectromagnetic wave shielding capacity can not be obtained.

[0153] As for a method of laminating a silver foil on a polymer film, atransparent adhesive is used. Examples of adhesives include those of anacrylic type, a urethane type, a silicone type, and a polyester type;however, adhesives are not particularly limited to these types. Atwo-component type and a thermosetting type are favorably used. Further,it is preferable that the adhesive is excellent in chemical resistance.It is permissible that, after the adhesive is applied to the polymerfilm, the silver foil can be bonded to the resultant adhesive-appliedpolymer film, or the silver foil is applied with the adhesive and thenbonded.

[0154] As for a method of forming the light transmission part, aprinting method and a photo-resist method can be used. In the printingmethod, it is of a common practice to allow a mask layer to form apattern by a screen printing method utilizing a printing resistmaterial. In a method of using a photo-resist material, the photo-resistmaterial is solidly formed on a metallic foil by a roll coating method,a spin coating method, an entire-surface printing method, a transferprinting method, or the like and, then, is exposed to light anddeveloped by using photomask to perform resist patterning. After theresist patterning is completed, a metallic portion which will be anopening area portion is removed by a wet etching method whereby ametallic mesh having the light transmission part of a desired openingarea shape and opening area ratio can be obtained.

[0155] 4. Transmission Characteristics

[0156] Visible light ray transmittance in a light transmission portionof an electromagnetic wave shielding body is preferably from 30 to 85%,and more preferably from 50 to 80%. When the visible light raytransmittance is less than 30%, luminance is unduly decreased todeteriorate visibility. Further, in order to obtain contrast, there aresome cases in which it is necessary that the visible light raytransmittance is 85% or less, and more preferably 80% or less.

[0157] Further, the visible light ray transmittance in a light controlfilm is preferably from 55 to 90%, and more preferably from 60 to 85%.When the visible light ray transmittance is less than 55%, the luminanceis unduly decreased to deteriorate the visibility. Further, in order toobtain contrast, there are some cases in which it is necessary that thevisible light ray transmittance is 85% or less, and more preferably 80%or less.

[0158] Further, As used herein, the visible light ray transmittance(Tvis) and the visible light ray reflectance (Rvis) are calculated inaccordance with JIS (R-3106) on the basis of the wavelength dependenceof transmittance and reflectance.

[0159] 5. Color Characteristics and Dye

[0160] When a transmitted color of a display filter is rich in a tint offrom yellowish green tint to green, contrast of the display is decreasedand, further, color purity thereof is deteriorated and a white colorrepresentation sometimes becomes greenish. This phenomenon isattributable to the fact that light in a wavelength of around 550 nmwhich is a yellowish green color to green color is the highest invisibility.

[0161] When the visible light ray transmittance and the visible lightray reflectance in a multi-layered film are taken into seriousconsideration, the multi-layered thin film ordinarily lacks in atransmitted color tone. As the electromagnetic wave shielding capacity,that is, electric conductivity and near-infrared ray cutting-offcapacity becomes larger, it becomes necessary to allow a total thicknessof a metallic thin film to be larger. However, as the total thickness ofthe metallic thin film becomes larger, there is a tendency in which thecolor becomes more of from a green color to a yellowish green color.Therefore, it is required that, in the electromagnetic wave shieldingbody used for a plasma display, the transmitted color thereof is neutralgray or blue gray. This is attributable to a deterioration of thecontrast due to strong green color transmission, weak luminescence ofblue color compared with that of red or green color, a preference forwhite color having a slightly higher color temperature than that of astandard white color, and the like. Further, it is desirable that, asthe transmission characteristics of the electromagnetic wave shieldingbody, a chromaticity coordinate of white color representation on theplasma display is as near to a blackbody locus as possible.

[0162] When the multi-layered thin film is used in the transparentelectrically conductive layer (D), it is important to allow thetransmitted color of the electromagnetic wave shielding body to beneutral gray or blue gray by correcting a color tone of themulti-layered thin film. Such a correction of the color tone can beperformed if only a dye having absorption in a visible wavelength regionis used. For example, when an greenish tint exists in the transmittedcolor of the transparent electrically conductive layer (D), thecorrection to gray can be performed by using a dye of red color, while,when a yellowish tint exists in the transmitted color, the correctioncan be performed by using a dye of from blue to violet color.

[0163] In a color plasma display, a red color luminescent phosphor suchas (Y, Gd, Eu)BO₃, a green color luminescent phosphor such as (Zn,Mn)₂SiO₄, and a blue color luminescent phosphor such as (Ba,Eu)MgA₁₀O₁₇: Eu which emit light by being excited by a vacuumultraviolet light that is generated by direct or alternating electriccurrent discharge in a rare gas are formed in display cells whichconstitute pixels. The phosphors are selected on a basis of colorpurity, a coating property to a discharge cell, a short period ofresidual luminescent time, luminous efficiency, thermal resistance andthe like whereupon many of the phosphors now in practical use have yetto be improved in color purity thereof. Particularly, emission spectrumof the red color luminescent phosphor indicates several luminescentpeaks over a wavelength range of from about 580 nm to about 700 nmwhereupon, since a luminescent peak in a side of a relatively intenseshort wavelength is luminescence of from yellow color to orange color,there occurs a problem in which color purity of red color luminescenceis deteriorated to approach to that of orange color luminescence. When amixed gas of Xe and Ne is used as a rare gas, the color purity of theorange color luminescence brought about by radiative relaxation of anNe-excited state is also deteriorated. As to green color luminescenceand blue color luminescence, a position of a peak wavelength andbroadness of luminescence are factors of deteriorating the color puritythereof.

[0164] Height of the color purity can be indicated, for example, interms of an area of color reproduction gamut which is shown by an areaof a triangle formed by connecting 3 vertices of red, green and bluecolors in a coordinate system defined by Commission Internationaled'Eclairage (CIE) in which hue and saturation are represented byabscissa chromaticity x and ordinate chromaticity y, respectively. Dueto a low color purity, the color reproduction gamut of luminescence ofthe plasma display is narrower than that which is shown by chromaticityof 3 colors of RGB defined by an NTSC (National Television SystemCommittee) system.

[0165] Further, not only migration of luminescence between displaycells, but also a state, in which luminescence of each color contains abroad range of unnecessary light thereby allowing necessary light to beobscure, becomes a factor of deteriorating color purity as well ascontrast of the plasma display. Further, the contrast of the plasmadisplay is ordinarily deteriorated at a bright time in which externallight emitted from, for example, lighting equipment and the like ispresent in a room compared with a dark time. This is attributable to thefact that a substrate glass, a phosphor and the like reflect theexternal light whereupon unwanted light prevents necessary light frombeing conspicuous. A contrast ratio of the plasma display panel is from100 to 200 at the dark and from 10 to 30 at the time of the brightoccasion of about 100 lx of an environmental luminance whereupon animprovement thereof becomes a target to be pursued. The fact that thecontrast is low is also a factor of narrowing the color reproductiongamut.

[0166] In order to enhance the contrast, there is a method in which aneutral density (ND) filter is provided in front of the display therebydecreasing transmission over an entire visible wavelength region toreduce the reflection of the external light and the like at thesubstrate glass or the phosphor; however, in this method, when thevisible light ray transmittance is significantly low, luminance andsharpness of the image are deteriorated whereupon no significantimprovement on the color purity is not noticed.

[0167] The present inventors have found that enhancement of the colorpurity and contrast of the luminescent color of the color plasma displaycan be achieved by decreasing the unwanted luminescence and thereflection of the external light which cause to deteriorate the colorpurity and contrast of the luminescent color.

[0168] Further, the present inventors have found that an application ofa dye is capable of not only controlling color of the electromagneticwave shielding body to be neutral gray or neutral blue but alsodecreasing the unwanted luminescence and the reflection of the externallight which cause to deteriorate the color purity and contrast of theluminescent color. Furthermore, the present inventors have found thatthis is particularly conspicuous when the red color luminescence is nearto orange and that the color purity of the red color luminescence can beimproved by decreasing the luminescence in a wavelength of from 580 nmto 605 nm which causes such deterioration.

[0169] In the display filter according to the invention, decrease of theunwanted luminescence and reflection of the external light can beconducted by allowing a dye having an absorption maximum in a wavelengthof from 570 nm to 605 nm to be contained in the shielding body. On thisoccasion, it is necessary that transmission of light in a wavelengthrange of from 615 nm to 640 nm in which luminescence peak indicating ared color exists is not markedly impaired.

[0170] Ordinarily, a dye has a broad absorption range whereupon there isa risk in which even a dye having a desired absorption peak absorbsluminescence in a favorable wavelength as well by absorbing a trailingend portion thereof simultaneously. When luminescence by Ne is present,orange color luminescence can be decreased to enhance the color purityof the luminescence from RGB display cells.

[0171] Further, green color luminescence of the color plasma display hasa broad band and there is a case in which a peak position thereofexists, for example, in a side of somewhat longer wavelength than thatof green color required by the NTSC system, that is, in a side ofyellowish green.

[0172] The present inventors have found that the color purity can beenhanced by absorption of a short wavelength side of a dye having anabsorption maximum at a wavelength of from 570 nm to 605 nm therebyabsorb-trimming a long wavelength side of the green color luminescenceand, further, trimming the unwanted luminescence, and/or shifting thepeak.

[0173] In order to enhance the color purity of the red colorluminescence as well as green color luminescence, it is preferable thatminimum transmittance of the electromagnetic wave shielding body in awavelength of from 570 nm to 605 nm is allowed to be 80% or less againsta required transmittance of the red color luminescence at a peakposition by using a dye having an absorption maximum in a wavelength offrom 570 nm to 605 nm.

[0174] When the color purity of the blue color luminescence is low, theunwanted luminescence is decreased, a peak wavelength is shifted and adye to absorb bluish green color luminescence may be used, in the samemanner as in the cases of red color luminescence and green colorluminescence. Further, absorption by the dye decreases incidence of anexternal light into the phosphor thereby allowing the reflection of theexternal light on the phosphor to be decreased. These procedures canalso enhance the color purity and contrast.

[0175] As a method of allowing a dye to be contained in the displayfilter according to the invention, there is a method which uses at leastone state selected from the group consisting of: (1) a polymer film inwhich at least one type of dye is kneaded in a transparent resin; (2) apolymer film prepared by first emulsify-dissolving at least one type ofdye in a concentrated resin solution of a resin or a resin monomer/anorganic solvent and, then, subjecting the resultant concentrated resinsolution containing the dye to casting processing; (3) a materialprepared by first adding at least one type of dye to a mixture of aresin binder and an organic solvent to prepare a coating material and,then, applying the thus-prepared coating material on a transparentsubstrate; and (4) a transparent adhesive containing at least one typeof dye.

[0176] The term “contain” as used herein is intended to include statesof being contained in a substrate, in a layer such as a coating film andin an adhesive as well as states of being coated on surfaces of thesubstrate and the layer.

[0177] As dyes, ordinary dyes or pigments which have a desiredabsorption wavelength in a visible region may be permissible. Typesthereof are not particularly limited; however, examples of such dyes andpigments include organic dyes which are ordinarily available in themarket such as those of an anthraquinone type, a phthalocyanine type, amethine type, an azomethine type, an oxazine type, an azo type, a styryltype, a coumarin type, a porphyrin type, a dibenzofuranone type, adiketopyrrolopyrrole type, a rhodamine type, and a xanthene type, apyrromethene type. The type and concentration thereof are determineddepending on an absorption wavelength/absorption coefficient of the dye,a tone of a transparent electrically conductive layer, transmissioncharacteristics/transmittance required for the electromagnetic waveshielding body, a medium for dispersing the dye, a type/thickness of acoating film and the like; on this occasion, the type and concentrationare not particularly limited.

[0178] When a multi-layered thin film is used in the transparentelectrically conductive layer (D), in a case in which, though thenear-infrared ray cutting-off capacity as well as the electromagneticwave shielding capacity is held, higher near-infrared ray cutting-offcapacity is required, or in another case in which the transparentelectrically conductive layer does not hold the near-infrared raycutting-off capacity, it is permissible to use one or more types ofnear-infrared absorption dyes together with the dyes described above inorder to impart the display filter with the near-infrared raycutting-off capacity.

[0179] No particular limitation is placed on the near-infrared absorbingdye, so long as it can supplement the near-infrared ray cutting-offcapacity of the transparent electrically conductive layer and can absorban intense near-infrared ray emitted from the plasma display to such anextent as is suitable for practical purposes; further, no particularlimitation is placed on the concentration of the near-infrared absorbingdye. Examples of such near-infrared absorbing dyes include compounds ofa phthalocyanine type, anthraquinone type, a dithiol type, and adiiminium type.

[0180] Since a temperature of a panel surface of the plasma displaypanel is high and a temperature of the electromagnetic wave shieldingbody goes up particularly in a high temperature atmosphere, it ispreferable that the dye to be used in the invention has thermalresistance, for example, such that it does not significantly deteriorateitself by being decomposed at 80° C. or the like.

[0181] Further, there are some dyes which are deficient in lightresistance as well as thermal resistance. When deterioration thereof byluminescence of the plasma display or an ultraviolet ray/a visible lightray of the external light comes to be a problem, it is important todecrease deterioration of the dye to be caused by the ultraviolet ray orthe visible light ray by using a member which contains an ultravioletray absorbing agent or another member which does not allow anultraviolet ray to pass through, or to use a dye which is notsignificantly deteriorated by the ultraviolet ray or the visible lightray. The same is true with cases of heat, light, moisture and a mixedenvironment thereof. When the dye is deteriorated, the transmissioncharacteristics of the electromagnetic wave shielding body are changed.

[0182] As a practical matter, a case in which the surface temperature ofthe plasma display panel goes up to a range of from 70° C. to 80° C. isstipulated in Japanese Unexamined Patent Publication JP-A 8-220303(1996). Further, light emitted from the plasma display panel isstipulated, for example, as 300 cd/m² (Fujitsu Limited, Image Site,Catalog AD 25-000061C Oct., 1997M) whereupon, when light having thisvalue is irradiated for 20,000 hours provided that a solid angle is 2π,such irradiation comes to be 2π×20,000×300=38,000,000 (lx·hr);therefore, it is understood that light resistance of several tenmillions (lx·hr) is practically required.

[0183] Further, in order to disperse a dye in a medium or a coatingfilm, a dissolving property thereof into an appropriate solvent isimportant. It is permissible to allow two or more types of dyes havingdifferent absorption wavelengths from each other to be contained in onemedium or coating film.

[0184] The display filter according to the invention has excellenttransmission characteristics/transmittance which do not significantlyimpair luminance/visibility of the color plasma display and can enhancecolor purity and contrast of luminescent color of the color plasmadisplay. The present inventors have found that, when at least one of oneor more types of dyes which are to be contained is a tetraazaporphyrincompound, since the tetraazaporphyrin compound has a major absorptionwavelength in a wavelength the same as or similar to that of unwantedluminescence of from 570 to 605 nm which is particularly required to bedecreased and has a comparatively small absorption wavelength band, lossof luminance derived from absorption of favorable luminescence can bereduced; hence, a display filter which is excellent in capacity forenhancing transmission characteristics/transmittance, color purity andcontrast of luminescence color was able to be obtained.

[0185] The tetraazaporphyrin compound used in the invention can beexpressed by the foregoing formula (1). The formula (1) will hereinafterbe also abbreviated as the following structural formula (2):

[0186] wherein A^(m) and A^(n) each individually represent a hydrogenatom, a halogen atom, a nitro group, a cyano group, a hydroxy group, anamino group, a carboxyl group, a sulfonic acid group, an alkyl grouphaving carbon atoms of from 1 to 20, a halogenoalkyl group, an alkoxygroup, an alkoxyalkoxy group, an aryloxy group, a monoalkylamino group,dialkylamino group, an aralkyl group, an aryl group, a heteroaryl group,an alkylthio group, or arylthio group; A^(m) and A^(n) each individuallymay form a ring except an aromatic ring via a connecting group; and Mrepresents two hydrogen atoms, a divalent metal atom, a trivalent metalatom having one substituent, a tetravalent metal atom having twosubstituents, or an oxy metal atom.

[0187] Specific examples of the tetraazaporphyrin compound expressed bythe formula (1) are described below. In the formula, specific examplesof from A¹ to A⁸ include a hydrogen atom; halogen atoms such asfluorine, chlorine, bromine and iodine atom; a nitro group; a cyanogroup; a hydroxy group; an amino group; a carboxyl group; a sulfonicacid group; linear-chain, branched-chain or cyclic alkyl groups eachhaving carbon atoms of from 1 to 20 such as a methyl group, an ethylgroup, an n-propyl group, an iso-propyl group, an n-butyl group,aniso-butyl group, a sec-butyl group, a t-butyl group, an n-pentylgroup, a 2-methylbutyl group, a 1-methylbutyl group, aneo-pentyl group,a 1,2-dimethylpropyl group, a 1,1-dimethylpropyl group, a cyclo-pentylgroup, an n-hexyl group, a 4-methylpentyl group, a 3-methylpentyl group,a 2-methylpentyl group, a 1-methylpentyl group, a 3,3-dimethylbutylgroup, a 2,3-dimethylbutyl group, a 1,3-dimethylbutyl group, a2,2-dimethylbutyl group, a 1,2-dimethylbutyl group, a 1,1-dimethylbutylgroup, a 3-ethylbutyl group, a 2-ethylbutyl group, a 1-ethylbutyl group,a 1,2,2-trimethylbutyl group, a 1,1,2-trimethylbutyl group, a1-ethyl-2-methylpropyl group, a cyclo-hexyl group, an n-heptyl group, a2-methylhexyl group, a 3-methylhexyl group, a 4-methylhexyl group, a5-methylhexyl group, a 2,4-dimethylpentyl group, an n-octyl group, a2-ethylhexyl group, a 2,5-dimethylhexyl group, a 2,5,5-trimethylpentylgroup, a 2,4-dimethylhexyl group, a 2,2,4-trimethyl pentyl group, ann-nonyl group, a 3,5,5-trimethylhexyl group, an n-decyl group, a4-ethyloctyl group, a 4-ethyl-4,5-dimethylhexyl group, an n-undecylgroup, an n-dodecyl group, a 1,3,5,7-tetramethyloctyl group, a4-butyloctyl group, a 6,6-diethyloctyl group, an n-tridecyl group, a6-methyl-4-butyloctyl group, a n-tetradecyl group, an n-pentadecylgroup, a 3,5-dimethylheptyl group, a 2,6-dimethylheptyl group, a2,4-dimethylheptyl group, a 2,2,5,5-tetramethylhexyl group, a1-cyclo-pentyl-2,2-dimethylpropyl group, and a1-cyclo-hexyl-2,2-dimethylpropyl group;

[0188] halogenoalkyl groups each having carbon atoms of from 1 to 20such as a chloromethyl group, a dichloromethyl group, a fluoromethylgroup, a trifluoromethyl group, a pentafluoroethyl group, and anonafluorobutyl group;

[0189] alkoxy groups each having carbon atoms of from 1 to 20 such as amethoxy group, an ethoxy group, an n-propoxy group, an iso-propoxygroup, an n-butoxy group, an iso-butoxy group, a sec-butoxy group, at-butoxy group, an n-pentoxy group, an iso-pentoxy group, a neo-pentoxygroup, an n-hexyloxy group, and an n-dodecyloxy group;

[0190] alkoxyalkoxy groups each having carbon atoms of from 2 to 20 suchas a methoxyethoxy group, an ethoxyethoxy group, a 3-methoxypropyloxygroup, and a 3-(iso-propyloxy)propyloxy group;

[0191] aryloxy groups each having carbon atoms of from 6 to 20 such as aphenoxy group, a 2-methylphenoxy group, a 4-methylphenoxy group, a4-t-butylphenoxy group, a 2-methoxyphenoxy group, and a4-iso-propylphenoxy group;

[0192] a monoalkylamino groups each having carbon atoms of from 1 to 20such as a methylamino group, an ethylamino group, an n-propylaminogroup, an n-butylamino group, and an n-hexylamino group;

[0193] dialkylamino groups each having carbon atoms of from 2 to 20 suchas dimethylamino group, diethylamino group, a di-n-propylamino group, adi-n-butylamino group, and an N-methyl-N-cyclohexylamino group;

[0194] aralkyl groups each having carbon atoms of from 7 to 20 such as abenzyl group, a nitrobenzyl group, a cyanobenzyl group, a hydroxybenzylgroup, a methylbenzyl group, a dimethylbenzyl group, a trimethylbenzylgroup, a dichlorobenzyl group, a methoxybenzyl group, an ethoxybenzylgroup, a trifluoromethylbenzyl group, a naphthylmethyl group, anitronaphthylmethyl group, a cyanonaphthylmethyl group, ahydroxynaphthylmethyl group, a methylnaphthylmethyl group, and atrifluoromethylnaphthylmethyl group;

[0195] aryl groups each having carbon atoms of from 6 to 20 such as aphenyl group, a nitrophenyl group, a cyanophenyl group, a hydroxyphenylgroup, a methylphenyl group, a dimethylphenyl group, a trimethylphenylgroup, a dichlorophenyl group, a methoxyphenyl group, an ethoxyphenylgroup, a trifluoromethylphenyl group, an N,N-dimethylaminophenyl group,a naphthyl group, a nitronaphthyl group, a cyanonaphthyl group, ahydroxynaphthyl group, a methylnaphthyl group, and atrifluoromethylnaphthyl group; heteroaryl groups such as a pyrrolylgroup, a thienyl group, a furanyl group, an oxazoyl group, an isoxazoylgroup, an oxadiazoyl group, an imidazoyl group, a benzoxazoyl group, abenzothiazoyl group, a benzimidazoyl group, a benzofuranyl group, and anindoyl group;

[0196] alkylthio groups each having carbon atoms of from 1 to 20 such asa methylthio group, an ethylthio group, an n-propylthio group, aniso-propylthio group, an n-butylthio group, an iso-butylthio group, asec-butylthio group, a t-butylthio group, an n-pentylthio group, aniso-pentylthio group, a 2-methylbutylthio group, a 1-methylbutylthiogroup, a neo-pentylthio group, a 1,2-dimethylpropylthio group, and a1,1-dimethylpropylthio group; arylthio groups each having carbon atomsof from 6 to 20 such as a phenylthio group, a 4-methylphenylthio group,a 2-methoxyphenylthio group, and a 4-t-butylphenylthio group.

[0197] Examples in which combinations of A¹ and A², A³ and A⁴, A⁵ andA⁶, and A⁷ and A⁸ each form a ring via a connecting group include—CH₂CH₂CH₂CH₂—, —CH₂CH₂CH(NO₂)CH₂—, —CH₂CH(CH₃)CH₂CH₂—, and—CH₂CH(Cl)CH₂CH₂—.

[0198] Examples of divalent metals shown as M include Cu, Zn, Fe, Co,Ni, Ru, Rh, Pd, Pt, Mn, Sn, Mg, Hg, Cd, Ba, Ti, Be, and Ca.

[0199] Examples of trivalent metals each having one substituent includeAl—F, Al—Cl, Al—Br, Al—I, Ga—F, Ga—Cl, Ga—Br, Ga—I, In—F, InCl, In—Br,In—I, Tl—F, Tl—Cl, Tl—Br, Tl—I, Al—C₆H₅, Al—C₆H₄ (CH₃), In—C₆H₅,In—C₆H₄(CH₃), Mn (OH), Mn (OC₆H₅) Mn[OSi(CH₃)₃], and Fe—Cl, Ru—Cl.

[0200] Examples of tetravalent metals each having two substituentsinclude CrCl₂, SiF₂, SiCl₂, SiBr₂, SiI₂, SnF₂, SnCl₂, SnBr₂, ZrCl₂,GeF₂, GeCl₂, GeBr₂, GeI₂, TiF₂, TiCl₂, TiBr₂, Si(OH)₂, Sn(OH)₂, Ge(OH)₂,Zr(OH)₂, Mn(OH)₂, TiA₂, CrA₂, SiA₂, SnA₂, and GeA₂, wherein A representsany one of an alkyl group, a phenyl group, a naphthyl group and aderivative thereof; and Si(OA′)₂, Sn(OA′)₂, Ge(OA′)₂, Ti(OA′)₂, andCr(OA′)₂, wherein A′ represents any one of an alkyl group, a phenylgroup, a naphthyl group, a trialkylsilyl group, a dialkylalkoxysilylgroup and a derivative thereof; Si(SA″)₂, Sn(SA″)₂, and Ge(SA″)₂ whereinA″ represents any one of an alkyl group, a phenyl group, a naphthylgroup and a derivative thereof.

[0201] Examples of oxy metals include VO, MnO, and TiO.

[0202] Preferably, mentioned are Pd, Cu, Ru, Pt, Ni, Co, Rh, Zn, VO,TiO, Si(Y)₂, Ge(Y)₂, wherein Y represents any one of a halogen atom, analkoxy group, an aryloxy group, an acyloxy group, a hydroxy group, analkyl group, an aryl group, an alkylthio group, an arylthio group, atrialkylsilyloxy group, a trialkyl tin oxyo group, and a trialkylgermanium oxy group.

[0203] More preferably, mentioned are Cu, VO, Ni, Pd, Pt, and Co.

[0204] The present inventors have further found that, when theazaporphyrin compound expressed by the formula (1) is, for example, atetra-t-butyl-tetraazaporphyrin complex or atetra-neo-pentyl-tetraazaporphyrin complex, the compound iscomparatively easily produced, a dissolving property thereof against asolvent and the complex itself are stable, the compound is excellent inabsorption characteristics and, as a result of having been imparted witha t-butyl group or a tetra-neo-pentyl group, the compound is allowed tohave a third dimensional form which enhances the dissolving propertyagainst a solvent and, accordingly, the dye has come to be easilycontained and, on the basis of this finding, an excellentelectromagnetic wave shielding body was able to be obtained.

[0205] In the display filter according to the invention, the methods (1)to (4) which allow the dye to be contained can be conducted in at leastone layer selected from the group consisting of a polymer film (B)containing a dye, a transparent adhesive layer (C) or a secondtransparent adhesive layer containing a dye to be described below, afunctional transparent layer (A) containing a dye to be described below,and the hard coat layer (F), containing a dye, which has been describedabove. The functional transparent layer (A) containing a dye to bedescribed below may be any one of a film which contains a dye and,further, has various types of functions, a material in which a filmwhich contains a dye and, further, has various types of functions isformed on a polymer film, and a material in which a film having varioustypes of functions is formed on a substrate containing a dye.

[0206] Further, in the invention, at least two types of dyes havingdifferent absorption wavelengths from each other may be contained in amedium or a coating film, or at least two dye layers may be present.

[0207] First of all, a method (1) which comprises kneading a resintogether with a dye and hot-molding the thus-kneaded resin will bedescribed.

[0208] It is preferable to use a resin material which has transparencyas high as possible when formed into a plastic plate or a polymer film.Specific examples of such resin materials include, but are not limitedto, polyethylene terephthalate, polyether sulfone, polystyrene,polyethylene naphthalate, polyarylate, polyether ether ketone,polycarbonate, polyethylene, polypropylene, polyamides such as nylon 6,polyimides, cellulose type resins such as triacetylcellulose,polyurethane, fluorine-containing compounds such aspolytetrafluoroethylene, vinyl compounds such as polyvinyl chloride,polyacrylic acid, polyacrylic esters, polyacrylonitrile, additionpolymers of vinyl compounds, polymethacrylic acid, polymethacrylate,vinylidene compounds such as polyvinylidene chloride, copolymers ofvinyl compounds or fluorine-containing compounds such as a vinylidenefluoride/trifluoroethylene copolymer, and an ethylene/vinyl acetatecopolymer, polyethers such as polyethylene oxide, epoxy resins,polyvinyl alcohol, and polyvinyl butyral.

[0209] As to a preparation method, a processing temperature, afilm-forming condition and the like may vary somewhat according to a dyeused and a base polymer. However, usually employed are (i) a method inwhich a dye is mixed to powders or pellets of a base polymer, and theresulting mixture is heat-melted at a temperature of from 150 to 350° C.and formed into a plastic plate; (ii) a method in which a film is formedby an extruder; (iii) a method in which a raw film is prepared by anextruder and, then, uniaxially or biaxially stretched to a size 2 to 5times an original size at a temperature of from 30 to 120° C. to form afilm having a thickness of from 10 to 200 μm, and the like. An additivecommonly used at the time of molding resins, such as a plasticizer, maybe added during kneading. Although an amount of the dye to be added mayvary according to absorption coefficient of the dye, thickness of apolymeric molded article to be made, intended absorption intensity,intended transmission characteristics/transmittance and the like, itusually ranges from 1 ppm to 20%, based on the weight of the polymericmolded article as a substrate.

[0210] In a casting method (2), a dye is add-dissolved in a concentratedsolution of resin in which a resin or a resin monomer is dissolved in anorganic solvent and, on this occasion, a plasticizer, a polymerizationinitiator, or an anti-oxidant is added, as desired, and the resultantconcentrated solution is poured onto a mold or a drum which has arequired surface contour to obtain a plastic plate or a polymer filmthrough subsequent solvent evapolation/drying or polymerization/solventevapolation/drying processing.

[0211] A resin selected from the group consisting of an aliphatic estertype resin, an acrylic type resin, a melamine resin, a urethane resin,an aromatic ester type resin, a polycarbonate resin, an aliphaticpolyolefin resin, an aromatic polyolefin resin, a polyvinyl type resin,a polyvinyl alcohol resin, a polyvinyl-modified resin (PVB, EVA or thelike) and a resin monomer of a copolymer resin thereof is usually used.As the solvent, there is used a solvent selected from the groupconsisting of solvents of a halogen type, an alcohol type, a ketonetype, an ester type, an aliphatic hydrocarbon type, an aromatichydrocarbon type, an ether type and a mixture type thereof.

[0212] Although a concentration of the dye may vary according toabsorption coefficient of the dye, thickness of the plate or the film,intended absorption intensity, intended transmissioncharacteristics/transmittance and the like, it is usually in a range offrom 1 ppm to 20%, based on the weight of the resin monomer.

[0213] A concentration of the resin is usually in a range of from 1 to90%, based on the entire coating material.

[0214] As to a method (3) which comprises preparing a coating materialand, then, performing a coating operation, employed are a method inwhich a dye is dissolved in a binder resin and an organic solvent toprepare a coating material, a method in which a dye that has previouslybeen pulverized (50 to 500 nm) is dispersed in an uncolored acrylicemulsion-based coating material to prepare an acrylic emulsion-basedaqueous coating material and the like.

[0215] In the former method, a resin selected from the group consistingof an aliphatic ester type resin, an acrylic type resin, a melamineresin, a urethane resin, an aromatic ester type resin, a polycarbonateresin, an aliphatic polyolefin resin, an aromatic polyolefin resin, apolyvinyl type resin, a polyvinyl alcohol resin, a polyvinyl-modifiedresin (PVB, EVA or the like) and a copolymer resin thereof is usuallyused as a binder resin. As the solvent, there is used a solvent selectedfrom the group consisting of: solvents of a halogen type, an alcoholtype, a ketone type, an ester type, an aliphatic hydrocarbon type, anaromatic hydrocarbon type, an ether type and a mixture type thereof.

[0216] Although a concentration of the dye may vary according toabsorption coefficient of the dye, thickness of such coating, intendedabsorption intensity, intended visible light transmittance and the like,it is usually in a range of from 0.1 to 30%, based on the weight of thebinder resin.

[0217] Further, a concentration of the binder resin is usually in arange of from 1 to 50%, based on the entire coating material.

[0218] The acrylic emulsion-based aqueous coating material in a lattermethod can also be obtained, in the same way as in the former method, bydispersing a dye which has previously been pulverized (50 to 500 nm) inan uncolored acrylic emulsion-based coating material. An additivecommonly used in a coating material, such as an antioxidant, may beadded to the coating material.

[0219] The coating material prepared according to any one of the methodsis applied on a transparent polymer film, a transparent resin, atransparent glass or the like by means of a bar coater, a blade coater,a spin coater, a reverse coater, a die coater, a spray gun or the likein a known coating manner to prepare a substrate containing a dye.

[0220] A protective layer may be provided on a coated surface in orderto protect a coated surface, or another component of the electromagneticwave shielding body may be bonded to the coated surface in such a manneras to protect the coated surface.

[0221] In a method (4) which uses an adhesive containing a dye, theremay be used an adhesive or glue in sheet form or in liquid form such asan acrylic adhesive, a silicone type adhesive, a urethane type adhesive,a polyvinyl butyral adhesive (PVB), and an ethylene-vinyl acetate (EVA)type adhesive, a polyvinyl ether, a saturated amorphous polyester, amelamine resin or the like after being added with a dye of from 10 ppmto 30%.

[0222] In these methods, in order to enhance light resistance of theelectromagnetic wave shielding body containing the dye, an ultravioletray absorbing agent can also be contained together with the dye. A typeand a concentration of the ultraviolet absorbing agent are notparticularly limited.

[0223] 6. Transparent Adhesive Layer and Electrically ConductiveAdhesive Layer

[0224] In the present invention, an optional transparent adhesive layeris interposed within a laminate. A transparent adhesive layer (C)according to the invention or the like is a layer comprising an optionaltransparent adhesive or glue. Specifically, mentioned are an acrylicadhesive, a silicone type adhesive, a urethane type adhesive, apolyvinyl butyral adhesive (PVB), an ethylene-vinylacetate (EVA) typeadhesive and the like, a polyvinyl ether, a saturated amorphouspolyester, a melamine resin and the like. It is important, on thisoccasion, that the adhesive to be used in a central portion that is aportion which a light ray emitted from the display passes through isrequired to be sufficiently transparent against a visible light ray.

[0225] The electrically conductive adhesive layer is an adhesive layerfor the purpose of electrically connecting a transparent electricallyconductive layer (D) with an earth portion (ground conductor) of adisplay apparatus; on this occasion, though it is necessary that theelectrically conductive adhesive layer is electrically conductive, it isnot necessary that the electrically conductive adhesive layer istransparent. Since it is necessary that, in the electromagnetic waveshielding body, a transparent electrically conductive layer (D) iselectrically connected with an external member, the transparent adhesivelayer should not significantly interfere with such an electricalconnection due to the electrically conductive adhesive layer. Namely, anelectrically conducting portion in which the transparent adhesive layeris not formed on the transparent electrically conductive layer (D) isnecessary. For example, it is important that the transparent adhesivelayer is formed such that a peripheral portion of the transparentelectrically conductive layer (D) is left intact to allow it to be theconducting portion.

[0226] The electrically conductive adhesive or the electricallyconductive adhesive to be used in the electrically conductive adhesivelayer comprises a base agent such as an acrylic adhesive, a siliconetype adhesive, a urethane type adhesive, a polyvinyl butyral adhesive(PVB), and an ethylene-vinylacetate (EVA) type adhesive, apolyvinylether, a saturated amorphous polyester, a melamine resin or thelike, and carbon or metallic particles of Cu, Ni, Ag, Fe or the likedispersed in the base agent as electrically conductive particles. As tosuch dispersed particles, when an electrically conductive property islow, a particle diameter is small, a number of particles is large and acontact area between particles is large, it is favorable that volumeresistivity of the electrically conductive adhesive or the electricallyconductive adhesive is lowered. The volume resistivity of theelectrically conductive adhesive or the electrically conductive adhesiveto be used is from 1×10⁻⁴ to 1×10³ Ω·cm. A sheet state or a liquid formthereof is permissible so long as there exists practical adhesivestrength therein.

[0227] A pressure-sensitive type adhesive in sheet form is favorablyused as the adhesive. After such an adhesive in sheet form is bonded oran adhesive method is applied, bonding is performed by lamination.

[0228] The liquid form is such an adhesive as is cured by being left tostand at room temperature, being heated or being irradiated by anultraviolet ray after being applied and bonded. As application methods,mentioned are various types of methods such as a screen printing method,a bar coating method, a reverse coating method, a gravure coatingmethod, a die coating method, and a roll coating method; however, suchan appropriate application method is usually chosen by taking intoconsideration a type, a viscosity, an application amount and the like ofthe adhesive. Although no particular limitation is placed on thicknessof a layer thereof, the thickness is, in view of the volume resistivityand a required electrically conductive property, in a range of from 0.5μm to 50 μm and preferably from 1 μm to 30 μm. Further, an electricallyconductive tape of a double-faced adhesion type having an electricallyconductive property on both faces which is available in the market canalso favorably be used. Although no particular limitation is placed onthickness of this layer, the thickness is in a range of from aboutseveral micrometers to about several millimeters.

[0229] The adhesive may either be in sheet form or liquid form, so longas it has a practical adhesion strength. A pressure-sensitive typeadhesive in sheet form is favorably used as the adhesive. After such anadhesive in sheet form is bonded or an adhesive material is applied, abonding method is performed by laminating individual members with eachother.

[0230] The liquid form is such an adhesive as is cured by being left tostand at room temperature or being heated after being applied andbonded.

[0231] As application methods, mentioned are various types of methodssuch as a bar coating method, a reverse coating method, a gravurecoating method, a die coating method, and a roll coating method;however, such an appropriate application method is chosen by taking intoconsideration a type, a viscosity, an application amount and the like ofthe adhesive.

[0232] Although no particular limitation is placed on thickness of alayer thereof, the thickness is in a range of from 0.5 μm to 50 μm andpreferably from 1 μm to 30 μm. Further, it is preferable that a surfaceon which the transparent adhesive layer is formed or a surface to bebonded therewith is beforehand subjected to a treatment for allowingadhesion to be easily performed such as coating for the purpose of easyadhesion and a corona discharge treatment thereby enhancing a wettingproperty thereof.

[0233] Further, after bonding is performed via the transparent adhesivelayer, in order to remove air entrapped between members at the time ofbonding, or to perform solution treatment on the adhesive and, further,to enhance adhesion strength between members, it is important thatcuring is performed under conditions of pressure and heating, ifpossible. On this occasion, the condition of pressure is from aboutseveral to 20 atms; further, although the condition of heating dependson thermal resistance of individual members, it is from about roomtemperature to about 80° C. However, no particular limitations areplaced on these conditions. At least one layer of the transparentadhesive layers is allowed to contain a dye.

[0234] 7. Functional Transparent Layer (A)

[0235] It is preferable that, in accordance with an installation methodof a display or a required function for the display, the display filteraccording to the invention has at least one function selected from thegroup consisting of a hard coat property, an anti-reflection property,an anti-glare property, an antistatic property, an anti-foulingproperty, a gas barrier property and an ultraviolet ray cutting-offproperty and, further, in the display filter, a functional transparentlayer (A) which a visible light ray passes through is formed on atransparent electrically conductive layer (D) either directly or via asecond-transparent adhesive layer. It is preferable that one functionaltransparent layer (A) has a plurality of functions.

[0236] The functional transparent layer (A) according to the inventionmay be a functional film itself having at least one of the functionsdescribed above, a transparent substrate on which a functional film hasbeen formed by a coating method, a printing method, or various types ofknown film-forming methods, or a transparent substrate having varioustypes of functions.

[0237] In a case of the functional film itself, the functional film isformed directly on a major surface of the transparent electricallyconductive layer (D) which forms the functional transparent layer (A) bya coating method, a printing method or various types of other knownfilm-forming methods.

[0238] In a case of the transparent substrate on which the functionalfilm has been formed, or the transparent substrate which has varioustypes of functions, bonding maybe performed on a major surface of thetransparent electrically conductive layer (D) either via an adhesive orvia the adhesive containing a dye. However, no particular limitation isplaced on these preparation methods.

[0239] The transparent substrate is a transparent polymer film; on thisoccasion, no particular limitation is placed on a type and thicknessthereof and, further, a dye can be contained in the transparentsubstrate. Even in a case in which the functional transparent layer (A)is the functional film itself, the dye can also be contained in thefilm.

[0240] Since it is necessary that, in the electromagnetic wave shieldingbody, the transparent electrically conductive layer (D) is electricallyconnected with an external member, the functional transparent layer (A)should not interfere with such an electrical connection. Namely, anelectrically conducting portion in which the functional transparentlayer (A) is not formed on the transparent electrically conductive layer(D) is necessary. For example, the functional transparent layer (A) isformed such that a peripheral portion of the transparent electricallyconductive layer is left intact to allow the peripheral portion to bethe conducting portion.

[0241] Since a display screen of the display becomes hard to see byallowing lighting equipment and the like to be mirrored therein, it isnecessary that the functional transparent layer (A) has at least onefunction of an anti-reflection (hereinafter referred to also as AR)property for suppressing reflection of an external light, an anti-glare(hereinafter referred to also as AG) property, and ananti-reflection/anti-glare (hereinafter referred to also as ARAG)property which is imparted with both of the foregoing two properties.When reflectance of a visible light ray on a surface of theelectromagnetic wave shielding body is low, as described above,incidence of the external light into a phosphor of the plasma displayand reflection thereof are decreased whereupon not only a phenomenon ofbeing mirrored is prevented, but also, as a result, contrast and colorpurity are enhanced.

[0242] As to the functional transparent layer (A) having theanti-reflection (AR) property, elements constituting an anti-reflectionfilm and respective film thickness of the elements are determined bycarrying out an optical design with consideration for opticalcharacteristics of the substrate on which this anti-reflection layer isformed. Specifically, mentioned are a single-layer of a thin film of afluorine type transparent polymeric resin, magnesium fluoride, siliconetype resin or silicon oxide which has a low refractive index of notgreater than 1.5 and preferably not greater than 1.4 in a visibleregion, so as to have, for example, a quarter-wavelength opticalthickness, and a laminate of two or more layers of thin films eachcomprising an inorganic compound such as a metal oxide, a fluoride, asilicide, a boride, a carbide, a nitride, and a sulfide, or an organiccompound such as a silicone type resin, an acrylic resin and a fluorinetype resin which has different refractive indices from one another in anorder of a high refractive-index layer and a low refractive-index layeras viewed from the substrate.

[0243] Such a single-layered one is easily prepared, but is inferior tosuch a laminate of two or more layers in the anti-reflection property. Alaminate of 4 layers has anti-reflection capacity over a wide wavelengthrange and undergoes less restriction in the optical design based on theoptical characteristics of the substrate.

[0244] At the time of depositing a thin film comprising such aninorganic compound, any one of conventionally known methods such assputtering, ion plating, vacuum deposition, and wet coating can beadopted. At the time of depositing a thin film comprising such anorganic compound, any one of conventionally known methods such as amethod of dry-curing after wet coating, for example, a bar coatingmethod, a reverse coating method, a gravure coating method, a diecoating method, and a roll coating method can be adopted.

[0245] Visible light ray reflectance of a surface of the functionaltransparent layer (A) having an anti-reflection property is 2% or less,preferably 1.3% or less, and more preferably 0.8% or less.

[0246] As used herein, the functional transparent layer (A) having ananti-glare (AG) property indicates a transparent layer which istransparent to a visible light ray and is provided with minute surfaceirregularities having a size of from about 0.1 μm to about 10 μm.Specifically, the functional transparent layer (A) having the anti-glareproperty is formed by first dispersing particles of an inorganic ororganic compound such as silica, an organosilicon compound, melamine,and an acrylate in a thermosetting or photo-curable resin such as anacrylic type resin, a silicone type resin, a melamine type resin, aurethane type resin, an alkyd type resin, and a fluorine type resin toprepare ink and, then, applying the thus-prepared ink to the substrateaccording to a method such as a bar coating method, a reverse coatingmethod, a gravure coating method, a die coating method, and a rollcoating method and, thereafter, curing the thus-applied ink. An averagediameter of the particles is in a range of from 1 μm to 40 μm.Alternatively, the anti-glare property can also be obtained by firstcoating a substrate with a thermosetting or photo-curable resin such asan acrylic type resin, a silicone type resin, a melamine type resin, aurethane type resin, an alkyd type resin, and a fluorine type resin and,then, pressing the thus-coated substrate against a mold having a desiredhaze or a surface contour and, thereafter, curing the resin. In short,it is important that the functional transparent layer (A) having theanti-glare property has appropriate surface irregularities and is notparticularly limited to the methods described above.

[0247] A haze of the anti-glare property is from 0.5% to 20% andpreferably from 1% to 10%. When the haze is unduly low, the anti-glareproperty becomes insufficient, while, when the haze is unduly high,transmittance of parallel light rays is reduced whereupon the visibilityof the display is deteriorated.

[0248] The functional transparent layer (A) having theanti-reflection/anti-glare (ARAG) property can be obtained by formingthe anti-reflection film on a film having an anti-glare property or asubstrate. On this occasion, provided that the film having theanti-glare property is a film having a high refractive index, even whenthe anti-reflection film is made of a mono layer, the functionaltransparent layer (A) can be imparted with a relatively highanti-reflection property.

[0249] Prevention of reflection by the AR or the ARAG can enhance thelight ray transmittance of the display filter.

[0250] Since the display filter according to the invention is bonded toa representation portion of the display via the transparent adhesivelayer (C), reflection of a substrate glass on a surface of therepresentation portion is avoided. Therefore, furthermore, the filter inwhich the functional transparent layer (A) having a function of AR orARAG is formed has a low reflection on a surface thereof whereuponcontrast and color purity of the display can further be enhanced.Reflectance of the visible light ray on the surface of the functionaltransparent layer (A) having the functions of the AR or the ARAG is 2%or less, preferably 1.3% or less, and more preferably 0.8% or less.

[0251] In order to impart the display filter with scratch resistance, itis favorable that the functional transparent layer (A) has a hard coatproperty. As a hard coat film, mentioned are films of thermosetting typeresins and photo-curable resins such as an acrylic type resin, asilicone type resin, a melamine type resin, an urethane type resin, analkyd type resin, and a fluorine type resin; however, no particularlimitation is placed on a type and a forming method thereof. A thicknessof these films is from about 1 to about 100 μm. The functionaltransparent layer (A) may have both of the anti-reflection property andthe hard coat property either by allowing the hard coat film to be usedin the high refractive-index layer or a low refractive-index layer ofthe functional transparent layer (A) having the anti-reflection propertyor by allowing the anti-reflection film to be formed on the hard coatfilm. In the same manner as described above, the functional transparentlayer (A) may have both of the anti-glare property and the hard coatproperty. On this occasion, it is sufficient to allow the hard coat filmto have irregularities on a surface thereof by dispersing or the likeparticles therein; further, when the anti-reflection film is formed onsuch a hard coat film, the functional transparent layer (A) having bothof the anti-reflection/anti-glare property and the hard coat propertycan be obtained. A surface hardness of the functional transparent layer(A) having the hard coat property is at least H, preferably 2H, and morepreferably 3H or more in terms of pencil hardness in accordance with JIS(K-5400).

[0252] Further, the surface of the display filter tends to attract dustowing to electrostatic charge and, moreover, such static electricity maybe discharged upon contact with a human body to give an electric shockthereto. Accordingly, it may be required to subject the display filterto an antistatic treatment. In order to impart an antistatic capacity tothe display filter, the functional transparent layer (A) may haveelectric conductivity. On this occasion, it is sufficient to allowelectric conductivity to be about 10¹¹ Ω/square or less in terms of asurface resistance, but the surface resistance should not detract fromtransparency or resolution of a display screen. As to the electricallyconductive layer, mentioned are a well-known transparent electricallyconductive film such as an ITO and an electrically conductive film inwhich electrically conductive ultrafine particles such as ultrafineparticles of ITO and ultrafine particles of tin oxide are dispersed.

[0253] Further, it is preferable that a layer which constitutes thefunctional transparent layer (A) having at least one function selectedfrom the group consisting of the anti-reflection property, theanti-glare property, the anti-reflection/anti-glare property, and a hardcoat property has electric conductivity.

[0254] When silver is used in the multi-layered thin film, since silverlacks chemical and physical stability whereupon silver tends to bedeteriorated by a contaminant, water vapor and other factors present inthe environment and hence undergoes aggregation and whitening, it isimportant to cover a surface, on which a thin film is formed, of atransparent electrically conductive laminate with the functionaltransparent layer (A) having a gas barrier property so that the thinfilm may not be exposed to the contaminant and water vapor present in anoperational environment. When the gas barrier property is expressedinterms of moisture permeability, the required moisture permeability isnot greater than 10 g/m²·day. Specific examples of such films having agas barrier property include thin films of metal oxides such as siliconoxide, aluminum oxide, tin oxide, indium oxide, yttrium oxide, andmagnesium oxide, and mixtures thereof; thin films of these metal oxidesadded with a slight amount of other elements; and those made ofpolyvinylidene chloride, an acrylic type resin, a silicone type resin, amelamine type resin, an urethane type resin, a fluorine type resin orthe like. However, these thin films or the films are not necessarilylimited thereto. Thickness of these films is in a range of from 10 to200 nm in a case of thin films each made of a metal oxide and from about1 to about 100 μm in a case of the films each made or a resin, and thesethin films or films may have either a mono-layer or a multi-layeredstructure. However, it is to be understood that the thickness andstructure of these thin films or films are not limited to thosedescribed above. Examples of polymer films having low moisturepermeability include those made of polyethylene, polypropylene, nylon,polyvinylidene chloride, a vinylidene chloride/vinyl chloride copolymer,a vinylidene chloride/acrylonitrile copolymer, and a fluorine typeresin. However, the polymer films are not particularly limited to thesematerials, so long as the moisture permeability thereof is not greaterthan 10 g/m²·day. Even when the polymer film has a relatively highmoisture permeability, the moisture permeability can be reduced byincreasing the thickness of the film or adding an appropriate additivethereto.

[0255] Further, it is preferable that a layer constituting thefunctional transparent layer (A) having at least one property selectedfrom the group consisting of: the anti-reflection property, theanti-glare property, the anti-reflection/anti-glare property, and anantistatic property, an anti-Newton ring property, and the hard coatproperty is a film having a gas barrier property, or a whole body or,when used concurrently with an adjacent transparent adhesive layer, thelayer has the gas barrier property.

[0256] For example, as to the functional transparent layer (A)containing a dye and having the anti-reflection property, the hard coatproperty, the antistatic property and the gas barrier property,mentioned is a polyethylene terephthalate film containing a dye/hardcoat film/ITO/silicon-containing compound/ITO/silicon-containingcompound, and the like.

[0257] Further, as to the functional transparent layer (A) having theanti-reflection/anti-glare property, the hard coat property, theantistatic property and the gas barrier property, mentioned are a layermade of triacetyl cellulose film/hard coat film in which fine particlesof ITO are dispersed/a silicon-containing compound, and the like.

[0258] Further, a surface of the functional transparent layer (A) mayhave an anti-fouling property such that stainproof against a fingerprintand the like is imparted thereto or, when a stain is attached thereto,it can easily be removed therefrom. A material having the anti-foulingproperty is such a material as having a non-wetting property for waterand/or oils and fats; for example, a fluorine compound, and a siliconcompound are mentioned. When other functions such as theanti-reflection, and antistatic property are concurrently taken intoconsideration, the material should not interfere with these functions.On this occasion, the surface of the functional transparent layer (A)can be imparted with the anti-fouling property while maintaining theanti-reflection property and the antistatic property by using a fluorinecompound which has a low refractive index as a constituting material ofan anti-reflection film, or coating an outermost surface thereof with afluorine type organic molecule of from 1 to several molecules.

[0259] For example, as to the functional transparent layer (A) havingthe anti-fouling property, the anti-reflection property, the hard coatproperty, the antistatic property and the gas barrier property,mentioned are a mono-molecule coated film of a hard coatfilm/ITO/silicon-containing compound/ITO/silicon-containing compound/afilm coated with a mono fluorine type organic molecule, and the like.

[0260] Further, in order to prevent deterioration of the dye containedin the electromagnetic wave shielding body by an ultraviolet ray whichis irradiated from the display or contained in an external light, it ispreferable that the functional transparent layer (A) has an ultravioletray cutting-off property. For example, an anti-reflection filmcomprising a mono-layer or multi-layer of an inorganic thin film whichabsorbs the ultraviolet ray, a substrate constituting a functionaltransparent film which contains an ultraviolet ray absorbing agent, andthe functional transparent layer (A) having a hard coat film aresuitable to this case. No particular limitation is placed on a type anda concentration of the ultraviolet ray absorbing agent.

[0261] Further, at least one of the transparent adhesive layers maycontain the ultraviolet ray absorbing agent.

[0262] It is important that a member which cuts off an ultraviolet rayis disposed between a surface which the ultraviolet ray is incident onand a layer which contains the dye; on this occasion, the ultravioletcutting-off property may vary according to durability of the dye and isnot particularly limited.

[0263] 8. Thickness

[0264] There is a description: “Ordinarily, as thickness of a supportbecomes larger, a bending energy becomes larger and, accordingly,tackiness becomes larger, but from a certain point, tackiness isdecreased by influences of bending moment and other factors” in“Encyclopedia of Adhesion and Viscosity” (published by AsakuraPublishing Co., Ltd.) in regard to a relationship between thickness of asupport and tackiness. The present inventors have found that an opticalfilter film can easily be removed from a glass surface by allowing atotal thickness of a transparent polymer film to be 0.3 mm or more.Since rigidity of the optical filter film is mainly controlled by thetotal thickness of the transparent polymer film, it is surmised that aneffect according to the present invention is attributable to an effectof the bending moment. Further, with increase of the rigidity of theoptical filter film, such removal can continuously be performed by auniform strength whereupon paste remaining which would start from aremoval break point on the glass plate is hardly generated.

[0265] Further, as the total thickness of the transparent polymer filmbecomes larger, impact resistance thereof is enhanced more; however, asa number of laminating layers becomes larger, production efficiencybecomes lower whereupon, with substantial increase of the rigiditythereof, it becomes difficult to bond it direct on the display.Therefore, though the total thickness of the transparent polymer film isnot particularly limited, but it is in a range of preferably from 0.3 to1.0 mm and more preferably from 0.4 to 0.8 mm. Further, though thenumber of the laminating layers is not particularly limited, but it isin a range of preferably from 2 to 6 and more preferably from 2 to 4.

[0266] FIGS. 12 to 17 are cross-sectional diagrams each showing anexample of a constitution of a display filter according to theinvention.

[0267] In FIG. 12, a transparent adhesive layer 30, a transparentpolymer film (B) 23 (150 μm) having near-infrared shielding capacity, atransparent adhesive layer 30, a transparent polymer film (B) 24 (188μm) having a functional transparent layer (A) showing an anti-reflectionfunction are laminated in this order to constitute a display filter.

[0268] In FIG. 13, a transparent adhesive layer 30, a transparentpolymer film (B) 25 (200 μm) for increasing a total thickness, atransparent adhesive layer 30, a transparent polymer film (B) 23 (75 μm)having near-infrared shielding capacity, a transparent adhesive layer30, a transparent polymer film (B) 24 (80 μm) having a functionaltransparent layer (A) showing an anti-reflection function are laminatedin this order to constitute a display filter.

[0269] In FIG. 14, a transparent adhesive layer 30, a transparentpolymer film (B) 23 (75 μm) having near-infrared shielding capacity, atransparent adhesive layer 30, a transparent polymer film (B) 25 (200μm) for increasing a total thickness, a transparent adhesive layer 30, atransparent polymer film (B) 24 (80 μm) having a functional transparentlayer (A) showing an anti-reflection function are laminated in thisorder to constitute a display filter.

[0270] In FIG. 15, a transparent adhesive layer 30, a transparentpolymer film (B) 25 (200 μm) for increasing a total thickness, atransparent adhesive layer 30, a functional transparent layer (A)showing an anti-reflection function, a transparent polymer film (B) 26(150 μm) having near-infrared shielding capacity are laminated in thisorder to constitute a display filter.

[0271] In FIG. 16, a transparent adhesive layer 30, a transparentpolymer film (B) 25 (200 μm) for increasing a total thickness, atransparent adhesive layer 30, a transparent polymer film (B) 23 (75 μm)having a transparent electrically conductive layer (D) showing anelectromagnetic wave shielding function, a transparent adhesive layer30, a transparent polymer film (B) 24 (150 μm) having a functionaltransparent layer (A) showing an anti-glare function are laminated inthis order to form an electrode 50 on the transparent polymer film 23thereby constituting a display filter.

[0272] In FIG. 17, a transparent adhesive layer 30, a transparentpolymer film (B) 25 (200 μm) for increasing a total thickness, atransparent adhesive layer 30, a transparent polymer film (B) 26 (188μm) having a functional transparent layer (A) showing an anti-reflectionfunction and a transparent electrically conductive layer (D) showing anelectromagnetic wave shielding function are laminated in this order toform an electrode 50 on the transparent polymer films 25 and 26 therebyconstituting a display filter.

[0273]FIG. 18 is a cross-sectional diagram showing a constitution of thetransparent polymer film (B) 23 showing an electromagnetic waveshielding function shown in FIG. 16. On a polymer film (B) 20, formed isa transparent electrically conductive layer (D) 10 showing anelectromagnetic wave shielding function; on this occasion, thetransparent electrically conductive layer (D) 10 is constituted bylaminating a transparent thin film layer (Dt) 11 having a highrefractive index and a metallic thin film layer (Dm) 12 comprisingsilver or a silver alloy in an order of Dt/Dm/Dt/Dm/Dt. On a reverseside of a filter, disposed is a transparent adhesive layer 30 whichenables the filter to be adhered to the display screen.

[0274]FIG. 19 is a cross-sectional diagram showing a constitution of atransparent polymer film (B) 26 showing an electromagnetic waveshielding function shown in FIG. 17. On a polymer film (B) 20, formed isa transparent electrically conductive layer (D) 10 showing anelectromagnetic wave shielding function; on this occasion, thetransparent electrically conductive layer (D) 10 is constituted bylaminating a transparent thin film layer (Dt) 11 having a highrefractive index and a metallic thin film layer (Dm) 12 comprisingsilver or a silver alloy in an order of Dt/Dm/Dt/Dm/Dt/Dm/Dt. On anopposite side of the polymer film (B) 20, disposed is an anti-reflectionfilm 61 as a functional transparent layer (A). On a reverse side of afilter, disposed is a transparent adhesive layer 30 which enables thefilter to be adhered to the display screen.

[0275]FIG. 20 is a plan view of the display filter shown in FIGS. 16 and17. The filter is rectangular in form, and an image represented on thedisplay is observed through a central portion of the filter. In aperipheral portion of the filter comprising long sides and short sidesthereof, formed is an electrode 50 which is electrically connected witha transparent electrically conductive layer; on this occasion, theelectrode 50 is connected with a ground terminal of the display.

[0276] 9. Electrode

[0277] In equipment requiring electromagnetic wave shielding, anelectromagnetic wave is shielded by disposing a metal layer inside acase of the equipment or by using the case made of an electricallyconductive material. When transparency is required as in a displayscreen, a window-like electromagnetic wave shielding body in which atransparent electrically conductive layer is formed is disposed. Sincethe electromagnetic wave absorbed in the electrically conductive layerinduces electric charge, this electric charge must be escaped bygrounding the electrically conductive layer. Otherwise theelectromagnetic wave shielding body acts as an antenna for emittingelectromagnetic waves, resulting in a reduction in electromagnetic waveshielding capacity. Accordingly, it is necessary that theelectromagnetic wave shielding body and a ground portion of a main bodyof the display are electrically connected with each other. For thisreason, when the transparent adhesive layer (C) and the functionaltransparent layer (A) are formed on the transparent electricallyconductive layer (D) as shown in FIG. 3, it is preferable that thetransparent adhesive layer (C) and the functional transparent layer (A)are formed on the transparent electrically conductive layer (D) suchthat an electrically conducting portion is left.

[0278] No particular limitation is placed on a form of the conductingportion, but it is important that a clearance which an electromagneticwave is leaked through is not present between the electromagnetic waveshielding body and the main body of the display.

[0279] The term “electrode” as used herein is intended to include anelectrically conducting portion in the electromagnetic wave shieldingbody for an external member. The electrode may be an exposed portion ofthe transparent electrically conductive layer or be made either byprinting a metallic past having an electrically conductive property onthe exposed portion or by bonding an electrically conductive materialsuch as an electrically conductive tape, an electrically conductiveadhesive to the exposed portion for the purpose of protection thereofand a favorable electric connection. Alternatively, the electrode may beformed on the functional transparent layer such that it can secure anelectric connection with the transparent electrically conductive layer.As described above, thought no particular limitation is placed on ashape or a material of the electrode, it is preferable that theelectrode is formed such that the exposed portion of the transparentelectrically conductive layer is covered by the electrically conductivematerial.

[0280] However, the electrode according to the invention may be obtainedby contacting the electrically conductive material with across-sectional portion of a film comprising the transparentelectrically conductive layer according to the invention. Thecross-sectional portion, that is, the cross-sectional portion of thefilm comprising the transparent electrically conductive layer in whichat least the transparent electrically conductive layer and a film forprotecting it are stratified can be observed, and a desired electrodecan be obtained so long as an appropriate electrically conductivematerial is in contact with the transparent electrically conductivelayer in the cross-sectional portion.

[0281] On this occasion, when an edge portion of the transparentadhesive layer formed on the transparent electrically conductive layeris withdrawn inside from the edge portion of the transparentelectrically conductive layer and an electrode is formed by using anelectrically conductive paste, it is favorable that the electricallyconductive paste is penetrated into a resultant clearance whereupon acontacting area between the transparent electrically conductive layerand the electrode is increased.

[0282] FIGS. 21 to 25 are each a cross-sectional diagram showing anexample of a constitution of a display filter according to theinvention.

[0283] In FIG. 21, a transparent adhesive layer 30, a transparentpolymer film (B) 23, a transparent electrically conductive layer (D) 10,and an anti-glare film 71 which is a functional transparent layer (A)are laminated in this order to form an electrode 50 on the transparentelectrically conductive layer (D) 10 thereby constituting a displayfilter.

[0284] In FIG. 22, from the outside toward a display side, an anti-glarefilm 71 which is a functional transparent layer (A), a transparentpolymer film (B) 23, a transparent electrically conductive layer (D) 10are laminated in this order to form an electrode 50 in a periphery ofthe transparent electrically conductive layer (D) 10. On a reverse sideof the transparent electrically conductive layer (D) 10, a transparentadhesive layer 30 is disposed in a central portion thereof excluding theelectrode 50 thereby allowing the resultant laminate to be bonded to adisplay screen.

[0285] In FIG. 23, a transparent adhesive layer 30, a transparentpolymer film (B) 23, a transparent electrically conductive layer (D) 10,and an anti-glare film 71 which is a functional transparent layer (A)are laminated in this order to form an electrode 50 on an end surface ofa side edge of the resultant laminate thereby constituting a displayfilter.

[0286] In FIG. 24, a transparent adhesive layer 30, a transparentelectrically conductive layer (D) 10, a transparent polymer film (B) 23,an anti-glare film 71 which is a functional transparent layer (A) arelaminated in this order whereupon an electrically conductive tape 51such as a copper tape is interposed between the transparent adhesivelayer 30 and the transparent electrically conductive layer (D) 10 tosecure an electrical connection to the transparent electricallyconductive layer (D) 10 via a filter peripheral portion.

[0287] In FIG. 25, a transparent adhesive layer 30, a transparentelectrically conductive layer (D) 10, a transparent polymer film (B) 23,an anti-glare film 71 which is a functional transparent layer (A) arelaminated in this order whereupon a through-hole electrode 52 is formedin a direction of thickness of a filter thereby securing an electricalconnection to the transparent electrically conductive layer (D) 10.

[0288]FIG. 26 is a plan view of the display filter shown in FIGS. 21 to25. The filter is rectangular in form, and an image represented on thedisplay is observed by allowing it to pass through a central portion ofthe filter. On two long sides of the filter, formed are electrodes 50,electrically conductive tapes 51 or through-hole electrodes 52 which areelectrically connected with a transparent electrically conductive layer;on this occasion, these electrodes are connected with a ground terminalof the display. Further, an electrode of the display filter shown inFIGS. 21 to 25 may, needless to mention, be disposed in an entireperiphery of the filter in the same manner as in the plan view shown inFIG. 20.

[0289] As shown in FIG. 24, it is permissible that an electricallyconductive tape such as a copper tape is interposed between thetransparent electrically conductive layer and the transparent adhesivelayer to be bonded thereon to form an electrode by drawing out a portionof the electrically conductive tape to an outside of the electromagneticwave shielding body. On this occasion, the electrically conductive tapedrawn externally into the outside becomes a substantial electrode.

[0290] As shown in FIG. 25, it is permissible that a clearance whichextends from the transparent electrically conductive layer to anoutermost surface of the electromagnetic wave shielding body is providedto form an electrode. No particular limitation is placed on a shape ofthe clearance as viewed from the surface, and it is permissible that theshape is either circular or polygonal. Further, the clearance may beformed in a line shape. There is no particularly specified size inregard to individual clearances as viewed from the surface. However, itis not favorable that the size is unduly large such that the clearanceprotrudes into a visibility portion. A position of the clearance to beformed is not particularly limited so long as it avoids the visibilityportion. As a natural course, the position comes to be in a neighborhoodof an edge portion. No particular limitation is placed on a number ofclearances to be formed; however, it is preferable that the clearancesare formed as many as possible over an entire periphery to enhanceefficiency of drawing out an electric current. It is sufficient todispose the clearance between the transparent electrically conductivelayer and the outermost surface of the electromagnetic wave shieldingbody; on this occasion, it is preferable that the clearance passesthrough the transparent electrically conductive layer for an intentionof increasing a contact area with an electrode to be formed.

[0291] There is also no particular designation in regard to a member tofill the clearance. The clearance may be filled with a metallic materialor an electrically conductive paste. On this occasion, the member whichfills the clearance becomes a substantial electrode.

[0292] It is preferable that an electrically conducting portion isdeposited in a peripheral portion of the transparent electricallyconductive layer (D) in a continuous manner. Namely, it is preferablethat the conducting portion is deposited in frame form in a placeexcluding a central portion of the representation portion of thedisplay.

[0293] However, even in a case in which the conducting portion is notformed in the entire periphery, since there is a given electromagneticwave shielding capacity therein, there are many cases in which theconducting portion is used by taking into consideration a quantity ofelectromagnetic wave emission from the apparatus and a quantity ofpermissible electromagnetic wave leakage in a comprehensive manner.

[0294] For example, when a design is established such that theelectrically conductive material is provided only on sides of arectangle facing with each other to form electrodes, since each theelectrode can be formed by a roll-to-roll method or a method of usingthe electrically conductive material as it is in a roll state, it isconvenient that an optical filter can be prepared with extremelyfavorable production efficiency. Further, the method can also beutilized when the electrically conductive tape is used as an electrode,as previously shown.

[0295] There is no particular problem, even when another electrode isformed in another portion of the rectangle in addition to the portion oftwo sides of the rectangle facing with each other, or when a part inwhich an electrode is not formed is present within a portion of such twosides facing each other.

[0296] The electrode which covers the conducting portion becomes also aprotection for the transparent electrically conductive layer (D) whichis inferior in environmental resistance and scratch resistance. From theviewpoint of electric conductivity, corrosion resistance, adhesion tothe transparent electrically conductive film and the like, as materialswhich can be used for the electrode, employable are a metal as a simplesubstance selected from the group consisting of: silver, gold, copper,platinum, nickel, aluminum, chromium, iron, zinc, and carbon, an alloymade of two or more of these metals, a mixture of an synthetic resin andeither a simple substance of these metals or an alloy thereof, and apaste which is a mixture of borosilicate glass and either a simplesubstance of these metals or an alloy thereof. The electrode can beformed according to any of various conventionally known methods such asa metal plating method, a vacuum deposition method, and a sputteringmethod. Moreover, where a paste or the like is used for the electrode,other conventionally known methods such as a printing method and acoating method may also be employed.

[0297] No particular limitation is place on an electrically conductivematerial to be used, so long as it is electrically conductive.Ordinarily, a material having an electrically conductive property inpaste form such as a silver paste can be employed.

[0298] As a method of forming the electrode, when a material in pasteform is used, such formation thereof can be performed by first applyingit on a cross-sectional portion and, then, drying it. It is permissiblethat the electrically conductive material is applied to a side surfaceof a film in a rolled state, or the material is applied on the sidesurface of the film while the film is being unwound by a roll-to-rollmethod. Further, the electrically conductive material in tape form canalso be employed.

[0299] Furthermore, it is permissible that, after a transparent polymerfilm in which a transparent electrically conductive thin layer is formedon a transparent supporting substrate is bonded thereto, across-sectional portion of the resultant transparent polymer film isapplied with paste.

[0300] As a method of application, from the viewpoint of efficiency andaccuracy, screen printing is employed in many cases.

[0301] Further, when an electrode is formed by filling a clearance by ametallic member, after the electromagnetic wave shielding body itselfmay not be previously treated. A metallic ground portion in which ascrew hole is formed is previously prepared in a peripheral portion of arepresentation portion of a display apparatus and, then, after theelectromagnetic wave shielding body is bonded to the representationportion of the display apparatus including the metallic ground portion,an electrically conductive screw may be fit in the screw hole of themetallic ground portion such that it penetrates the electromagnetic waveshielding body. On this occasion, such an electrically conductive screwsubstantially serves as an electrode. When this method is utilized, notonly it is possible to prepare the electromagnetic wave shielding bodywith a high productivity by means of the roll-to-roll method, but alsoit is easy to form an electrode over an entire peripheral portion of theelectromagnetic wave shielding body.

[0302] 10. Electromagnetic Wave Shielding

[0303] In order to allow leakage of an electromagnetic wave from betweenthe electromagnetic wave shielding body and a display apparatus to beminimal, it is necessary to decrease an insulating interval between anelectrically conductive layer of the electromagnetic wave shielding bodyand the display apparatus. When air or other insulating substances arepresent in a clearance, the electromagnetic wave unfavorably comes outtherefrom.

[0304] When the electromagnetic wave shielding body is prepared bybonding a transparent electrically conductive film to a supportingsubstrate as has conventionally been done, the supporting substratewhich is an insulating substance is allowed to be present between thetransparent electrically conductive layer and the display apparatus; onthis occasion, unless the transparent electrically conductive layer andthe display apparatus were in contact with each other over an entireperiphery such that electric conductivity is maintained, a sufficientelectromagnetic wave shielding effect was not able to be obtained. Forthis reason, in a production process of the electromagnetic waveshielding body a process that the transparent electrically conductivefilm is bonded to a transparent supporting substrate in sheet form andalso an operation that an electrode is formed in an entire peripheralportion of the sheet have been necessary.

[0305] In the invention, when the electromagnetic wave shielding body ina film state is bonded directly to the display apparatus, since adistance between the electrically conductive layer and the displayapparatus is extremely short, the insulating interval can substantiallybe narrowed comparing with a conventional method; on this occasion, asufficient electromagnetic wave shielding effect can favorably beobtained without forming an electrode in an entire peripheral portion.This effect is conspicuous when the transparent electrically conductivelayer of the electromagnetic wave shielding body is formed to a side ofthe display apparatus. Namely, a sufficient electromagnetic waveshielding effect can be obtained by forming an electrode only on twolong sides of a rectangle. On this occasion, it is extremely favorablethat a roll-to-roll method which is a method having an extremely highproductivity as a production method can be utilized.

[0306] 11. Display Apparatus and Method for Production of the Same

[0307] A display apparatus according to the invention comprises adisplay filter functioning as an electromagnetic wave shielding bodyand/or a light control film which is adhered to a representation portionof the apparatus. The electromagnetic wave shielding body electricallycontacts the display apparatus.

[0308] As a method for production of the display apparatus according tothe invention, mentioned, but not limited thereto, are mainly followingmethods (1) to (10):

[0309] Method (1): the electromagnetic wave shielding body according tothe invention comprising a functional transparent layer (A) and anelectrically conducting portion (and an electrode)/a transparentelectrically conductive layer (D)/a polymer film (B) (and a hard coatlayer (F))/a transparent adhesive layer (C), or a functional transparentlayer (A) and an electrically conducting portion (and an electrode)/atransparent adhesive layer (C)/a transparent electrically conductivelayer (D)/a polymer film (B) (and a hard coat layer (F))/a transparentadhesive layer (C) is bonded to a representation portion of a displayapparatus such that the transparent adhesive layer (C) comes to be asurface to be bonded.

[0310] After a bonding operation is performed, an electrical conductingportion of the electromagnetic wave shielding body according to theinvention or an electrode formed on the electrically conducting portionand an electrically conducting portion of a main body of a displayapparatus, that is, a ground portion, are electrically connected witheach other by means of an electrically conductive tape, an electricallyconductive adhesive, an electrically conductive paint or an electricallyconductive molded member.

[0311] Method (2): After a laminate comprising a transparentelectrically conductive layer (D)/a polymer film (B) (and a hard coatlayer (F))/a transparent adhesive layer (C) in this order is bonded to arepresentation portion of a display apparatus such that that thetransparent adhesive layer (C) comes to be a surface to be bonded, afunctional transparent layer (A) is formed on the transparentelectrically conductive layer (D) while leaving an electricallyconducting portion directly or via the transparent adhesive layer (C)and, further, an electrically conducting portion of the laminate and anelectrically conducting portion, that is, an ground portion, of a mainbody of a display apparatus are electrically connected with each otherby means of an electrically conductive tape, an electrically conductiveadhesive, an electrically conductive coating material or an electricallyconductive molded member.

[0312] Method (3): After a transparent adhesive layer (C) is applied orbonded to a representation portion of a display apparatus and, then, alaminate comprising a functional transparent layer (A) and anelectrically conducting portion (and an electrode)/a transparentelectrically conductive layer (D)/a polymer film (B) (and a hard coatlayer (F)) in this order is bonded to the resultant representationportion such that the polymer film (B) comes to be a surface to bebonded, an electrically conducting portion of the laminate and anelectrically conducting portion of a main body of the display apparatus,that is, a ground portion are electrically connected with each other bymeans of an electrically conductive tape, an electrically conductiveadhesive, an electrically conductive paint or an electrically conductivemolded member.

[0313] Method (4): After a transparent adhesive layer (C) is applied orbonded to a representation portion of a display apparatus and, then, atransparent laminate comprising a transparent electrically conductivelayer (D)/a polymer film (B) (and a hard coat layer (F)) in this orderis bonded to the resultant representation portion such that the polymerfilm (B) comes to be a surface to be bonded, a functional transparentlayer (A) is formed on the transparent electrically conductive layer (D)while leaving an electrically conducting portion directly or via asecond transparent adhesive layer and, further, an electricallyconducting portion of the laminate and an electrically conductingportion of a main body of the display apparatus, that is, a groundportion are electrically connected with each other by means of anelectrically conductive tape, an electrically conductive adhesive, anelectrically conductive paint or an electrically conductive moldedmember.

[0314] Method (5): An electromagnetic wave shielding body comprising afunctional transparent layer (A)/polymer film (B)/a transparentelectrically conductive layer (D)/a transparent adhesive layer (C) andan electrically conductive adhesive layer is bonded to at least arepresentation portion of a display apparatus such that the transparentadhesive layer (C) comes to a surface to be bonded and, further, to atleast a ground portion of a display apparatus such that the electricallyconductive adhesive layer comes to be a surface to be bonded.

[0315] Method (6): After a transparent adhesive layer (C) is formed onat least a representation portion of a display apparatus or atranslucent portion on a transparent electrically conductive layer (D)of a laminate comprising the transparent electrically conductive layer(D)/a polymer film (B)/a functional transparent layer (A) and, further,an electrically conductive layer is formed on at least a ground portionof the display apparatus or the transparent electrically conductivelayer (D) of the laminate, the laminate and the display apparatus arebonded to each other.

[0316] Method (7): An electromagnetic wave shielding body, comprising afunctional transparent layer (A)/a polymer film (B)/a transparentelectrically conductive layer (D)/a transparent adhesive layer (C) andan electrically conductive adhesive layer, in which an electricallyconductive tape such as a copper tape is interposed between thetransparent electrically conductive layer (D) and the polymer film (B)at an edge portion thereof is bonded to at least a representationportion of a display apparatus such that the transparent adhesive layer(C) comes to be a surface to be bonded and, further, an outer exposedportion of the electrically conductive tape is bonded to at least groundportion of the display apparatus.

[0317] Method (8): After a transparent adhesive layer (C) is formed inat least a representation portion of a display apparatus or at least atranslucent portion on a transparent electrically conductive layer (D)of a laminate, comprising a transparent electrically conductive layer(D)/a polymer film (B)/a functional transparent layer (A) in this order,in which an electrically conductive tape such as a copper tape isinterposed between the transparent electrically conductive layer (D) andthe polymer film (B) at an edge portion thereof and, further, anelectrically conductive adhesive layer is formed on at least a groundportion of the display apparatus or the transparent electricallyconductive layer (D) of the laminate, the laminate and the displayapparatus are bonded to each other.

[0318] Since the electromagnetic wave shielding body is excellent intransmission characteristics, transmittance and visible light rayreflectance, color purity and contrast of a plasma display can beenhanced without tremendously detracting from luminance of the plasmadisplay by forming the electromagnetic wave shielding body in thedisplay. Further, since the electromagnetic wave shielding body isexcellent in electromagnetic wave shielding capacity which blocks anelectromagnetic wave which is considered to be harmful to health andefficiently cuts off a near-infrared ray, having a wavelength region offrom about 800 to about 1,100 nm, emerging from the plasma display, theelectromagnetic wave shielding body exerts no adverse influence onwavelengths used in a remote controller of neighboring electronicequipment, optical communications by a transmission system or the like,and hence can prevent a malfunction thereof. Further, it has goodweather resistance and environmental resistance, as well asanti-reflection property and/or an anti-glare property, scratchresistance, an anti-fouling property, an anti-electrostatic property andthe like and can be provided at low cost. By comprising theelectromagnetic wave shielding body according to the invention, theplasma display having excellent characteristics can be provided.

[0319] Since the electromagnetic wave shielding body according to theinvention is excellent in an optical characteristic, electromagneticwave shielding capacity, a near-infrared ray cutting-off capacity, theelectromagnetic wave shielding body can advantageously be used invarious types of other displays such as an FED (Field Emission Display)and a CRT (Cathode Ray Tube) which emit an electromagnetic wave and/or anear-infrared ray than the plasma display.

[0320] In regard to a method for production of the display apparatuscomprising a light control film, mentioned, but not limited thereto, aremainly following two methods:

[0321] Method (9): At least a light control film according to theinvention comprising a functional transparent layer (A)/a polymer film(B)/a transparent adhesive layer (C) is bonded to at least arepresentation portion of a display apparatus such that the transparentadhesive layer (C) comes to be a surface to be bonded.

[0322] Method (10): a transparent adhesive layer (C) is formed in atleast a representation portion of a display apparatus and, then, alaminate comprising at least a transparent electrically conductive layer(D)/a polymer film (B) in this order is bonded to the display apparatussuch that the polymer film (B) comes to be a surface to be bonded.

[0323] Since the light control film according to the invention isexcellent in transmission characteristics, transmittance and areflection characteristic, color purity and contrast of a plasma displaycan be enhanced without substantially detracting from luminance of theplasma display by forming the light control film directly in therepresentation portion of the display such as a color plasma display.Further, it concurrently has good scratch resistance, an anti-foulingproperty, an anti-electrostatic property and the like and can beprovided at low cost.

[0324] Further, by forming the light control film according to theinvention directly on a surface of the display and comprising thethus-formed display, the display apparatus having excellentcharacteristics can be provided.

EXAMPLES

[0325] The present invention is further illustrated by the followingexamples. However, these examples are not to be construed to limit thescope of the invention.

[0326] A thin film constituting a transparent electrically conductivelayer (D) in the examples is deposited on a major surface of one side ofa substrate by a magnetron DC sputtering process. Thickness of the thinfilm is a value determined from film-deposition conditions, and is not avalue obtained by actually measuring the thin film.

[0327] A high-refractive-index transparent thin film layer (Dt) wasformed by an ITO thin film; and the ITO film was deposited by using anindium oxide/a tin oxide sintered body (composition ratio isIn₂O₃:SnO₂=90:10 wt %) or the tin oxide sintered body as a target and anargon-oxygen gaseous mixture (with a total pressure of 266 mPa and apartial pressure of oxygen of 5 mPa) as a sputtering gas.

[0328] A metallic thin film layer (Dm) is formed by a silver thin filmor a silver-palladium alloy thin film; the metallic thin film wasdeposited by using silver or the silver-palladium alloy (palladiumcontent being 10 wt %) as a target and argon gas (with a total pressureof 266 mPa) as a sputtering gas.

[0329] Further, surface resistance of the transparent electricallyconductive layer was measured with a four-probe method (probe spacingbeing 1 mm). Further, with respect to visible light ray reflectance(Rvis) of a surface thereof, first of all, a small piece was cut out ofan object to be measured and, next, after a transparent adhesive layerwas removed therefrom and a surface thereof in a side of a polymer film(B) was roughened by a sandpaper, the surface was deprived of areflecting property by being sprayed by a matting black paint. Using anintegrating sphere (a light ray incidence angle being 6°), a total lightray reflectance of the thus-treated small piece in a visible wavelengthregion was measured with a spectrophotometer (U-3400; manufactured byHitachi, Ltd.). From the reflectance thus obtained, the visible lightray reflectance (Rvis) was calculated in accordance with JIS R-3106.

Example 1

[0330] Designating a biaxially stretched polyethylene terephthalate(hereinafter referred to also as PET) film (188 μm thick) as a polymerfilm (A), a transparent electrically conductive layer (B) comprising 7layers in total made up of an ITO thin film (40 nm thick), a silver thinfilm (11 nm thick), an ITO thin film (95 nm thick), a silver thin film(14 nm thick), an ITO thin film (90 nm thick), a silver thin film (12 nmthick) and an ITO thin film (40 nm thick) in this order as viewed from aside of the PET film was formed on one major surface of the PET film toprepare a transparent laminate 1 comprising the transparent electricallyconductive layer (B) having a surface resistance of 2.2 Ω/square.

[0331] A cross-section of a PET film/a transparent electricallyconductive layer is shown in FIG. 1 as an example of a polymer film(B)/a transparent electrically conductive layer (D) according to theinvention. A reference numeral 10 in FIG. 1 denotes a transparentelectrically conductive layer (D), a reference numeral 11 denotes ahigh-refractive-index transparent thin film layer (Dt), a referencenumeral 12 denotes a metallic thin film layer (Dm) and a referencenumber 20 denotes a polymer film (B).

[0332] An organic dye was disperse-dissolved in a solvent of ethylacetate/toluene (50:50 wt %) to prepare a diluting liquid for an acrylicadhesive. An acrylic adhesive and a diluting liquid containing a dyewere mixed with each other at a mixing ratio of 80:20 wt % and, then,after the resultant mixture was applied in a thickness of 25 μm on asurface in a side of the polymer film (B) of the transparent laminate 1by means of a comma coater and dried, a mold releasing film waslaminated on an adhesive face to form a transparent adhesive layer (C)(adhesive 1) interposed between the mold releasing film and the polymerfilm (B) of the transparent laminate. On this occasion, a refractiveindex of the adhesive 1 was 1.51 and an extinction coefficient thereofwas 0.

[0333] As an organic dye, a dye PD-319 manufactured by Mitsui Chemicals,Inc. having an absorption maximum in a wavelength of 595 nm forabsorbing an unnecessary luminescence emitted from a plasma display anda red color dye PS-Red-G manufactured by Mitsui Chemicals, Inc. forcorrecting chromaticity of white color luminescence were used to adjustthe acrylic adhesive/the dye-containing diluting liquid such that thesedyes are contained in a dried adhesive 1 in amounts of 1150 (wt)ppm and1050 (wt)ppm, respectively. Further, PD-319 is atetra-t-butyl-tetraazaporphyrin/vanadyl complex expressed by thefollowing formula (3):

[0334] A coating liquid in which a photopolymerization initiator isadded to a multi-functional methacrylate resin and, further, ITO fineparticles (average particle diameter: 10 nm) are dispersed thereto wascoated on one major surface of a triacetyl cellulose (TAC) film(thickness: 80 μm) by a gravure coater and cured by an ultraviolet rayto form an electrically conductive hard coat film (film thickness: 3 μm)and, then, a fluorine-containing organic compound solution was coated onthe thus-formed hard coat film by a micro gravure coater and dry-curedat 90° C. to form an anti-reflection film (film thickness: 100 nm)having a refractive index of 1.4 whereupon an anti-reflection film 1 wasobtained as a functional transparent layer (E) having a hard coatproperty (pencil hardness in accordance with JIS K-5400: 2H), a gasbarrier property (in accordance with ASTM-E96, 1.8 g/m² day), ananti-reflection property (Rvis of surface: 1.0%), an antistatic property(surface resistance: 7×10⁹ Ω/square) and an anti-fouling property. Anadhesive/a diluting liquid comprising same raw materials as in theadhesive 1 but not containing a dye was applied on the other majorsurface of the anti-reflection film 1 and, then, dried to form atransparent adhesive layer (adhesive 2) having a thickness of 25 μm and,thereafter, a mold releasing film was laminated on the thus-formedtransparent adhesive layer.

[0335] A material of a transparent laminate 1/an adhesive 1/a moldreleasing film in roll form was cut into a size of 970 mm×570 mm andfixed on a supporting plate made of glass such that a surface of atransparent electrically conductive layer (D) comes on the top. Further,an anti-reflection film was laminated only on an inside portion of thetransparent electrically conductive layer (D) while leaving anelectrically conducting portion such that 20 mm wide of a peripheralportion thereof was exposed by using a laminator. A plan view as viewedfrom a surface of the transparent electrically conductive layer (D) wasshown in FIG. 2 as an example of the electromagnetic wave shielding bodyaccording to the invention. In FIG. 2, a reference numeral 02 denotes atranslucent portion of the electromagnetic wave shielding body and areference numeral 03 denotes an electrically conducting portion of theelectromagnetic wave shielding body.

[0336] Further, a silver paste (MSP-600F; manufactured by MitsuiChemicals, Inc.) was screen-printed to an area of 22 mm wide of aperipheral portion of the transparent electrically conductive layer (D)such that the silver past covers an exposed electrically conductingportion and, then, dried to form an electrode of 15 μm thick.Thereafter, the resultant material was removed from the supporting plateto prepare the electromagnetic wave shielding body according to theinvention having a mold releasing film on a surface of the transparentadhesive layer (C).

[0337] Thereafter, the electromagnetic wave shielding body was deprivedof the mold releasing film and was bonded to a front surface(representation portion: 920 mm×520 mm) of a plasma display panel by asheet fed laminator and, then, was subjected to an autoclave treatmentunder heating and pressure conditions of 60° C. and 2×105 Pa. Anelectrode portion of the electromagnetic wave shielding body and aground portion of the plasma display panel were bonded to each other byusing an electrically conductive copper foil adhesive tape (510FR)manufactured by Teraoka Seisakusho Co., Ltd. to obtain a displayapparatus comprising the electromagnetic wave shielding body accordingto the invention. A cross-section of the electromagnetic wave shieldingbody is shown in FIG. 3 as an example of the electromagnetic waveshielding body according to the invention and a mounted state thereof.In FIG. 3, a reference numeral 00 denotes a display area, a referencenumeral 10 denotes a transparent electrically conductive layer (D), areference numeral 20 denotes a polymer film (B), a reference numeral 31denotes a transparent adhesive layer (C) containing a dye, a referencenumeral 40 denotes a transparent adhesive layer (E), a reference numeral50 denotes an electrode, a reference numeral 60 denotes a functionaltransparent layer (A) having an anti-reflection property, a hard coatproperty, a gas barrier property, an antistatic property and ananti-fouling property, a reference numeral 61 denotes an anti-reflectionfilm having an anti-fouling property, a reference numeral 62 denotes ahard coat film having an antistatic property, a reference numeral 63denotes a transparent substrate in which the hard coat film 62 and theanti-reflection film 61 are formed and a reference numeral 80 denotes anelectrically conductive copper foil adhesive tape.

Example 2

[0338] Polyethylene terephthalate pellets 1203 (manufactured by Unitika,Ltd.) were mixed with 0.01% by weight of a red color dye PS-Red-Gmanufactured by Mitsui Chemicals, Inc. for correcting chromaticity ofwhite color luminescence and 0.015% by weight of a violet color dyePS-Violet-RC manufactured by Mitsui Chemicals, Inc., melted at atemperature of from 260° C. to 280° C. and extruded to form a filmhaving a thickness of 200 μm. Thereafter, this film was biaxiallystretched to prepare a PET film (polymer film (B)) containing a dye andhaving a thickness of 100 μm.

[0339] On one major surface of the PET film, a coating liquid in whichalkoxysilane was decomposed by glacial acetic acid and added with asilicone type surface smoothing agent was applied by a gravure coater,and then thermally cured at 120° C. to form a hard coat film (filmthickness: 10 μm, pencil hardness: 3H) thereby obtaining a PET filmcontaining a dye in which a hard coat layer (F) is formed. On the hardcoat layer, a transparent electrically conductive layer (D) comprising 5layers in total made up of an SnO₂ thin film (film thickness: 40 nm), asilver thin film (film thickness: 9 nm), an SnO₂ thin film (filmthickness: 80 nm), a silver-palladium alloy thin film (film thickness:11 nm), and an SnO₂ thin film (film thickness: 40 nm) in this order andhaving a surface resistance of 5.3 Ω/square is formed to prepare atransparent laminate 2 comprising a PET film containing a dye/a hardcoat layer (F)/a transparent electrically conductive layer (D) Anadhesive/a diluting liquid comprising same raw materials as in theadhesive 1 but not containing a dye was applied on a surface of PET filmof the transparent laminate 2 and, then, dried to form a transparentadhesive layer (C) (adhesive 3) having a thickness of 25 μm and,thereafter, a mold releasing film was laminated on the thus-formedtransparent adhesive layer (C).

[0340] A material comprising a transparent laminate 2/an adhesive 3/amold releasing film in roll form was cut into a size of 970 mm×570 mmand fixed on a supporting plate made of glass such that a surface of atransparent electrically conductive layer (D) comes on the top.

[0341] A coating liquid in which a photopolymerization initiator isadded to a multi-functional methacrylate resin and, further, organicsilica fine particles (average particle size: 15 μm) are dispersedthereto was prepared.

[0342] The coating liquid was flexo-graphically printed only on aninside portion of the transparent electrically conductive layer (D)while leaving an electrically conducting portion thereof such that 20 mmwide of a peripheral portion thereof was exposed, and cured by anultraviolet ray to form an anti-glare layer as a functional transparentlayer (A) having an anti-glare property (haze value measured by a hazemeter: 5%), and a hard coat property (pencil hardness: 2H). Thereafter,the resultant material was removed from the supporting plate to preparethe electromagnetic wave shielding body according to the inventionhaving a mold releasing film on a surface of the transparent adhesivelayer (C).

[0343] Thereafter, the electromagnetic wave shielding body was deprivedof the mold releasing film and was bonded to a front surface(representation portion: 920 mm×520 mm) of a plasma display panel by asheet fed laminator and, then, was subjected to an autoclave treatmentunder heating and pressure conditions of 60° C. and 2×105 Pa. Anelectrically conducting portion of the electromagnetic wave shieldingbody and a ground portion of the plasma display panel were connected toeach other by using an electrically conductive copper foil adhesive tape(510FR) manufactured by Teraoka Seisakusho Co., Ltd. to obtain a displayapparatus comprising the electromagnetic wave shielding body accordingto the invention.

[0344] A cross-section of the electromagnetic wave shielding body isshown in FIG. 4 as an example of the electromagnetic wave shielding bodyaccording to the invention and a mounted state thereof. In FIG. 4, areference numeral 00 denotes a display area, a reference numeral 10denotes a transparent electrically conductive layer (D), a referencenumeral 21 denotes a polymer film (B) containing a dye, a referencenumeral 22 denotes a hard coat layer (F), a reference numeral 30 denotesa transparent adhesive layer (C), a reference numeral 70 denotes ananti-glare layer (a functional transparent layer (E) having ananti-glare property and a hard coat property), and a reference numeral80 denotes an electrically conductive copper foil adhesive tape.

Example 3

[0345] In the same manner as in Example 1, a laminate comprising apolymer film (B)/a transparent electrically conductive layer (D) wasprepared.

[0346] Further, on a major surface of the PET film/transparentelectrically conductive layer wound in roll form, opposite to a PET filmthereof, a next functional transparent layer 1 was continuously formedas a functional transparent layer (A) by a roll-to-roll method. Namely,a coating liquid in which a photopolymerization initiator was added to amulti-functional methacrylate resin and, further, ITO fine particles(average particle diameter: 10 nm) were added thereto was applied by agravure coater and, then, cured by an ultraviolet ray to form anelectrically conductive hard coat film (film thickness: 3 μm) and, then,a fluorine-containing organic compound solution was coated on thethus-formed hard coat film by a micro gravure coater and dry-cured at90° C. to form an anti-reflection film (film thickness: 100 nm) having arefractive index of 1.4 thereby forming a functional transparent layer(A) having a hard coat property (pencil hardness in accordance with JISK5400: 2H), an anti-reflection property (Rvis of surface: 0.9%), anantistatic property (surface resistance: 7×10⁹ Ω/square), and ananti-fouling property. The a functional transparent layer (A)/a polymerfilm (B)/a transparent electrically conductive layer (D) in roll formwas cut into a size of 970 mm×570 mm and fixed on a supporting platemade of glass such that the transparent electrically conductive layer(B) comes to the top. An organic dye was disperse-dissolved in a solventof ethyl acetate/toluene (50:50 wt %) to prepare a diluting liquid foran acrylic adhesive. The acrylic adhesive/the diluting liquid containinga dye (80:20 wt %) were mixed and the resultant mixture was applied onthe transparent electrically conductive layer (D) except for 22 mm wideof a peripheral portion thereof with a film thickness of 25 μm on a drybasis by a batch type die coater and, then, dried to form an adhesive 1as the transparent adhesive layer (C). Further, a refractive index ofthe adhesive 1 was 1.51 and an extinction coefficient was 0.

[0347] As organic dyes, a dye PD-319 manufactured by Mitsui Chemicals,Inc. having an absorption maximum in a wavelength of 595 nm forabsorbing an unnecessary luminescence irradiated from a plasma displayand a red color dye PS-Red-G manufactured by Mitsui Chemicals, Inc. forcorrecting chromaticity of white color luminescence were used to adjustthe acrylic adhesive/the dye-containing diluting liquid such that thesedyes are contained in a dried adhesive 1 in amounts of 1150 (wt) ppm and1050 (wt) ppm, respectively. Further, PD-319 is atetra-t-butyl-tetraazaporphyrin/vanadyl complex expressed by thefollowing formula (3):

[0348] Further, a two-component type room temperature setting adhesive(3381; manufactured by Three Bond Co., Ltd.) was printed to an area of22 mm wide of a peripheral portion of the transparent electricallyconductive layer (D) by using a metal mask such that an exposedelectrically conducting portion of the transparent electricallyconductive layer (D) is covered and, then, dried to form an electricallyconductive adhesive layer having a thickness of 25 μm.

[0349] After the thus-formed electrically conductive adhesive layer wasremoved from a supporting body, a mold releasing film was laminated toeach of the transparent adhesive layer (C) and electrically conductiveadhesive surfaces to prepare an electromagnetic wave shielding bodyaccording to the invention having a mold releasing film on one surfacethereof.

[0350] Further, after being deprived of the mold releasing film, theelectromagnetic wave shielding body was bonded to a front surface(representation portion: 920 mm×520 mm) of a plasma display panel byusing a sheet fed laminator. On this occasion, bonding operations of thetransparent adhesive layer (C) portion and the electrically conductiveadhesive layer were performed such that they were in registry with atleast the representation portion and at least a ground portion,respectively. After such bonding operations, the resultant plasmadisplay panel was subjected to an autoclave treatment under heat andpressure conditions of 60° C. and 2×10⁵ Pa to obtain a display apparatuscomprising the electromagnetic wave shielding body according to theinvention.

[0351] A plane as viewed from a side of a transparent adhesive layer ofthe electromagnetic wave shielding body is shown in FIG. 5 as a planview showing an example of the electromagnetic wave shielding bodyaccording to the invention. In FIG. 5, a reference numeral 31 denotes atransparent adhesive layer (C) containing a dye and a reference numeral41 denotes an electrically conductive adhesive layer.

[0352] A cross-section of the electromagnetic wave shielding body isshown in FIG. 6 as a cross-sectional diagram showing an example of theelectromagnetic wave shielding body according to the invention and amounted state thereof. In FIG. 6, a reference numeral 00 denotes adisplay area, a reference numeral 10 denotes a transparent electricallyconductive layer (D), a reference numeral 20 denotes a polymer film (B),a reference numeral 31 denotes a transparent adhesive layer (C)containing a dye, a reference numeral 41 denotes an electricallyconductive adhesive layer, a reference numeral 60 denotes a functionaltransparent layer (A) having an anti-reflection property, a hard coatproperty, an antistatic property and an anti-fouling property, areference numeral 61 denotes an anti-reflection film having ananti-fouling property, and a reference numeral 62 denotes a hard coatfilm having an antistatic property.

Example 4

[0353] A polymer film (B) was prepared in the same manner as in Example3.

[0354] Polyethylene terephthalate pellets 1203 (manufactured by Unitika,Ltd.) were mixed with 0.01% by weight of a red color dye PS-Red-Gmanufactured by Mitsui Chemicals, Inc. for correcting chromaticity ofwhite color luminescence and 0.015% by weight of a violet color dyePS-Violet-RC manufactured by Mitsui Chemicals, Inc., melted at atemperature of from 260° C. to 280° C. and extruded to form a filmhaving a thickness of 200 μm. Thereafter, this film was biaxiallystretched to prepare a PET film which contains a dye and is a polymerfilm (B) containing a dye and having a thickness of 100 μm.

[0355] On one major surface of the PET film, a transparent electricallyconductive layer (D) comprising 5 layers in total made up of an SnO₂thin film (film thickness: 40 nm), a silver thin film (film thickness: 9nm), an SnO₂ thin film (film thickness: 80 nm), a silver-palladium alloythin film (film thickness: 11 nm), and an SnO₂ thin film (filmthickness: 40 nm) in this order and having a surface resistance of 5.3Ω/square is formed to prepare a transparent laminate 2 comprising a PETfilm containing a dye/a transparent electrically conductive layer (D) bya roll-to-roll method.

[0356] Further, on a major surface of the PET film/the transparentelectrically conductive layer wound in roll form, opposite to the PETfilm thereof, a next functional transparent film 2 was continuouslyformed as a functional transparent layer (A) by a roll-to-roll method. Acoating liquid in which a photopolymerization initiator was added to amulti-functional methacrylate resin and, further, organic silica fineparticles (average particle diameter: 15 μm) were dispersed therein wasprepared, applied and, then, cured by an ultraviolet ray to form ananti-glare layer as a functional transparent layer (A) having ananti-glare property (haze value measured by a haze meter: 5%), a hardcoat property (pencil hardness: 2H).

[0357] The functional transparent layer (A)/a polymer film (B)/atransparent electrically conductive layer (D) in roll form was cut intoa size of 970 mm×570 mm and fixed on a supporting plate made of glasssuch that the transparent electrically conductive layer (D) comes to thetop.

[0358] An adhesive 2 comprising same raw materials as in the adhesive 1in Example 1 except that a dye was not contained was formed on a moldreleasing film surface in a thickness of 25 μm. The adhesive 2/the moldreleasing film was laminated on the transparent electrically conductivelayer while leaving 20 mm wide of a peripheral portion thereofunlaminated by using a frame-bonding laminator such that a surface ofthe adhesive 2 is a surface to be bonded. Further, after the moldreleasing film was removed from one side thereof, an electricallyconductive double-faced adhesive tape (WMFT791; manufactured by TeraokaSeisakusho Co., Ltd.) was bonded to an area of 20 mm wide of theperipheral portion thereof such that an exposed electrically conductingportion of the transparent electrically conductive layer (D) wascovered.

[0359] By being removed from the supporting body, the electromagneticwave shielding body according to the invention having a mold releasingfilm on one side thereof was prepared. Further, the electromagnetic waveshielding body was deprived of the mold releasing film and, then, bondedto a front surface (representation portion: 920 mm×520 mm) of a plasmadisplay panel by a sheet fed laminator. On this occasion, bondingoperations of the transparent adhesive layer (C) portion and theelectrically conductive adhesive layer were performed such that theywere in registry with at least the representation portion and at least aground portion, respectively. After such bonding operations, theresultant plasma display panel was subjected to an autoclave treatmentunder heat and pressure conditions of 60° C. and 2×10⁵ Pa to obtain adisplay apparatus comprising the electromagnetic wave shielding bodyaccording to the invention.

[0360] A cross-section of the electromagnetic wave shielding body isshown in FIG. 7 as a cross-sectional diagram showing an example of theelectromagnetic wave shielding body according to the invention and amounted state thereof. In FIG. 7, a reference numeral 00 denotes adisplay area, a reference numeral 10 denotes a transparent electricallyconductive layer (D), a reference numeral 21 denotes a polymer film (B)containing a dye, a reference numeral 30 denotes a transparent adhesivelayer (C), a reference numeral 41 denotes an electrically conductiveadhesive layer, and a reference numeral 70 denotes an anti-glare layer(a functional transparent layer (E) having an anti-glare property and ahard coat property).

Comparative Example 1

[0361] On a major surface of a PET film (thickness: 188 μm) as a polymerfilm (B), a transparent electrically conductive layer having a surfaceresistance of 15 Ω/square and comprising an ITO thin film (filmthickness: 400 nm) is formed to prepare a transparent laminate 3. Byusing the transparent laminate 3, an electromagnetic wave shielding bodyis prepared in the same manner as in Example 1 except that a dye is notused to obtain a display apparatus comprising the thus-preparedelectromagnetic wave shielding body.

[0362] The thus-obtained plasma displays which are display apparatusseach comprising the electromagnetic wave shielding body according toinvention in Examples 1 to 4 were evaluated according to proceduresdescribed below.

[0363] 1) Transmittance of Electromagnetic Wave Shielding Body

[0364] By using a CRT color analyzer (CA100) manufactured by MinoltaCo., Ltd., spectral radiance of a plasma display in each case of beforeand after an electromagnetic wave shielding body was formed therein wasdetermined; a ratio of radiance after the electromagnetic wave shieldingbody was formed therein against radiance before the electromagnetic waveshielding body was formed therein was shown in percentage.

[0365] 2) Contrast Ratio of Plasma Display in Bright Place (RatioBetween Highest Luminance and Lowest Luminance)

[0366] An evaluation was conducted in each case of before and after anelectromagnetic wave shielding body was formed. At a bright time ofabout 100 lx of an environmental luminance, with regard to a plasmadisplay panel, a maximum luminance (cd/m²) at a time of white colordisplay and aminimum luminance (cd/m²) at a time of black color displaywere measured by using a luminance meter (LS-110) manufactured byMinolta Co., Ltd. to determine a ratio (maximum luminance/minimumluminance) therebetween.

[0367] 3) Colorimetric Purity of Luminescent Color of Plasma Display

[0368] An evaluation was conducted in each case of before and after anelectromagnetic wave shielding body was formed. Measurements wereconducted in both cases in which a display filter was not mounted to theplasma display and the display filter in Examples 1 and 2 was mountedthereto.

[0369] In a white color (W) display, a red color (R) display, a greencolor (G) display, and a blue color (B) display, RGB chromaticity (x,y), white color chromaticity, a white color temperature and a whitecolor deviation from a black body locus were measured by using a CRTcolor analyzer (CA100) manufactured by Minolta Co., Ltd.

[0370] It is preferable that three primary colors of PDP luminescencecomes as near as possible to a color reproduction gamut of RGB colorsdefined by an NTSC system. Further, it is shown that, as a ratio inpercentage of an area of a triangle formed by connecting three primarycolors of the PDP luminescence in an x-y chromaticity diagram against anarea of the color reproduction gamut of NTSC comes nearer to 100%, thecolor reproduction gamut becomes larger.

[0371] 4) Electromagnetic Wave Shielding Capacity

[0372] With regard to a plasma display in which an electromagnetic waveshielding body is not formed and plasma displays shown in Examples 1 to4 and Comparative Example 1 in each of which an electromagnetic waveshielding body is disposed, measurements described below were conducted.

[0373] A dipole antenna was placed at a position 10 m away from a centerof a representation portion in a perpendicular direction. Then, using aspectrum analyzer (TP4172) manufactured by Advantest Corporation, aradiation field intensity in a frequency band of from 30 MHz to 230 MHzwas measured. According to a 3-m method of the VCCI, allowable values inthis frequency band are 50 dBμV/m or less in Class A and 40 dBμV/m orless in Class B. Evaluation was conducted in 33 MHz and 90 MHz.

[0374] 5) Near-Infrared Ray Transmittance of Electromagnetic WaveShielding Body

[0375] Evaluation was conducted on electromagnetic wave shielding bodiesin Examples 1 to 4 and Comparative Example 1.

[0376] A small piece was cut out of a translucent portion of each of theelectromagnetic wave shielding bodies, and parallel light raytransmittance thereof in a wavelength region of from 800 to 1,000 nm wasmeasured by using a spectrophotometer (U-3400) manufactured by Hitachi,Ltd. Respective transmittance in wavelengths of 820 nm, 850 nm and 950nm were evaluated.

[0377] 6) Near-Infrared Ray Cutting-Off Capacity

[0378] With regard to a plasma display in which an electromagnetic waveshielding body is not formed and plasma displays shown in Examples 1 and2 and Comparative Example 1 in each of which an electromagnetic waveshielding body is disposed, measurements described below were conducted.

[0379] A domestic-use VTR as an electronic apparatus using an infraredremote controller was placed from 0.2 m to 5 m away from the plasmadisplay and examined for malfunction thereof. When the malfunction wasobserved, a critical distance for the malfunction was measured. From apractical point of view, it is at least 3 m or less, and preferably 1.5m or less.

[0380] In the electromagnetic wave shielding body according to theinvention in Example 1, transmittance of light emitted from the plasmadisplay is 50% in terms of visible light ray transmittance, and, due toan employment of a dye having an absorption maximum in a wavelength of595 nm in which an unwanted luminescence exists, a percentage oftransmittance in a wavelength of 595 nm against transmittance in awavelength of 610 nm in which a necessary luminescence exists was 38%.Further, in the plasma display comprising such a electromagnetic waveshielding body, due to an employment of the electromagnetic waveshielding body in which a functional transparent layer (A) having ananti-reflection property was formed, reflection on a display surface wassuppressed and, due to transmission characteristics of theelectromagnetic wave shielding body, contrast ratio in a bright placeunder a condition of an environmental luminance of 100 lx was enhancedto be 45 compared with 20 before the electromagnetic wave shielding bodywas formed therein. Further, since a mirror phenomenon scarcelyoccurred, a plasma display having a favorable visibility was obtained.

[0381] In the electromagnetic wave shielding body according to theinvention in Example 2, transmittance of light emitted from the plasmadisplay was 58% in terms of visible light ray transmittance and a mirrorphenomenon scarcely occurred whereupon a plasma display having afavorable visibility was obtained. Contrast ratio in a bright place wasimproved from 20 into 37.

[0382] In the electromagnetic wave shielding body according to theinvention in Example 3, transmittance of light emitted from the plasmadisplay was 58% in terms of visible light ray transmittance and a mirrorphenomenon scarcely occurred whereupon a plasma display having afavorable visibility was obtained. Contrast ratio in a bright place wasimproved from 20 into 37.

[0383] In the electromagnetic wave shielding body according to theinvention in Example 4, transmittance of light emitted from the plasmadisplay was 59% in terms of visible light ray transmittance and a mirrorphenomenon scarcely occurred whereupon a plasma display having afavorable visibility was obtained. Contrast ratio in a bright place wasimproved from 20 into 37.

[0384] In FIG. 8, an x-y chromaticity diagram showing color reproductiongamut in each case of before and after the electromagnetic waveshielding body was formed was shown. In FIG. 8, chromaticity of eachluminescence of white color (W), red color (R), green color (G), andblue color (B) before and after the electromagnetic wave shielding bodyaccording to the invention in Example 1 was formed on the PDP (plasmadisplay panel) was plotted in the x-y chromaticity diagram.Concurrently, chromaticity of NTSC to be targeted was also plotted.

[0385] White color can be evaluated by comparing a position thereof witha black body locus which is a locus of a favorable white colorchromaticity.

[0386] It has been found that, when the electromagnetic wave shieldingbody according to the invention was employed, chromaticity deviation ofwhite color was small and, further, a color temperature was in a higherposition than that before the electromagnetic wave shielding body inExample 1 was formed. On this occasion, the color temperature waselevated from about 7000 K to about 10000 K.

[0387] Further, a triangle formed by connecting points of RGB was shownin FIG. 8. It can be said to be preferable to allow the triangle to comeas near as possible to that of NTSC. It has been found that, by usingthe electromagnetic wave shielding body in Example 1, chromaticity ofeach of red color and green color came near to that indicated by NTSCwhereupon a triangle showing a color reproduction gamut became larger.When a percentage of an area of the triangle indicated by NTSC againstan area of the triangle was obtained, the percentage was improved to be85% by forming the electromagnetic wave shielding body in Example 1whereas the percentage was 74% before the electromagnetic wave shieldingbody in Example 1 was formed.

[0388] Results of the evaluations 4) to 6) are summarized and shown inTable 1. TABLE 1 Electro- Compara- magnetic wave tive shielding ExampleExample Example Example Example body None 1 2 3 4 1 Surface — 2.2 5.32.2 5.3 15 resistance of transparent electrically conductive layerΩ/square Radiation  33 59 38 46 39 46 52 field MHz intensity  90 52 3442 33 40 49 dBμ/m MHz Near- 820 — 9.8 24 10 25 79 infrared nm trans- 850— 6.3 19 6.5 18 78 mittance % nm 950 — 2.1 9 2.0 8.5 70 nm Critical  50.5 3.0 0.5 3.0  5 distance of or more or more malfunction m

[0389] From Table 1, by using the electromagnetic wave shielding bodyaccording to the invention, it can be seen that Class B or Class A ofVCCI specifications is satisfied. As the surface resistance of thetransparent electrically conductive layer was lower, the electromagneticwave shielding capacity was superior.

[0390] Further, by using the electromagnetic wave shielding bodyaccording to the invention, it can be seen that the near-infraredcutting-off capacity was superior. The electromagnetic wave shieldingbody according to the invention using a transparent electricallyconductive layer in which a metallic thin film and ahigh-refractive-index transparent thin film are laminated alternatelyhad low of a near-infrared ray transmittance, was excellent innear-infrared cutting-off capacity whereupon, as a surface resistance ofthe transparent electrically conductive layer is lower, thenear-infrared cutting-off capacity was excellent. Furthermore, byallowing the functional transparent layer (D) to have various types offunctions, the electromagnetic wave shielding body according to theinvention is excellent in environmental resistance and/or scratchresistance and/or an anti-fouling property and/or an antistaticproperty.

Example 5

[0391] On one major surface of a triacetyl cellulose (TAC) film(thickness: 80 μm) which is used as a polymer film (B), a nextfunctional transparent film 1 as described below which is used as afunctional transparent layer (A) was continuously formed by aroll-to-roll method. Namely, firstly a multi-functional methacrylateresin was added with a photopolymerization initiator and, then, coatedwith a coating liquid in which ITO fine particles (average particlediameter: 10 nm) were dispersed by means of a gravure coater and curedby an ultraviolet ray to form an electric conductive hard coat film(film thickness: 3 μm) and, thereafter, a fluorine-containing organiccompound solution was applied on the thus-formed electric conductivehard coat film by means of a micro gravure coater and heat-cured at 90°C. to form an anti-reflection film (film thickness: 100 nm) having arefractive index of 1.4 thereby forming the functional transparent film1 having a hard coat property (pencil hardness in accordance with JISK5400:2H), an anti-reflection property (Rvis of surface:0.9%), anantistatic property (surface resistance: 7×10⁹ Ω/square) and ananti-fouling property.

[0392] An organic dye was disperse-dissolved in an ethyl acetate/toluene(50:50 wt %) solvent to prepare a diluting liquid for an acrylicadhesive. The acrylic adhesive and the resultant dye-containing dilutingliquid (80:20 wt %) were mixed and, then, the resultant mixture wasapplied in a thickness of 25 μm on a dry basis on a surface of a TACfilm of an functional transparent film 1/a TAC film by means of a commacoater to form an adhesive 1 as a transparent adhesive layer (C). Themold releasing film was laminated to a surface of the transparentadhesive layer, and then, the resultant transparent adhesive layer waswound in roll form to obtain the light control film according to theinvention in roll form having a mold releasing film on the surface ofthe transparent adhesive layer.

[0393] As an organic dye, a dye PD-319 manufactured by Mitsui Chemicals,Inc. having an absorption maximum in a wavelength of 595 nm forabsorbing an unnecessary luminescence emitted from a plasma display anda red color dye PS-Red-G manufactured by Mitsui Chemicals, Inc. forcorrecting chromaticity of white color luminescence were used to adjustthe acrylic adhesive/the dye-containing diluting liquid such that thesedyes were contained in the dried adhesive 1 in amounts of 1650 (wt)ppmand 450 (wt)ppm, respectively. Further, PD-319 is atetra-t-butyl-tetraazaporphyrin/vanadyl complex expressed by thefollowing formula (3):

[0394] Further, the light control film was cut into sheet form and,then, the mold releasing film was removed therefrom and, thereafter, theresultant light control film was bonded to a front surface of a plasmadisplay panel (representation portion: 920 mm×520 mm) by using a sheetfed laminator. On this occasion, such sheet cutting and registry of aposition to be bonded were conducted such that the transparent adhesivelayer (C) portion was allowed to be bonded to at least an entirerepresentation portion. After such a bonding operation has beenconducted, the resultant plasma display panel bonded with the lightcontrolling sheet was subjected to an autoclave treatment under pressureand heating conditions of 2×10⁵ Pa and 60° C. to obtain a displayapparatus comprising the light control film according to the invention.

[0395] A cross-section of the light control film was shown in FIG. 9 asa cross-sectional diagram showing an example of the light control filmaccording to the invention and a mounted state thereof. In FIG. 9, areference numeral 00 denotes a display area, a reference numeral 20denotes a polymer film (B), a reference numeral 31 denotes a transparentadhesive layer (C) containing a dye, a reference numeral 60 denotes afunctional transparent layer (A) having an anti-reflection property, ahard coat property, an antistatic property, an anti-fouling property, areference numeral 61 denotes an anti-reflection film having ananti-fouling property, and a reference numeral 62 denotes a hard coatfilm having an antistatic property.

Example 6

[0396] Polyethylene terephthalate (PET) pellets 1203 (manufactured byUnitika, Ltd.) were mixed with 0.018% by weight of a dye PD-319manufactured by Mitsui Chemicals, Inc. expressed by the formula (3),0.018% by weight of a dye PD-311 manufactured by Mitsui Chemicals, Inc.having an absorption maximum in a wavelength of 585 nm, and 0.004% byweight of a red dye PS-Red-G manufactured by Mitsui Chemicals, Inc. forcorrecting chromaticity of white color luminescence, melted at atemperature of from 260° C. to 280° C. and extruded to form a filmhaving a thickness of 250 μm. Thereafter, this film was biaxiallystretched to prepare a PET film containing a dye, which is a polymerfilm (B) containing a dye, having a thickness of 125 μm.

[0397] Further, PD-311 is a tetra-t-butyl-tetraazaporphyrin/coppercomplex expressed by the following formula (4):

[0398] Further, on a major surface of the PET film wound in roll form, anext functional transparent film 2 was continuously formed as afunctional transparent layer (A) by a roll-to-roll method. Namely, acoating liquid which had been prepared by adding a photopolymerizationinitiator to a multi-functional methacrylate resin and, further,dispersing organic silica fine particles (average particle diameter: 15μm) therein was applied and, then, cured by an ultraviolet ray to formafunctional transparent film 2, which is an anti-glare layer, having ananti-glare property (haze value measured by a haze meter: 5%), a hardcoat property (pencil hardness: 2H). An adhesive 2 comprising same rawmaterials as in the adhesive 1 in Example 1 except that a dye was notcontained was formed on a surface of the PET film of the functionaltransparent film 2/the dye-containing PET film. The mold releasing filmwas laminated on a surface of the transparent adhesive layer and, then,the resultant transparent adhesive layer was wound in roll form toobtain the light control film according to the invention in roll formhaving a mold releasing film on the surface of the transparent adhesivelayer thereof.

[0399] Further, the light control film was cut into sheet form and,then, the mold releasing film was removed therefrom and, thereafter, theresultant light control film was bonded to a front surface of a plasmadisplay panel (representation portion: 920 mm×520 mm) by using a sheetfed laminator. On this occasion, such sheet cutting and registry of aposition to be bonded were conducted such that the transparent adhesivelayer (C) portion was allowed to be bonded to at least an entirerepresentation portion. After such a bonding operation has beenconducted, the resultant plasma display panel bonded with the lightcontrolling sheet was subjected to an autoclave treatment under pressureand heating conditions of 2×10⁵ Pa and 60° C. to obtain a displayapparatus comprising the light control film according to the invention.

[0400] A cross-section of the light control film was shown in FIG. 10 asa cross-sectional diagram showing an example of the light control filmaccording to the invention and a mounted state thereof. In FIG. 10, areference numeral 00 denotes a display area, a reference numeral 21denotes a transparent adhesive layer (C) containing a dye, a referencenumeral 30 denotes a transparent adhesive layer (C), a reference numeral70 denotes an anti-glare layer (a functional transparent layer (A)having an anti-glare property, and a hard coat property).

[0401] The thus-obtained plasma displays which are display apparatuseseach comprising the light control film according to the invention inExamples 5 and 6, as well as the plasma display before the light controlfilm was formed thereon, were evaluated according to proceduresdescribed below.

[0402] 1) Transmittance of Light Control Film

[0403] By using a CRT color analyzer (CA100) manufactured by MinoltaCo., Ltd., spectral radiance of a plasma display in each case of beforeand after a light control film was formed therein was determined; aratio of radiance after the light control film was formed thereinagainst radiance before the light control film was formed therein wasshown in percentage.

[0404] 2) Contrast Ratio of Plasma Display in Bright Place (RatioBetween Highest Luminance and Lowest Luminance)

[0405] An evaluation was conducted in each case of before and after alight control film was formed. At a bright time of about 100 lx of anenvironmental luminance, a maximum luminance (cd/m²) at a time of whitecolor display and a minimum luminance (cd/m²) at a time of black colordisplay of a plasma display panel were measured by using a luminancemeter (LS-110) manufactured by Minolta Co., Ltd. to determine a ratio(maximum luminance/minimum luminance) therebetween.

[0406] 3) Colorimetric Purity of Luminescent Color of Plasma Display

[0407] An evaluation was conducted in each case of before and after alight control film was formed.

[0408] In a white color (W) display, a red color (R) display, a greencolor (G) display, and a blue color (B) display, RGB chromaticity (x,y), white color chromaticity, a white color temperature and a whitecolor deviation from a black body locus were measured by using a CRTcolor analyzer (CA100) manufactured by Minolta Co., Ltd.

[0409] It is preferable that three primary colors of PDP luminescencecomes as near as possible to a color reproduction gamut of RGB colorsdefined by an NTSC system. Further, it is shown that, as a ratio inpercentage of an area of a triangle formed by connecting three primarycolors of the PDP luminescence in an x-y chromaticity diagram against anarea of the color reproduction gamut of NTSC comes nearer to 100%, thecolor reproduction gamut becomes larger.

[0410] In the light control film according to the invention in Example5, transmittance of light emitted from the plasma display is 69% interms of visible light ray transmittance, and, due to an employment of adye having an absorption maximum in a wavelength of 595 nm in which anunwanted luminescence exists, a percentage of transmittance in awavelength of 595 nm against transmittance in a wavelength of 610 nm inwhich a necessary luminescence exists was 21%. Further, in the plasmadisplay comprising such a light control film, due to an employment ofthe light control film in which a functional transparent layer (A)having an anti-reflection property was formed, reflection on a displaysurface was suppressed and, due to transmission characteristics of thelight control film, contrast ratio in a bright place under a conditionof an environmental luminance of 100 lx was enhanced to be 41 comparedwith 20 before the light control film was formed therein. Further, sinceluminance was not substantially impaired and a mirror phenomenonscarcely occurred, a plasma display having a favorable visibility wasobtained. Moreover, color purity of red color luminescence and greencolor luminescence was remarkably improved. Such an improvement of thegreen color luminescence is due to a fact that yellowish green colorluminescence by a dye having an absorption wavelength of 595 nm has beendecreased.

[0411] In the same manner as above, in the light control film accordingto the invention in Example 6, transmittance of light emitted from theplasma display is 70% in terms of visible light ray transmittance, and,due to an employment of a dye having an absorption maximum in awavelength of 585 nm in which an unwanted luminescence exists in thesame manner as in the dye having an absorption maximum in a wavelengthof 595 nm in which an unwanted luminescence exists, a percentage oftransmittance in a wavelength of 595 nm against transmittance in awavelength of 610 nm in which a necessary luminescence exists was 30%.Further, in the plasma display comprising such a light control film, dueto transmission characteristics of the light control film, contrastratio in a bright place under a condition of an environmental luminanceof 100 lx was enhanced to be 37 compared with 20 before the lightcontrol film was formed therein. Further, since luminance was notsubstantially impaired and a mirror phenomenon scarcely occurred, aplasma display having a favorable visibility was obtained. Moreover,color purity of red color luminescence and green color luminescence wasremarkably improved. Such an improvement of the green color luminescenceis due to a fact that yellowish green color luminescence by dyes havingabsorption wavelengths of 595 nm and 585 nm has been decreased.Particularly, by using the dye having an absorption wavelength of 585 nmfor absorbing short wavelength, such an effect as described above wasconspicuous.

[0412] In FIG. 11, an x-y chromaticity diagram showing colorreproduction gamut in each case of before and after the light controlfilm according to the invention was formed was shown.

[0413] In FIG. 11, chromaticity of each luminescence of white color (W),red color (R), green color (G), and blue color (B) was plotted in thex-y chromaticity diagram in each case of before and after the lightcontrol film in Example 5 was formed on the PDP (plasma display panel).Concurrently, chromaticity of NTSC to be targeted was also plotted.

[0414] White color can be evaluated by comparing a position thereof witha black body locus which is a locus of a favorable white colorchromaticity.

[0415] It has been found that, when the electromagnetic wave shieldingbody according to the invention was employed, chromaticity deviation ofwhite color was small and, further, a color temperature was in a higherposition than that before the light control film in Example 5 or Example6 was formed. On this occasion, the color temperature was elevated fromabout 7000 K to about 9500 K and a white color deviation showing adeviance from the black body locus was approximately 0.

[0416] Further, a triangle formed by connecting points of RGB was shownin FIG. 11. It can be said to be preferable to allow the triangle tocome as near as possible to that of NTSC. It has been found that, byusing the light control film in Example 5 or Example 6, chromaticity ofeach of red color and green color came near to that indicated by NTSCwhereupon a triangle showing a color reproduction gamut became larger.When a percentage of an area of the triangle indicated by NTSC againstan area of the triangle was obtained, the percentage was improved to be86% by forming the light control film in Example 5 whereas thepercentage was 74% before the light control film in Example 5 wasformed. Further, the percentage was improved to be 88% in the case offorming the light control film in Example 6.

[0417] Furthermore, by allowing the functional transparent layer (A) tohave various types of functions, the light control film according to theinvention is excellent in scratch resistance and/or an anti-foulingproperty and/or an antistatic property.

Example 7

[0418] Polyethylene terephthalate pellets 1203 (manufactured by Unitika,Ltd.) were mixed with 0.15% by weight of each of near-infrared absorbingdyes SIR-128 and SIR-130 manufactured by Mitsui Chemicals Inc., meltedat about 280° C., extruded and biaxially stretched to prepare anear-infrared shielding film (B) having a thickness of 150 μm. Further,as allowing a solvent of ethyl acetate/toluene (50:50 wt %) to be adiluting liquid, an acrylic adhesive and the diluting liquid were mixedwith each other at a mixing ratio of 80:20 and, then, the resultantmixture was applied on a surface of the near-infrared shielding filmwith a film thickness of 25 μm on a dry basis by means of a comma coaterand dried to form an adhesive layer on which a mold releasing film wasthereafter laminated.

[0419] On the resultant near-infrared shielding film (B), ananti-reflection film comprising a base film having the thickness of 188μm (under the trade name of “ReaLook 1200”; manufactured by NOFCorporation) was laminated and, then, the resultant laminate was cut toa size of 960 mm long×550 mm wide to obtain an optical filter filmcomprising a transparent polymer film having a total thickness of 0.338mm.

[0420] Thus-obtained film was bonded to a semi-tempered glass platehaving a size of 980 long×580 mm wide×2.5 mm thick.

Example 8

[0421] Polyethylene terephthalate pellets 1203 (manufactured by Unitika,Ltd.) were mixed with 0.3% by weight of each of near-infrared absorbingdyes SIR-128 and SIR-130 manufactured by Mitsui Chemicals Inc., meltedat about 280° C., extruded and biaxially stretched to prepare anear-infrared shielding film having a thickness of 75 μm. Further, asallowing a solvent of ethyl acetate/toluene (50:50 wt %) to be adiluting liquid, an acrylic adhesive and the diluting liquid were mixedwith each other at a mixing ratio of 80:20 and, then, the resultantmixture was applied on a surface of the near-infrared shielding film ina film thickness of 25 μm on a dry basis by means of a comma coater anddried to form an adhesive layer on which a mold releasing film wasthereafter laminated.

[0422] By using a similar method to that described above, a transparentpolymer film for increasing a total thickness having a thickness of 200μm was prepared without adding a near-infrared absorbing dye.

[0423] On the resultant near-infrared shielding film, an ant-reflectionfilm (under the trade name of “ReaLook 2200”; manufactured by NOFCorporation) comprising a base film having a thickness of 80 μm waslaminated and, then, the resultant laminate was cut to a size of 960 mmlong×550 mm wide and bonded to the transparent polymer film forincreasing a total thickness having a thickness of 200 μm therebyobtaining an optical filter film comprising a transparent polymer filmhaving a total thickness of 0.355 mm. This optical filter film wasbonded to a semi-tempered glass plate having a size of 980 long×580 mmwide×2.5 mm thick.

Example 9

[0424] On a major surface of the near-infrared shielding film having athickness of 150 μm as shown in Example 7, a next functional transparentfilm was continuously formed as a functional transparent layer (A) by aroll-to-roll method. Namely, a coating liquid which had been prepared byadding a photopolymerization initiator to a multi-functionalmethacrylate resin and, further, dispersing organic silica fineparticles (average particle diameter: 15 μm) therein was applied and,then, cured by an ultraviolet ray to form a functional transparent layerwhich has anti-glare capacity having an anti-glare property (haze valuemeasured by a haze meter: 5%), a hard coat property (pencil hardness:2H).

[0425] The transparent polymer film for increasing a total thicknesshaving a thickness of 200 μm as shown in Example 14 was laminated to atransparent polymer film having such a near-infrared shielding functionand an anti-glare function and cut to a size of 960 mm long×550 mm wideto obtain an optical filter film comprising a transparent polymer filmhaving a total thickness of 0.350 mm. Thus-obtained optical filter filmwas bonded to a semi-tempered glass plate having a size of 980 long×580mm wide×2.5 mm thick.

Example 10

[0426] A polyethylene terephthalate film having a thickness of 75 μm wasprepared by an extrusion and biaxially stretching operations and, then,on one major surface of the thus-prepared polyethylene terephthalatefilm, 5 layers made up of an SnO₂ thin film (film thickness: 40 nm), asilver thin film (film thickness: 9 nm), an SnO₂ thin film (filmthickness: 80 nm), a silver-palladium alloy thin film (film thickness:11 nm), and an SnO₂ thin film (film thickness: 40 nm) were formed inthis order as viewed from the polyethylene terephthalate film whereupona transparent polymer film having electromagnetic wave shieldingcapacity was prepared in which a transparent electrically conductivethin film layer (D) having a surface resistance of 5.3 Ω/square wascontained.

[0427] An adhesive layer was formed on the electromagnetic waveshielding film by procedures described below.

[0428] An organic dye was disperse-dissolved in a solvent of ethylacetate/toluene (50:50 wt %) to prepare a diluting liquid for an acrylicadhesive. As an organic dye, a dye PD-319 manufactured by MitsuiChemicals, Inc. having an absorption maximum in a wavelength of 595 nmfor absorbing an unnecessary luminescence emitted from a plasma displayand a red color dye PS-Red-G manufactured by Mitsui Chemicals, Inc. forcorrecting chromaticity of white color luminescence were used to adjustthe acrylic adhesive/the dye-containing diluting liquid such that thesedyes were contained in the dried adhesive in amounts of 1150 (wt)ppm and1050 (wt)ppm, respectively.

[0429] The acrylic adhesive and the resultant dye-containing dilutingliquid were mixed (80:20 wt %) and, then, the resultant mixture wasapplied in a film thickness of 25 μm on a dry basis on a surface thereofin side of the electromagnetic wave shielding film by means of a commacoater, dried and laminated with a mold releasing film on an adhesivesurface thereof to form a transparent adhesive layer thereon.

[0430] The thus-prepared film was laminated on the transparent polymerfilm for increasing a total thickness having a thickness of 200 μm asshown in Example 8 such that the transparent electrically conductivethin film layer comes to the top and, then, cut to a size of 960 mmlong×550 mm wide.

[0431] Further, an anti-reflection film comprising a base film having athickness of 188 μm (ReaLook 1200; manufactured by NOF Corporation) wascut to a size of 920 mm long×510 mm wide and, then, the thus-cutanti-reflection film was bonded inside the transparent electricallyconductive layer such that 20 mm wide of a peripheral portion thereofwas exposed. Furthermore, a silver paste (MSP-600F; manufactured byMitsui Chemicals, Inc.) was screen-printed thereon such that an exposedelectrically conducting portion of the transparent electricallyconductive layer was covered in an area of 22 mm wide of the peripheralportion thereof and dried to form an electrode having a thickness of 15μm. By this procedure, an optical filter film comprising a transparentpolymer film having a total thickness of 0.463 mm was obtained. Thisfilm was bonded to a semi-tempered glass plate having a size of 980long×580 mm wide×2.5 mm thick.

Example 11

[0432] A polyethylene terephthalate film having a thickness of 200 μmwas prepared by an extrusion and biaxially stretching operations and,then, on one major surface of the thus-prepared polyethyleneterephthalate film, a transparent electrically conductive thin layer (F)comprising 7 layers in total made up of an ITO thin film (40 nm thick),a silver thin film (11 nm thick), an ITO thin film (95 nm thick), asilver thin film (14 nm thick), an ITO thin film (90 nm thick), a silverthin film (12 nm thick) and an ITO thin film (40 nm thick) in this orderas viewed from a side of the polyethylene terephthalate film was formedwhereupon an electromagnetic wave shielding film comprising thetransparent electrically conductive layer having a surface resistance of2.2 Ω/square was prepared.

[0433] On the other major surface on which the transparent electricallyconductive thin layer of the thus-prepared electromagnetic waveshielding film was not formed, a next functional transparent layer wascontinuously formed by means of a roll-to-roll method. Namely, a coatingliquid in which a photopolymerization initiator is added to amulti-functional methacrylate resin and, further, ITO fine particles(average particle diameter: 10 nm) were dispersed thereto was coated bya gravure coater and cured by an ultraviolet ray to form an electricallyconductive hard coat film (film thickness: 3 μm) and, then, afluorine-containing organic compound solution was coated on thethus-formed hard coat film by a micro gravure coater and dry-cured at90° C. to form an anti-reflection film (film thickness: 100 nm) having arefractive index of 1.4 whereupon a functional transparent layer havinga hard coat property (pencil hardness in accordance with JIS K-5400:2H), an anti-reflection property (Rvis of surface: 0.9%), an antistaticproperty (surface resistance: 7×10⁹ Ω/square) and an anti-foulingproperty was formed.

[0434] Further, as allowing a solvent of ethyl acetate/toluene (50:50 wt%) to be a diluting liquid, an acrylic adhesive and the diluting liquidwere mixed with each other at a mixing ratio of 80:20 and, then, theresultant mixture was applied on a surface of the transparentelectrically conductive layer in a film thickness of 25 μm on a drybasis by means of a comma coater, dried and laminated with a moldreleasing film to form a transparent adhesive layer.

[0435] Further, the electromagnetic wave shielding film having thefunctional transparent layer was cut to a size of 920 mm long×510 mmwide and, then, the thus-cut electromagnetic wave shielding film wasbonded to an inside surface of a transparent polymer film for increasinga total thickness, which has been cut to a size of 960 mm long×550 mmwide, having a thickness of 200 μm such that 20 mm wide each of aperipheral portion thereof was left.

[0436] Furthermore, a silver paste (MSP-600F; manufactured by MitsuiChemicals, Inc.) was screen-printed in an area of 22 mm wide of theperipheral portion thereof such that an electrically conducting portionin a direction of a thickness cross-section of the transparentelectrically conductive layer was covered, and dried to form anelectrode having a thickness of 15 μm. By this procedure, an opticalfilter film comprising a transparent polymer film having a totalthickness of 0.4 mm was obtained. This optical filter film was bonded toa semi-tempered glass plate having a size of 980 long×580 mm wide×2.5 mmthick.

Comparative Example 2

[0437] The near-infrared shielding film having a thickness of 150 μm asshown in Example 9 and the anti-reflection film comprising a base filmhaving a thickness of 80 μm were bonded to each other to obtain anoptical filter film having a total film thickness of 0.230 mm. Thethus-obtained optical filter film was bonded to a semi-tempered glassplate having a size of 980 long×580 mm wide×2.5 mm thick.

Comparative Example 3

[0438] The electromagnetic wave shielding film having a thickness of 75μm as shown in Example 10 and the anti-reflection film comprising a basefilm having a thickness of 188 μm were bonded to each other to obtain anoptical filter film having a total film thickness of 263 μm. Thethus-obtained optical filter film was bonded to a semi-tempered glassplate having a size of 980 long×580 mm wide×2.5 mm thick.

[0439] On samples thus obtained by bonding respective optical filterfilms to respective glass plates, an enhancement of shock resistance, apeeling property, and a state of a remaining adhesive on a glass platewere examined.

[0440] In regard to a shock resistance test, a steel ball having aweight of 500 g was dropped on a film sample bonded to a glass platefrom 1.5 m high and a state of damage of the substrate glass wasexamined. 5 sheets of samples were subjected to each test.

[0441] In regard to tests of the peeling property and paste remaining onglass, after an optical film was bonded to a glass plate and left stillfor one hour and, the film was peeled off the glass plate to examine astate at the time of such peeling.

[0442] Results thus obtained are shown in Table 2. TABLE 2 Film totalAdhesive thickness Film peeling remaining (mm) Shock resistance testproperty on glass Example 9 0.338 No problem Easy peeling No Example 100.355 No problem Easy peeling No Example 11 0.350 No problem Easypeeling No Example 12 0.413 No problem Easy peeling No Example 13 0.400No problem Easy peeling No Comparative 0.155 Glass partially DifficultYes Example 2 flown to peeling reverse surface Comparative 0.263 Glasspartially Difficult Yes Example 3 flown to peeling reverse surface

[0443] As is evident from Table 2, it can be seen that shock resistance,a peeling property, and a state of paste remaining on a glass plate havebeen enhanced in all examples.

[0444] As described above, the invention can aim for enhancing aprotection function and workability of a display panel by allowing atotal thickness of a transparent polymer film constituting an opticalfilter film to be 0.3 mm or more and provide the optical filter filmcapable of being bonded directly on a front surface of a display.

Example 14

[0445] A roll of a polyethylene terephthalate film (558 mm wide, 500 mlong and 75 μm thick) was prepared as a transparent polymer film (B). Onone major surface thereof, a transparent electrically conductive thinfilm layer (D) was deposited by a DC magnetron sputtering method bymeans of a roll coater. In the transparent electrically conductive thinfilm layer, a thin film layer (Dt) comprising an oxide of indium and tinand a silver thin film layer (Dm) are laminated in an order of B/Dt (40nm thick)/Dm (15 nm thick)/Dt (80 nm thick)/Dm (20 nm thick)/Dt (80 nmthick)/Dm (15 nm thick)/Dt (40 nm thick)/Dm (15 nm thick)/Dt (40 nmthick). The thin film layer comprising an oxide of indium and tinconstitutes a high-refractive-index transparent thin film layer whilethe silver thin film layer constitutes a metallic thin film layercomprising silver or a silver alloy. For depositing the thin film layercomprising the oxide of indium and tin, an indium oxide/a tin oxidesintered body (In₂O₃:SnO₂=90:10 wt %) was used as a target and anargon-oxygen gaseous mixture (total pressure of 266 mPa; partialpressure of oxygen of 5 mPa) was used as a sputtering gas. Fordepositing a silver thin film layer, silver was used as a target and anargon gas (total pressure of 266 mPa) was used as a sputtering gas. Fordepositing a titanium layer, titanium was used as a target and an argongas (total pressure of 266 mPa) was used as a sputtering gas.

[0446] Next, a roll of an anti-glare film (548 mm wide, 500 m long, 100μm thick) was prepared in a state in which a transparent adhesive (100μm thick) was bonded to a side thereof opposite to an anti-glare layer.

[0447] Subsequently, the thus-prepared anti-glare film was bonded on atransparent electrically conductive thin film layer of the transparentelectrically conductive thin film via the transparent adhesive by meansof a roll-to-roll method to prepare one roll. A center position of thetransparent electrically conductive film was allowed to be in registrywith a center position of the anti-glare film in a width direction.Further, on a surface opposite to the anti-glare layer of a bonded bodymade up of the transparent electrically conductive thin film and theanti-glare film, bonded was a transparent adhesive (100 μm thick) by aroll-to-roll method. Subsequently, a silver paste was applied torespective transparent electrically conductive thin film layer portionsof 5 mm wide of both end parts of the roll by a roll coat method. Onthis occasion, a transfer rate of the roll was 0.5 m/s.

[0448] The resultant film was cut to a size of 958 mm long to prepare anelectromagnetic wave shielding body. A cross-sectional diagram thereofwas shown in FIG. 12. In FIG. 12, a reference numeral 23 denotes atransparent polymer film (B) having an electromagnetic wave shieldingfunction, a reference numeral 30 denotes a transparent adhesive layer(C), and a reference numeral 24 denotes a transparent polymer film (B)having a functional transparent layer (A).

[0449] A time required for forming an electrode per sheet of theelectromagnetic wave shielding body therein was examined.

[0450] Subsequently, the electromagnetic wave shielding body wasattached to a front face of a plasma display panel (PX-42VP1;manufactured by NEC Corporation) via the transparent adhesive layer.

[0451] The electrode disposed on a surface facing to a viewer thereofwas allowed to come into contact with a metallic member on a plate whichis wired such that an electric current can be led to an outside of thedisplay.

[0452] After the plasma display panel was actuated, an intensity ofelectromagnetic wave discharged externally was measured in accordancewith FCC specifications Part 15J to examine whether or not the resultantmeasurements complied with Class A standards.

Example 15

[0453] A roll of an anti-glare film (554 mm wide, 500 m long and 100 μmthick) was prepared and, then, a transparent electrically conductivethin film layer was formed on a surface opposite to an anti-glare layerthereof in the same manner as in Example 14. Subsequently, a transparentadhesive (548 mm wide and 100 μm thick) and an electrically conductiveadhesive (3 mm wide and 100 μm thick) were bonded to the thus-formedtransparent electrically conductive thin film layer by a roll-to-rollmethod. The electrically conductive adhesive was bonded to positions ofboth edge portions of the roll while the transparent adhesive was bondedto a remaining portion. By these procedures, an electromagnetic waveshielding body was prepared.

[0454] The electromagnetic wave shielding body was attached to a frontface of a plasma display panel (PX-42VP1; manufactured by NECCorporation). On each of 2 long sides of the plasma display panel, acopper foil tape was previously bonded along an edge portion thereof by6 mm wide. An overlapped portion by the electrically conductive adhesiveand the copper foil tape becomes a substantial electrode. The electrodepositioned in a side of a viewing surface was allowed to come intocontact with a plate type metallic member which is wired such that anelectric current can be led to an outside of the display. Otherarrangements than those described above are made in the same manner asin Example 14.

Example 16

[0455] A transparent electrically conductive thin film was prepared inthe same manner as in Example 14.

[0456] Subsequently, a roll of an anti-glare film (558 mm wide, 500 mlong, and 100 μm) was prepared. Center positions of the transparentelectrically conductive thin film and the anti-glare film were allowedto be in registry with each other in a width direction. Further, on asurface opposite to the anti-glare layer of the resultant bonded bodymade up of the transparent electrically conductive thin film and theanti-glare film, bonded was a transparent adhesive (100 μm thick) by aroll-to-roll method.

[0457] A silver paste was applied to an edge portion the roll. By theabove-described procedures, an electromagnetic wave shielding body wasprepared. A cross-sectional diagram was shown in FIG. 17.

[0458] A time required for forming an electrode per sheet of theelectromagnetic wave shielding body therein was examined.

[0459] Subsequently, the electromagnetic wave shielding body wasattached to a front face of a plasma display panel (PX-42VP1;manufactured by NEC Corporation). The electrode disposed was allowed tocome into contact with a plate type metallic member which is wired suchthat an electric current can be led to an outside of the display.

[0460] After the plasma display panel was actuated, an intensity ofelectromagnetic wave discharged externally was measured in accordancewith FCC specifications Part 15J to examine whether or not the resultantmeasurements complied with Class A standards.

Comparative Example 4

[0461] In the same manner as in Example 14, a roll of a polyethyleneterephthalate film (558 mm wide, 500 m long and 75 μm thick) wasprepared as a transparent polymer film (B) and, then, on one majorsurface thereof, formed was a transparent electrically conductive thinfilm layer.

[0462] A transparent adhesive (100 μm thick) was bonded to a surfaceopposite to a surface of the above-described film by a roll-to-rollmethod.

[0463] Further, while the resultant film was cut, it was bonded to aglass substrate (size being 560 mm×960 mm; thickness being 3 mm) via anadhesive of weak adhesive strength.

[0464] Subsequently, a roll of an anti-glare type film (548 mm wide, 500m long and 100 μm thick) was prepared in a state in which a transparentadhesive was bonded to a side opposite to an anti-glare layer thereofand, then, on the transparent electrically conductive thin film layer ofthe above-described bonded body, the thus-prepared roll was bonded whileit was cut. On this occasion, the thus-cut roll was bonded such that anedge thereof was positioned 5 mm inside from a peripheral portion of thetransparent electrically conductive thin film layer.

[0465] A silver paste was applied by using a screen printing method suchthat an entire exposed portion of the transparent electricallyconductive thin film layer positioned in a peripheral part thereof wascovered and dried. After the silver paste was dried, the resultant filmwas removed from the glass substrate. By the above-described procedures,an electromagnetic wave shielding body was prepared. The others wereconducted in the same manner as in Example 14.

[0466] Results are shown in Table 3. TABLE 3 Electrode formationElectromagnetic wave time (second) shielding effect (per sheet of(whether or not being electromagnetic wave within FCC Class A shieldingbody) standards) Example 14 2 No problem Example 15 2 No problem Example16 0.5 No problem Comparative Example 4 180 No problem

[0467] As is evident from Table 3, in all examples, in regard to theelectromagnetic wave shielding effect, there is no problem in the samemanner as in a conventional case as shown in Comparative Example 4.Further, it can be seen that a time required for forming the electrodehas substantially been decreased thereby substantially improvingproduction efficiency.

Example 17

[0468] A roll of a polyethylene terephthalate film (565 mm wide, 500 mlong and 75 μm thick) was prepared as a transparent polymer film (B). Onone major surface thereof, a transparent electrically conductive layer(D) was deposited by a DC magnetron sputtering method by means of a rollcoater. In the transparent electrically conductive thin film layer, athin film layer (Dt) comprising an oxide of indium and tin and a silverthin film layer (Dm) are laminated in an order of B/Dt (40 nm thick)/Dm(15 nm thick)/Dt (80 nm thick)/Dm (20 nm thick)/Dt (80 nm thick)/Dm (15nm thick)/Dt (40 nm thick)/Dm (15 nm thick)/Dt (40 nm thick). The thinfilm layer comprising an oxide of indium and tin constitutes ahigh-refractive-index transparent thin film layer while the silver thinfilm layer constitutes a metallic thin film layer comprising silver or asilver alloy. For depositing the thin film layer comprising the oxide ofindium and tin, an indium oxide/a tin oxide sintered body(In₂O₃:SnO₂=90:10 wt %) was used as a target and an argon-oxygen gaseousmixture (total pressure of 266 mPa; partial pressure of oxygen of 5 mPa)was used as a sputtering gas. For depositing a silver thin film layer,silver was used as a target and an argon gas (total pressure of 266 mPa)was used as a sputtering gas. For depositing a titanium layer, titaniumwas used as a target and an argon gas (total pressure of 266 mPa) wasused as a sputtering gas.

[0469] Next, a roll of an anti-glare film having a width of 565 mm and alength of 500 m was prepared in a state in which a transparent adhesivewas bonded to a side thereof opposite to an anti-glare layer.

[0470] Subsequently, the thus-prepared anti-glare film was bonded on atransparent electrically conductive thin film layer of the transparentelectrically conductive thin film via the transparent adhesive by aroll-to-roll method to prepare one roll. Further, on a surface oppositeto the anti-glare layer of the resultant bonded body made up of thetransparent electrically conductive thin film and the anti-glare film,bonded was a transparent adhesive by a roll-to-roll method.

[0471] Further, while the resultant film was cut, it was bonded to atransparent supporting substrate via a transparent adhesive.

[0472] Further, a silver paste was applied to an entire periphery of anedge portion of the film by using a screen printing method such that aside surface thereof was covered and, then, dried.

[0473] By the above-described procedures, an electromagnetic waveshielding body was prepared. A cross-sectional diagram was shown in FIG.16.

[0474] 2 points on the electrode which are remotest from each other wereselected and, then, resistance therebetween was examined.

[0475] Further, a bonding time required for every sheet of theelectromagnetic wave shielding body was examined. Furthermore, a bondingtime required for every sheet of an optical filter comprising thetransparent electrically conductive film and the anti-glare film wasdetermined by dividing a total bonding time required for totalroll-to-roll methods employed by a number of sheets of film which can becut out of the roll.

Example 18

[0476] A roll of an anti-glare film having a width of 565 mm and alength of 500 m was prepared and, then, a transparent electricallyconductive thin film layer was formed on a surface opposite to ananti-glare layer thereof in the same manner as in Example 17.Subsequently, a transparent adhesive was bonded on the transparentelectrically conductive thin film layer by a roll-to-roll method.

[0477] While the thus-obtained film was being cut, it was bonded to atransparent supporting substrate via the transparent adhesive.

[0478] Further, a silver paste was applied to an entire periphery of anedge portion of the film such that a side surface thereof is covered bya screen printing method and, then, dried. By the above-describedprocedures, an electromagnetic wave shielding body was prepared. Across-sectional diagram thereof was shown in FIG. 17.

[0479] On this occasion, 2 points on the electrode which are remotestfrom each other were selected and, then, resistance therebetween wasexamined.

[0480] Further, a bonding time required for every sheet of theelectromagnetic wave shielding body was examined.

Example 19

[0481] A roll of an anti-glare film having a width of 565 mm and alength of 500 m was prepared and, then, a transparent electricallyconductive thin film layer was formed on a surface opposite to ananti-glare layer thereof in the same manner as in Example 17 to preparea roll of an anti-glare transparent electrically conductive film havinga length of 500 m. 2 rolls of copper tapes (each being 15 mm wide, 75 μmthick and 500 m long; electrically conductive adhesive being attached toone side thereof) were prepared.

[0482] A copper tape was bonded to each of both edge portions of theanti-glare transparent electrically conductive film. A bonding operationwas conducted such that a transparent electrically conductive layerformed as having an anti-glare transparent electrically conductiveproperty came into contact with the electrically conductive adhesive ofthe copper tape. Further, an overlapping width between each copper tapeand the anti-glare transparent electrically conductive film was allowedto be 10 mm. Bonding therebetween was conducted by a roll-to-rollmethod.

[0483] A roll of a transparent adhesive (575 mm wide, 25 μm thick and500 m long) was prepared. The thus-prepared transparent adhesive wasbonded on an anti-glare transparent electrically conductive film with aside face being bonded with a copper tape and, then, while keeping sucha configuration, the resultant film was further cut out to be a sheethaving a length of 958 mm and, thereafter, on a side on which thetransparent electrically conductive layer and the copper tape had notbeen bonded of the thus-cut out sheet, an adhesive was allowed to bebonded. On this occasion, a bonding operation was conducted by aroll-to-roll method. By the above-described procedures, anelectromagnetic wave shielding body was prepared. A cross-sectionthereof was shown in FIG. 24.

[0484] On this occasion, 2 points on the electrode which are remotestfrom each other were selected and, then, resistance therebetween wasexamined.

[0485] Further, a bonding time required for every sheet of theelectromagnetic wave shielding body was examined.

Example 20

[0486] A roll of an anti-glare film having a width of 565 mm and alength of 500 m was prepared and, then, on a surface opposite to ananti-glare layer thereof, formed was a transparent electricallyconductive thin film layer in the same manner as in Example 17.Subsequently, a transparent adhesive was bonded on the transparentelectrically conductive thin film layer by a roll-to-roll method and,then, while keeping such a configuration, the resultant film was furthercut out to be a sheet having a length of 958 mm thereby preparing anelectromagnetic wave shielding body.

[0487] A glass substrate (size being 545 mm×960 mm, thickness being 3mm) was prepared and, then, on each of 2 long sides thereof, disposedwas a copper plate (size being 10 mm×960 mm, thickness being 3 mm). Inthis copper plate, provided were screw holes. These screw holes wereformed at an interval of 30 mm in a longitudinal direction across thecopper plate in a range of from one end to the other end thereof. On theresultant supporting substrate comprising a glass plate and the copperplate, bonded was an electromagnetic wave shielding body. Next, screwswere fitted to respective screw holes which had been provided in thecopper plate. A screw-fitting operation was conducted such that each ofthe screws was allowed to penetrate the electromagnetic wave shieldingbody from an outermost surface thereof. On this occasion, the screwbecame a substantial through-hole electrode. By the above-describedprocedures, an electromagnetic wave shielding body was prepared. Across-sectional diagram was shown in FIG. 25.

[0488] On this occasion, 2 points on the electrode which are remotestfrom each other were selected and, then, resistance therebetween wasexamined.

[0489] Further, a bonding time required for every sheet of theelectromagnetic wave shielding body was examined.

Comparative Example 5

[0490] A roll having a width of 565 mm and a length of 500 m of apolyethylene terephthalate film (75 μm thick) was prepared as atransparent polymer film (B). On one major surface thereof, atransparent electrically conductive thin film layer was formed.

[0491] On a surface of the above-described film that is opposite to asurface on which the transparent electrically conductive thin film wasformed, a transparent adhesive was bonded by a roll-to-roll method.

[0492] Further, while the resultant film was being cut, the thus-cutfilm was bonded to a transparent supporting substrate via thetransparent adhesive.

[0493] Subsequently, a roll of an anti-glare film having a width of 565mm and a length of 500 m was prepared in a state in which a transparentadhesive was bonded on a side opposite to an anti-glare layer and, then,while the resultant film was being cut, the thus-cut film was bonded tothe transparent electrically conductive thin film layer of such alaminate. On this occasion, a bonding operation was conducted such thatan edge of the thus-cut film was positioned 5 mm inside from aperipheral portion of the transparent electrically conductive thin filmlayer.

[0494] Further, a silver paste was applied by a screen printing methodsuch that an entire circumference of an exposed portion of thetransparent electrically conductive thin film layer in a peripheral partwas covered and, then, dried. By the above-described procedures, anelectromagnetic wave shielding body was prepared.

[0495] On this occasion, 2 points on the electrode which are remotestfrom each other were selected and, then, resistance therebetween wasexamined.

[0496] Further, a bonding time required for every sheet of theelectromagnetic wave shielding body was examined.

[0497] Results obtained are shown in Table 4. TABLE 4 Lamination timeper sheet Resistance of electromagnetic wave between shielding body(second) electrodes (Ω) Example 17 180 7.2 Example 18 120 7.3 Example 19120 7.1 Example 20 120 7.3 Comparative 230 7.1 Example 5

[0498] As is evident from Table 4, in all the examples, electricresistance between electrodes has scarcely been decreased compared witha conventional electrode type material as shown in the comparativeexample. Further, it can be seen that, in all the examples, afilm-bonding time required per sheet of the electromagnetic waveshielding body has substantially been reduced whereupon productionefficiency of the electromagnetic wave shielding body has substantiallybeen enhanced.

Example 21

[0499] Same procedures as in Example 1 were taken except for thosedescribed below.

[0500] A transparent laminate 1 was prepared as described below.

[0501] Polyethylene terephthalate pellets 1203 (manufactured by Unitika,Ltd.) were mixed with 0.25% by weight and 0.23% by weight ofnear-infrared ray absorption dyes SIR-128 and SIR-130 respectively, eachmanufactured by Mitsui Chemicals Inc., melted in a range of from 260° C.to 280° C., and extruded by a twin-screw extruder to prepare a polymerfilm (B) having a thickness of 188 μm.

[0502] On one major surface of the thus-prepared polymer film (B), apolyester type adhesive containing a cross-linking agent was coated in athickness of 10 μm. Next, on the resultant film, a silver foil having athickness of 7 μm, a hole diameter of 1 μm, and a porosity of 12% waslaminated. On this occasion, molybdenum had previously been formed onboth of the major surfaces of this silver foil by a sputtering methodsuch that a thickness of molybdenum was allowed to be 50 μm. Next, byusing a thermosetting type ink, a lattice pattern having a lattice widthof 20 μm and a mesh size of 150 μm×150 μm was printed on a metal layerby a screen printing method. After the thus-used ink was cured byheating at 90° C. for 5 minutes, the metal layer of a portion which hadnot been protected by the ink was removed by an aqueous solution offerric chloride and, then, the ink was removed by a solvent. Thus, alaminate having a metal layer in a pattern as shown in FIG. 27, and anopen area ratio of 75% was able to be obtained. When averagetransmittance of a visible light ray was measured, it was 67%. Whensheet resistance was measured, it was 0.11 Ω/square.

Example 22

[0503] Same procedures as in Example 3 have been taken except for thosedescribed below.

[0504] A polymer film (B)/a transparent electrically conductive layer(D) was prepared by procedures described below.

[0505] Polyethylene terephthalate pellets 1203 (manufactured by Unitika,Ltd.) were mixed with 0.25% by weight and 0.23% by weight ofnear-infrared ray absorption dyes SIR128 and SIR130 respectively, eachmanufactured by Mitsui Chemicals Inc., melted in a range of from 260° C.to 280° C., and extruded by a twin-screw extruder to prepare a polymerfilm (B) having a thickness of 188 μm.

[0506] On the thus-prepared polymer film (B), a silver foil having athickness of 7 μm, a hole diameter of 1 μm and a porosity of 8% waslaminated by using an acrylic adhesive. On this occasion, a chromatetreatment had previously been performed on both surfaces of this silverfoil. Next, an alkali-developing type photo-resist was applied on acopper layer and, then, the thus-applied photo-resist was pre-baked,exposed to light by using a photo-mask and developed to form a latticepattern having a lattice width of 25 μm and a mesh size of 125 μm×125 μmthereon and, thereafter, a metal layer of a portion which had not beenprotected by the photo-resist was etched by an aqueous solution offerric chloride and, next, the photo-resist was removed in an alkalisolution. Thus, a laminate having a metal layer in a pattern as shown inFIG. 27 and an open area ratio of 69% was able to be obtained. Whenvisible light transmittance thereof was measured, it was 65% and, sheetresistance thereof was 0.07 Ω/square.

[0507] From Table 5, it can be seen that, by using the electromagneticwave shielding body according to the invention, Class B or Class A ofthe VCCI specifications can be satisfied. As the surface resistance ofthe transparent electrically conductive layer became lower,electromagnetic wave shielding capacity was excellent.

[0508] Further, it can be seen that, by using the electromagnetic waveshielding body according to the invention, it is excellent innear-infrared ray cutting-off capacity.

[0509] The electromagnetic wave shielding body according to theinvention which uses a metallic mesh layer is excellent in visible lighttransmittance, as well as electromagnetic wave shielding capacity and anear-infrared light shielding property.

[0510] Further, by allowing the functional transparent layer (A) of theelectromagnetic wave shielding body according to the invention to havevarious types of functions, the electromagnetic wave shielding bodyaccording to the invention is excellent in environmental resistanceand/or scratch resistance and/or an anti-fouling property and/or anantistatic property. TABLE 5 Compara- Electromagnetic tive waveshielding Example Example Example body None 21 22 1 Surface — 0.11 0.0715 resistance of transparent electrically conductive layer Ω/squareRadiation field  33 MHz 59 21 19 52 intensity  90 MHz 52 24 21 49 dBμ/mNear-infrared 820 nm — 20 20 79 light 850 nm — 5 5 78 transmittance 950nm — 10 10 70 % Critical  5 0.8 0.8  5 distance of or more or moremalfunction m

[0511] Effect of the Invention As described above in detail, accordingto the invention, a display filter that functions as a light controlledfilm which is excellent in a transmission characteristic, transmittance,and a reflection characteristic can be realized in a low cost manner. Byforming the display filter directly on a screen of a display apparatussuch as a plasma display, it is possible to enhance color purity andcontrast thereof without tremendously detracting from luminance of thedisplay and to realize the display apparatus having an excellent image.

[0512] Further, it is possible to realize a display filter that isexcellent in a transmission characteristic, transmittance, and visiblelight ray reflectance and functions as an electromagnetic wave shieldingbody which blocks an electromagnetic wave to be emitted from a displayapparatus such as a plasma display in a low cost manner. Furthermore,since the electromagnetic wave shielding body efficiently cuts off anear-infrared light, in a neighborhood of from 800 nm to 1,000 nm,emerging from the display, it exerts no adverse influence on wavelengthsused in a remote controller of neighboring electronic equipment, opticalcommunications by a transmission system or the like, and hence canprevent a malfunction thereof. Still further, it has good weatherresistance and environmental resistance, as well as an anti-reflectionproperty and/or an anti-glare property, scratch resistance, ananti-fouling property, an anti-electrostatic property and the like andcan realize a display apparatus having an excellent image.

[0513] Still furthermore, by allowing a total thickness of a transparentpolymer film which constitutes the display filter to be 0.3 mm or more,enhancement of a protection function and workability of the displaypanel can be aimed for and the electromagnetic wave shielding body orthe light control film to be directly bonded to a front surface of thedisplay can be provided.

[0514] Even still furthermore, by appropriately designing an electrodeshape of the electromagnetic wave shielding body, sufficientelectromagnetic wave shielding effect can be provided and, moreover, atime required for forming the electrode has substantially been reducedthereby substantially enhancing production efficiency.

1. A display filter capable of being adhered to a display screen andhaving predetermined filter characteristics, comprising: a functionaltransparent layer (A) disposed in an atmospheric side, having ananti-reflection property and/or an anti-glare property; a transparentadhesive layer (C) disposed in a display side, for allowing the displayfilter to be adhered to the screen; and a polymer film (B) disposed as asubstrate between the functional transparent layer (A) and thetransparent adhesive layer (C).
 2. The display filter of claim 1,wherein a transparent electrically conductive layer (D) having a surfaceresistance of from 0.01 to 30 Ω/square is disposed between thefunctional transparent layer (A) and the polymer film (B) and/or betweenthe polymer film (B) and the transparent adhesive layer (C).
 3. Thedisplay filter of claim 2, wherein a portion or entirety of thetransparent electrically conductive layer (D) is constituted by anelectrically conductive mesh.
 4. The display filter of claim 2, whereinthe transparent electrically conductive layer (D) is constituted byfirstly laminating a repeating unit (Dt)/(Dm) comprising ahigh-refractive-index transparent thin film layer (Dt) and a metallicthin film layer (Dm) while repeating the repeating unit from 2 times to4 times and, then, on the resultant laminate, further laminating ahigh-refractive-index thin film layer (Dt).
 5. The display filter ofclaim 4, wherein at least one layer of a plurality ofhigh-refractive-index transparent thin film layers (Dt) is formed by anoxide containing, as a major component, at least one metal selected fromthe group consisting of indium, tin and zinc.
 6. The display filter ofclaim 4, wherein at least one layer of a plurality of metallic thin filmlayers (Dm) is formed of silver or an alloy comprising silver.
 7. Thedisplay filter of any one of claims 1 to 6, wherein the functionaltransparent layer (A) further has at least one function selected fromthe group consisting of a hard coat property, an antistatic property, ananti-fouling property, a gas barrier property and an ultravioletcutting-off property.
 8. The display filter of any one of claims 1 to 6,wherein an adhesive layer (E) is disposed between the functionaltransparent layer (A) and the polymer film (B).
 9. The display filter ofany one of claims 1 to 6, wherein a hard coat layer (F) is formed onboth surfaces or one surface of the polymer film (B).
 10. The displayfilter of any one of claims 1 to 6, wherein at least one dye iscontained in at least one layer selected from the group consisting of:the functional transparent layer (A), the polymer film (B), thetransparent adhesive layer (C) a transparent electrically conductivelayer (D), the adhesive layer (E) and the hard coat layer (F).
 11. Thedisplay filter of claim 10, wherein a dye having an absorption maximumin a wavelength range from 570 to 605 nm is contained.
 12. The displayfilter of claim 11, wherein the dye is a tetraazaporphyrin compound. 13.The display filter of claim 12, wherein the tetraazaporphyrin compoundis expressed by the following formula (1):

wherein A¹ to A⁸ each individually represent a hydrogen atom, a halogenatom, a nitro group, a cyano group, a hydroxy group, a sulfonic acidgroup, an alkyl group having carbon atoms of from 1 to 20, ahalogenoalkyl group, an alkoxy group, an alkoxyalkyl group, an aryloxygroup, a monoalkylamino group, dialkylamino group, an aralkyl group, anaryl group, a heteroaryl group, an alkylthio group, or an arylthiogroup; combinations of A¹ and A², A³ and A¹, A⁵ and A⁶, and A⁷ and A⁸may each individually form a ring except an aromatic ring via aconnecting group; and M represents two hydrogen atoms, a divalent metalatom, a trivalent metal atom having one substituent, a tetravalent metalatom having two substituents, or an oxy metal atom.
 14. The displayfilter of claim 10, wherein a near-infrared ray absorption dye having anabsorption maximum in a wavelength range of from 800 to 1100 nm iscontained.
 15. The display filter of any one of claims 1 to 6, whereinvisible light ray reflectance on a surface of the functional transparentlayer (A) is 2% or less.
 16. The display filter of any one of claims 1to 15, wherein visible light ray transmittance is from 30 to 85%. 17.The display filter of any one of claims 1 to 16, wherein transmittanceminimum in a wavelength range of from 800 to 1100 nm is 20% or less. 18.The display filter of any one of claims 1 to 6, wherein a totalthickness of the polymer film in entirety of the filter is 0.3 mm ormore.
 19. The display filter of any one of claims 1 to 18, wherein apolymer film for increasing a total thickness capable of containing adye is provided.
 20. The display filter of claim 2 or 3, wherein anelectrode electrically connected with the transparent electricallyconductive layer (D) is formed.
 21. The display filter of claim 20,wherein the electrode electrically contacting with the transparentelectrically conductive layer (D) is continuously formed along acircumferential direction in a peripheral portion of the filter.
 22. Thedisplay filter of claim 20, wherein an electrode is formed in anelectrically conducting portion a part of which is exposed.
 23. Thedisplay filter of claim 21 or 22, wherein the filter is shaped into arectangle and electrodes are formed in two surrounding sides facing toeach other.
 24. The display filter of claim 21 or 22, where theelectrode electrically connected with the transparent electricallyconductive layer (D) is formed on a surface of a peripheral edge of thefilter.
 25. The display filter of any one of claims 1 to 6, wherein acommunicating hole which communicates from an outermost surface of thefilter through to at least the transparent electrically conductive layer(D) is formed along a thickness direction of the filter wherein anelectrode which electrically is connected with the transparentelectrically conductive layer (D) is formed inside the communicationhole.
 26. The display filter of any one of claims 1 to 6, wherein anelectrically conductive tape is interposed between the transparentelectrically conductive layer (D) and a layer adjacent to thetransparent electrically conductive layer (D).
 27. A display apparatus,comprising: a display for representing an image; and a display filter ofany one of claims 1 to 26, disposed on a display screen.
 28. A methodfor production of a display apparatus, comprising the steps of:laminating a display filter of any one of claims 20 to 26 on a displayscreen of a display apparatus via a transparent adhesive layer (C); andelectrically connecting a ground conductor of the display apparatus andthe electrode of the transparent electrically conductive layer (D). 29.A method of production of a display apparatus, comprising the steps of:laminating a laminate filter comprising a polymer film (B), atransparent electrically conductive layer (D), and a transparentadhesive layer (C) on a display screen via the transparent adhesivelayer (C); arranging a functional transparent layer (A) having ananti-reflection property and/or an anti-glare property on the laminatefilter directly or via a second adhesive layer; and electricallyconnecting a ground conductor of the display apparatus and thetransparent electrically conductive layer (D).
 30. A method forproduction of a display apparatus, characterized by comprising the stepsof: arranging an adhesive layer on a display screen of a displayapparatus; bonding a laminate filter comprising a polymer film (B), atransparent electrically conductive layer (D), and a functionaltransparent layer (A) having an anti-reflection property and/or ananti-glare property on the display screen via the adhesive layer; andelectrically connecting a ground conductor and the transparentelectrically conductive layer (D).
 31. A method for production of adisplay apparatus, comprising the steps of: arranging an adhesive layeron a display screen; bonding a laminate filter comprising a polymer film(B), and a transparent electrically conductive layer (D) on the displayscreen via the adhesive layer; arranging a functional transparent layer(A) having an anti-reflection property and/or an anti-glare property onthe laminate filter directly or via a second adhesive layer; andelectrically connecting a ground conductor and the transparentelectrically conductive layer (D).